Class information for:
Level 1: COLLECTOR OPTICS//ADV INTERDISCIPLINARY SCI//MAT EXTREME ENVIRONM

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
13182 790 19.2 63%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
1490 7092 EUV LITHOG//UNDULATORS//SPECTROMICROSCOPY

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 COLLECTOR OPTICS Author keyword 6 80% 1% 4
2 ADV INTERDISCIPLINARY SCI Address 5 22% 3% 22
3 MAT EXTREME ENVIRONM Address 4 20% 3% 20
4 EXTREME ULTRAVIOLET SOURCES Author keyword 4 75% 0% 3
5 PLASMA DEBRIS Author keyword 4 75% 0% 3
6 DISCHARGE PRODUCED PLASMA Author keyword 4 40% 1% 8
7 OPT TECHNOL INNOVAT OPTIC Address 3 57% 1% 4
8 OPT EDUC CORE Address 3 50% 1% 4
9 CAPILLARY Z PINCH Author keyword 3 60% 0% 3
10 EUVA Address 3 60% 0% 3

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class		 LCSH search Wikipedia search
1 COLLECTOR OPTICS 6 80% 1% 4 Search COLLECTOR+OPTICS Search COLLECTOR+OPTICS
2 EXTREME ULTRAVIOLET SOURCES 4 75% 0% 3 Search EXTREME+ULTRAVIOLET+SOURCES Search EXTREME+ULTRAVIOLET+SOURCES
3 PLASMA DEBRIS 4 75% 0% 3 Search PLASMA+DEBRIS Search PLASMA+DEBRIS
4 DISCHARGE PRODUCED PLASMA 4 40% 1% 8 Search DISCHARGE+PRODUCED+PLASMA Search DISCHARGE+PRODUCED+PLASMA
5 CAPILLARY Z PINCH 3 60% 0% 3 Search CAPILLARY+Z+PINCH Search CAPILLARY+Z+PINCH
6 134 NM 2 67% 0% 2 Search 134+NM Search 134+NM
7 GAS PUFF TARGET 2 18% 1% 9 Search GAS+PUFF+TARGET Search GAS+PUFF+TARGET
8 DEBRIS MITIGATION 2 18% 1% 8 Search DEBRIS+MITIGATION Search DEBRIS+MITIGATION
9 ABLATIVE CAPILLARY DISCHARGE 1 50% 0% 2 Search ABLATIVE+CAPILLARY+DISCHARGE Search ABLATIVE+CAPILLARY+DISCHARGE
10 EXTREME ULTRAVIOLET LIGHT SOURCE 1 100% 0% 2 Search EXTREME+ULTRAVIOLET+LIGHT+SOURCE Search EXTREME+ULTRAVIOLET+LIGHT+SOURCE

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 EUV SOURCE 17 70% 2% 14
2 4D 4F EMISSION RESONANCES 17 72% 2% 13
3 DROPLET TARGET 15 56% 2% 18
4 135 NM 14 65% 2% 13
5 SN PLASMAS 12 86% 1% 6
6 EUV SOURCES 10 73% 1% 8
7 HIGHLY IONIZED XENON 8 62% 1% 8
8 XE X 6 80% 1% 4
9 PUFF TARGET 4 67% 1% 4
10 IONIZED XENON 4 35% 1% 9

Journals

Reviews


Title Publ. year Cit. Active
references		 % act. ref.
to same field
Physical processes in EUV sources for microlithography 2011 41 34 62%
Recent progress in source development for extreme UV lithography 2012 4 40 83%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 ADV INTERDISCIPLINARY SCI 5 22% 2.8% 22
2 MAT EXTREME ENVIRONM 4 20% 2.5% 20
3 OPT TECHNOL INNOVAT OPTIC 3 57% 0.5% 4
4 OPT EDUC CORE 3 50% 0.5% 4
5 EUVA 3 60% 0.4% 3
6 PHYS AS 2 67% 0.3% 2
7 PLASMA MAT INTERACT GRP 2 36% 0.5% 4
8 FOR UNGSEINRICHTUNG RONTGENPHYS 2 43% 0.4% 3
9 PLASMA MAT INTERACT 1 15% 1.1% 9
10 GRP PLICAT PLASMAS 1 100% 0.3% 2

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000145272 CLASSIFIED LINES//STARS INDIVIDUAL RE 0503 289//ATOMIC SPECTRA
2 0.0000134595 SPACE NANOTECHNOL//FREESTANDING TRANSMISSION GRATING//SINGLE ORDER DIFFRACTION
3 0.0000128412 EUV LITHOG//SOFT XRAY MICROSCOPY//XRAY OPT
4 0.0000117344 CONTACT MICROSCOPY//LEAF DETAILS//SOFT X RAY CONTACT MICROSCOPY
5 0.0000113027 SPECT ATOM ION//LSAI//SOFT X RAY LASER
6 0.0000095642 SPALLATION PHENOMENON//ABLATION PRESSURE//POROUS MIXTURE
7 0.0000094987 HIGH ENERGY DENSITY PHYSICS//SCREENED HYDROGENIC MODEL//RADIATIVE OPACITY
8 0.0000081604 ELE OPHYS ELECT POWER//VACUUM SPARK//KOROLEV STATE AEROSP UNIV
9 0.0000078843 X RAY MICROSCOPY//FRESNEL ZONE PLATES//RONTGENPHYS
10 0.0000077536 LASER GENERATED PLASMA//LEAS//NAZL SUD