Class information for: |
Basic class information |
| ID | Publications | Average number of references |
Avg. shr. active ref. in WoS |
|---|---|---|---|
| 20754 | 386 | 19.3 | 47% |
Classes in level above (level 2) |
| ID, lev. above |
Publications | Label for level above |
|---|---|---|
| 2253 | 4237 | MOLECULAR DEPTH PROFILING//CLUSTER SIMS//ION BEAM ENGN EXPT |
Terms with highest relevance score |
| Rank | Term | Type of term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
|---|---|---|---|---|---|---|
| 1 | LANGMUIR SORPTION MODEL | Author keyword | 4 | 75% | 1% | 3 |
| 2 | ION CLUSTER BEAM DEPOSITION | Author keyword | 2 | 67% | 1% | 2 |
| 3 | IONIZED CLUSTER BEAM TECHNIQUE | Author keyword | 2 | 67% | 1% | 2 |
| 4 | TCNQ COMPLEX | Author keyword | 2 | 67% | 1% | 2 |
| 5 | IONIZED CLUSTER BEAM DEPOSITION | Author keyword | 1 | 31% | 1% | 4 |
| 6 | CHALCOPYRITE TYPE COMPOUNDS | Author keyword | 1 | 50% | 1% | 2 |
| 7 | SINGLE CRYSTAL ALUMINUM FILM | Author keyword | 1 | 100% | 1% | 2 |
| 8 | UHV SPUTTERING | Author keyword | 1 | 40% | 1% | 2 |
| 9 | VICINAL SI SURFACE | Author keyword | 1 | 33% | 1% | 2 |
| 10 | CONTACT FILL | Author keyword | 1 | 50% | 0% | 1 |
Web of Science journal categories |
Author Key Words |
Key Words Plus |
| Rank | Web of Science journal category | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
|---|---|---|---|---|---|
| 1 | IONIZED CLUSTER BEAM | 8 | 35% | 5% | 19 |
| 2 | IONIZED BEAM DEPOSITION | 5 | 55% | 2% | 6 |
| 3 | PARTIALLY IONIZED BEAM | 3 | 45% | 1% | 5 |
| 4 | ALKALI IODIDE CLUSTERS | 2 | 44% | 1% | 4 |
| 5 | CLUSTER BEAM | 2 | 36% | 1% | 4 |
| 6 | ICB | 1 | 50% | 0% | 1 |
| 7 | IMPACT ECI | 1 | 50% | 0% | 1 |
| 8 | LPCVD ALUMINUM | 1 | 50% | 0% | 1 |
| 9 | POTASSIUM CLUSTER IONS | 1 | 50% | 0% | 1 |
| 10 | AG SI111 | 1 | 13% | 1% | 4 |
Journals |
Reviews |
| Title | Publ. year | Cit. | Active references | % act. ref. to same field |
|---|---|---|---|---|
| Processes involving clusters and small particles in a buffer gas | 2011 | 8 | 89 | 9% |
| Cluster plasma | 2000 | 36 | 108 | 17% |
| Generation of cluster beams | 2003 | 28 | 143 | 23% |
| Cluster-involving processes in plasmas and gases | 1997 | 25 | 115 | 24% |
| PROCESSES IN EXPANDING AND CONDENSING GASES | 1994 | 28 | 119 | 16% |
| Nonuniform gas discharge plasma | 1996 | 2 | 14 | 36% |
| Formation dynamics of atomic clusters | 1997 | 7 | 19 | 5% |
Address terms |
| Rank | Address term | Relevance score (tfidf) |
Class's shr. of term's tot. occurrences |
Shr. of publ. in class containing term |
Num. of publ. in class |
|---|---|---|---|---|---|
| 1 | DIMES S | 1 | 50% | 0.3% | 1 |
| 2 | INORGAN CHEM SUR ES | 0 | 14% | 0.5% | 2 |
| 3 | BASIC EDUC INTEGRATED | 0 | 100% | 0.3% | 1 |
| 4 | ELE MAT ENGN YU SEUNG KU | 0 | 100% | 0.3% | 1 |
| 5 | ION BEAM ENGN EXPTL | 0 | 100% | 0.3% | 1 |
| 6 | UL ENGN OURCE SCI | 0 | 100% | 0.3% | 1 |
Related classes at same level (level 1) |
| Rank | Relatedness score | Related classes |
|---|---|---|
| 1 | 0.0000176253 | NANOSCALE PHYS//NANO CLUSTER DEVICES LTD//PLASMA GAS CONDENSATION |
| 2 | 0.0000105375 | LATERAL CRYSTALLINE GROWTH//ACCELERATORS//ION INDUCED DEFECTS |
| 3 | 0.0000104071 | MOLECULAR DEPTH PROFILING//CLUSTER SIMS//ION BEAM ENGN EXPT |
| 4 | 0.0000098706 | MICROMECH SYST//SELF ORGANIZED MASK//CLUSTER SCI GRP |
| 5 | 0.0000097097 | BIASED DC PLASMA SPUTTERING//CIRCUIT PATTERN//AL2O3 ABRASIVE |
| 6 | 0.0000074096 | LASER POLISHING//SELF ION ASSISTED DEPOSITION//QUASISTATIC PROBLEM OF THERMOELASTICITY |
| 7 | 0.0000065938 | BALL LIGHTNING//OPTICAL QUADRATIC NONLINEARITY//WHISPERING GALLERY WAVES |
| 8 | 0.0000062214 | SALINICOCCUS ROSEUS//CU2SI//BURLA |
| 9 | 0.0000058337 | LASER MICRO CLADDING//FREEFORM FABRICAT S//DIMETHYLALUMINUM HYDRIDE |
| 10 | 0.0000055520 | XRAY MICROIMAGING BIOINFORMAT//NANOPLASMA//COULOMB EXPLOSION |