Class information for: |
Basic class information |
| ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
|---|---|---|---|
| 15216 | 656 | 13.4 | 49% |
Classes in level above (level 2) |
| ID, lev. above |
Publications | Label for level above |
|---|---|---|
| 740 | 11887 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//MICROELECTRONIC ENGINEERING//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY |
Terms with highest relevance score |
| Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
|---|---|---|---|---|---|---|
| 1 | MICROCOLUMN | Author keyword | 7 | 24% | 4% | 26 |
| 2 | SCHOTTKY EMITTER | Author keyword | 7 | 67% | 1% | 6 |
| 3 | PROD DESIGN TECHNOL | Address | 6 | 58% | 1% | 7 |
| 4 | NEXT GENERAT SEMICOND TECHNOL | Address | 6 | 53% | 1% | 8 |
| 5 | SC O W100 EMITTER | Author keyword | 6 | 100% | 1% | 4 |
| 6 | EINZEL LENS | Author keyword | 5 | 55% | 1% | 6 |
| 7 | SC O W100 | Author keyword | 3 | 100% | 0% | 3 |
| 8 | ZR O W100 | Author keyword | 3 | 100% | 0% | 3 |
| 9 | WORK FUNCTION MEASUREMENT | Author keyword | 3 | 45% | 1% | 5 |
| 10 | PL MAT CO | Address | 3 | 60% | 0% | 3 |
Web of Science journal categories |
Author Key Words |
| Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
LCSH search | Wikipedia search |
|---|---|---|---|---|---|---|---|
| 1 | MICROCOLUMN | 7 | 24% | 4% | 26 | Search MICROCOLUMN | Search MICROCOLUMN |
| 2 | SCHOTTKY EMITTER | 7 | 67% | 1% | 6 | Search SCHOTTKY+EMITTER | Search SCHOTTKY+EMITTER |
| 3 | SC O W100 EMITTER | 6 | 100% | 1% | 4 | Search SC+O+W100+EMITTER | Search SC+O+W100+EMITTER |
| 4 | EINZEL LENS | 5 | 55% | 1% | 6 | Search EINZEL+LENS | Search EINZEL+LENS |
| 5 | SC O W100 | 3 | 100% | 0% | 3 | Search SC+O+W100 | Search SC+O+W100 |
| 6 | ZR O W100 | 3 | 100% | 0% | 3 | Search ZR+O+W100 | Search ZR+O+W100 |
| 7 | WORK FUNCTION MEASUREMENT | 3 | 45% | 1% | 5 | Search WORK+FUNCTION+MEASUREMENT | Search WORK+FUNCTION+MEASUREMENT |
| 8 | SCHOTTKY ELECTRON SOURCE | 2 | 67% | 0% | 2 | Search SCHOTTKY+ELECTRON+SOURCE | Search SCHOTTKY+ELECTRON+SOURCE |
| 9 | INFORMATION PASSING CAPACITY | 2 | 50% | 0% | 3 | Search INFORMATION+PASSING+CAPACITY | Search INFORMATION+PASSING+CAPACITY |
| 10 | CURVILINEAR AXIS THEORY | 1 | 100% | 0% | 2 | Search CURVILINEAR+AXIS+THEORY | Search CURVILINEAR+AXIS+THEORY |
Key Words Plus |
| Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
|---|---|---|---|---|---|
| 1 | ZR O W100 SYSTEM | 17 | 100% | 1% | 8 |
| 2 | GLASS PHOTOCATHODES | 6 | 80% | 1% | 4 |
| 3 | SCHOTTKY EMITTER | 6 | 80% | 1% | 4 |
| 4 | ELECTRON BEAM MICROCOLUMN | 6 | 100% | 1% | 4 |
| 5 | SELF RECOVERY FUNCTION | 6 | 100% | 1% | 4 |
| 6 | ZRO W100 SURFACE | 4 | 67% | 1% | 4 |
| 7 | CANONICAL MAPPING TRANSFORMATION | 4 | 75% | 0% | 3 |
| 8 | BEAM MICROCOLUMN | 3 | 100% | 0% | 3 |
| 9 | MICROLENS SYSTEM | 3 | 100% | 0% | 3 |
| 10 | TUNNELING MICROSCOPE MICROLENS | 3 | 100% | 0% | 3 |
Journals |
Reviews |
| Title | Publ. year | Cit. | Active references |
% act. ref. to same field |
|---|---|---|---|---|
| A Review of the Cold-Field Electron Cathode | 2009 | 6 | 18 | 44% |
| Significant advances in scanning electron microscopes (1965-2007) | 2008 | 4 | 10 | 50% |
| On the High-Voltage STEM Project in Toulouse (MEBATH) | 2009 | 0 | 10 | 80% |
| On the electron-optical properties of the ZrO/W Schottky electron emitter | 1999 | 3 | 12 | 58% |
| Three-dimensional fabrication of miniature electron optics | 2002 | 0 | 21 | 38% |
| Advances in scanning electron microscopy | 2002 | 1 | 32 | 28% |
| Miniature electron optics | 1998 | 0 | 21 | 38% |
| APPROACH TO A STABLE FIELD-EMISSION ELECTRON SOURCE | 1985 | 1 | 22 | 41% |
Address terms |
| Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
|---|---|---|---|---|---|
| 1 | PROD DESIGN TECHNOL | 6 | 58% | 1.1% | 7 |
| 2 | NEXT GENERAT SEMICOND TECHNOL | 6 | 53% | 1.2% | 8 |
| 3 | PL MAT CO | 3 | 60% | 0.5% | 3 |
| 4 | ELECT ENGN COMP SCI 038 | 2 | 67% | 0.3% | 2 |
| 5 | ETEC SYST | 2 | 67% | 0.3% | 2 |
| 6 | IC ENGN | 2 | 22% | 0.9% | 6 |
| 7 | PHYS ADV MAT SCI | 1 | 19% | 1.1% | 7 |
| 8 | INFORMAT DISPLAY CNST | 1 | 100% | 0.3% | 2 |
| 9 | LEADING EDGE TECHNOL HEADQUARTERS | 1 | 50% | 0.3% | 2 |
| 10 | CNST | 1 | 11% | 1.4% | 9 |
Related classes at same level (level 1) |
| Rank | Relatedness score | Related classes |
|---|---|---|
| 1 | 0.0000263362 | PHOTOMASK//IC EQUIPMENT//PROXIMITY EFFECT CORRECTION |
| 2 | 0.0000194124 | CANONICAL ABERRATION THEORY//OPT PHYS ELECT ENGN//ACCURACY OF COMPUTATION |
| 3 | 0.0000192797 | ELECTRON BEAM TESTING//SOREP//VOLTAGE CONTRAST |
| 4 | 0.0000183238 | SINGLE ATOM TIP//SUR E MODIFICAT//SINGLE ATOM TIPS |
| 5 | 0.0000179090 | HAIRPIN FILAMENT//POINT CATHODE//MICROWAVE COMMUN SYST GRP |
| 6 | 0.0000114720 | BIOMACHINING//MATRIX EXPOSURE//LIGHT VALVE DISPLAYS |
| 7 | 0.0000102059 | LIQUID METAL ION SOURCE//LIQUID METAL ION SOURCES//ION BEAMS MAT |
| 8 | 0.0000092544 | CATHODE LENS//SPECTROMICROSCOPY//PHOTOEMISSION MICROSCOPY |
| 9 | 0.0000076039 | APEX RADIUS//GRP MAT NANOESTRUCT//TIP FABRICATION |
| 10 | 0.0000072581 | NANOSYST MFG//NANOELECT PROC IL//ION PROJECTION |