Class information for: |
Basic class information |
ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
---|---|---|---|
10092 | 1029 | 14.1 | 43% |
Classes in level above (level 2) |
ID, lev. above |
Publications | Label for level above |
---|---|---|
1490 | 7092 | EUV LITHOG//UNDULATORS//SPECTROMICROSCOPY |
Terms with highest relevance score |
Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|---|
1 | GASSENDI | Address | 15 | 88% | 1% | 7 |
2 | FRONT ENDS | Author keyword | 6 | 50% | 1% | 8 |
3 | VARIED LINE SPACING GRATINGS | Author keyword | 6 | 100% | 0% | 4 |
4 | HIGH HEAT LOAD COMPONENTS | Author keyword | 5 | 63% | 0% | 5 |
5 | UNDULATOR BEAMLINES | Author keyword | 3 | 100% | 0% | 3 |
6 | FINE MECH ENGN | Address | 3 | 50% | 0% | 4 |
7 | SOFT X RAY BEAMLINE | Author keyword | 2 | 29% | 1% | 7 |
8 | HIGHER ORDER SUPPRESSION | Author keyword | 2 | 67% | 0% | 2 |
9 | INSERTION DEVICE BEAMLINE | Author keyword | 2 | 67% | 0% | 2 |
10 | PLANE GRATING MONOCHROMATORS | Author keyword | 2 | 67% | 0% | 2 |
Web of Science journal categories |
Author Key Words |
Key Words Plus |
Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | BEAM LINES | 8 | 70% | 1% | 7 |
2 | CONCAVE GRATINGS | 8 | 70% | 1% | 7 |
3 | SPHERICAL GRATINGS | 6 | 100% | 0% | 4 |
4 | GRATING SYSTEMS | 4 | 75% | 0% | 3 |
5 | LINE SPACE GRATINGS | 4 | 75% | 0% | 3 |
6 | MULTIMODE DEFORMABLE MIRROR | 4 | 75% | 0% | 3 |
7 | GEOMETRIC THEORY | 4 | 20% | 2% | 16 |
8 | ASPHERIC GRATINGS | 3 | 100% | 0% | 3 |
9 | CORRECTED ASPHERIC GRATINGS | 3 | 100% | 0% | 3 |
10 | IMAGING EQUATIONS | 3 | 100% | 0% | 3 |
Journals |
Reviews |
Title | Publ. year | Cit. | Active references |
% act. ref. to same field |
---|---|---|---|---|
REVIEW OF PLANE GRATING FOCUSING FOR SOFT-X-RAY MONOCHROMATORS | 1995 | 67 | 36 | 53% |
Diffraction gratings: aberrations and applications | 1999 | 11 | 76 | 70% |
Optimizing the parameters of the optical systems of spectral devices | 1995 | 3 | 33 | 91% |
A prospect and retrospect - the Japanese case | 1997 | 3 | 10 | 70% |
Power density distribution and associated thermal analysis of an elliptical polarizing undulator | 2011 | 0 | 2 | 50% |
TUNABLE COHERENT X-RAYS | 1989 | 0 | 25 | 32% |
PHOTO-IONIZATION OF HELIUM - A SHOWCASE OF THE CONTINUOUS IMPROVEMENTS IN THE PRODUCTION AND IN THE USE OF SYNCHROTRON RADIATION FOR ATOMIC PHYSICS | 1982 | 3 | 5 | 40% |
Address terms |
Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
---|---|---|---|---|---|
1 | GASSENDI | 15 | 88% | 0.7% | 7 |
2 | FINE MECH ENGN | 3 | 50% | 0.4% | 4 |
3 | OBSERV MARSEILLE | 2 | 50% | 0.3% | 3 |
4 | BEAMLINE GRP | 1 | 33% | 0.2% | 2 |
5 | SPRING 8 PROJECT TEAM | 1 | 33% | 0.2% | 2 |
6 | NSLS BEAMLINE X24C | 1 | 50% | 0.1% | 1 |
7 | PHOTON SCI DIRECTORATES | 1 | 50% | 0.1% | 1 |
8 | TECHNOL AVANZATE SUPERFICI CATALISI | 1 | 50% | 0.1% | 1 |
9 | TECNOL AVANZATE NANOSCIENZA | 1 | 50% | 0.1% | 1 |
10 | GRATING TECHNOL | 1 | 25% | 0.2% | 2 |
Related classes at same level (level 1) |
Rank | Relatedness score | Related classes |
---|---|---|
1 | 0.0000205428 | SPACE NANOTECHNOL//FREESTANDING TRANSMISSION GRATING//SINGLE ORDER DIFFRACTION |
2 | 0.0000198714 | SAGITTAL FOCUSING//INCLINED DIFFRACTION//DIFFRACTIVE REFRACTIVE OPTICS |
3 | 0.0000163522 | UNDULATORS//INSERTION DEVICES//SUPERCONDUCTING UNDULATOR |
4 | 0.0000102085 | BEAM POSITION MONITORS//BMIT//CLOSED ORBIT CORRECTION |
5 | 0.0000099396 | AIRBORNE PRISM EXPERIMENT APEX//ENVIRONMENTAL MAPPING AND ANALYSIS PROGRAM ENMAP//ESCOLA UNIV OPT OPTOMETRIA |
6 | 0.0000078199 | CATHODE LENS//SPECTROMICROSCOPY//PHOTOEMISSION MICROSCOPY |
7 | 0.0000073776 | EUV LITHOG//SOFT XRAY MICROSCOPY//XRAY OPT |
8 | 0.0000070905 | GAS BREMSSTRAHLUNG//FIRST OPTICS ENCLOSURE//SECONDARY GAS BREMSSTRAHLUNG |
9 | 0.0000067997 | EMPIRICAL ONE ELECTRON POTENTIAL//XUV MONOCHROMATOR//PLANE GRATING MONOCHROMATOR |
10 | 0.0000063906 | EXIT PIPE//EFFLUX TIME//MHD SLIP FLOW |