Class information for:
Level 1: LOW K//SIOC H FILMS//PLASMA PROC TECHNOL

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
2214 2246 20.8 64%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
824 11237 PLASMA POLYMERIZATION//PLASMA PROCESSES AND POLYMERS//LOW K

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 LOW K Author keyword 96 42% 8% 177
2 SIOC H FILMS Author keyword 94 97% 1% 28
3 PLASMA PROC TECHNOL Address 61 82% 2% 36
4 LOW K MATERIALS Author keyword 38 62% 2% 39
5 NANO THIN FILM MAT Address 35 74% 1% 26
6 LOW K DIELECTRICS Author keyword 31 43% 2% 55
7 SIOF Author keyword 31 73% 1% 24
8 LOW K DIELECTRIC THIN FILMS Author keyword 26 64% 1% 25
9 LOW DIELECTRIC CONSTANT Author keyword 22 29% 3% 64
10 XPEQT Address 21 90% 0% 9

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class		 LCSH search Wikipedia search
1 LOW K 96 42% 8% 177 Search LOW+K Search LOW+K
2 SIOC H FILMS 94 97% 1% 28 Search SIOC+H+FILMS Search SIOC+H+FILMS
3 LOW K MATERIALS 38 62% 2% 39 Search LOW+K+MATERIALS Search LOW+K+MATERIALS
4 LOW K DIELECTRICS 31 43% 2% 55 Search LOW+K+DIELECTRICS Search LOW+K+DIELECTRICS
5 SIOF 31 73% 1% 24 Search SIOF Search SIOF
6 LOW K DIELECTRIC THIN FILMS 26 64% 1% 25 Search LOW+K+DIELECTRIC+THIN+FILMS Search LOW+K+DIELECTRIC+THIN+FILMS
7 LOW DIELECTRIC CONSTANT 22 29% 3% 64 Search LOW+DIELECTRIC+CONSTANT Search LOW+DIELECTRIC+CONSTANT
8 LOW K MATERIAL 20 54% 1% 25 Search LOW+K+MATERIAL Search LOW+K+MATERIAL
9 INTERMETAL DIELECTRIC 19 74% 1% 14 Search INTERMETAL+DIELECTRIC Search INTERMETAL+DIELECTRIC
10 LOW K DIELECTRIC 18 35% 2% 41 Search LOW+K+DIELECTRIC Search LOW+K+DIELECTRIC

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 LOW K 81 57% 4% 97
2 LOW DIELECTRIC CONSTANT 69 33% 8% 175
3 METHYLSILSESQUIOXANE 60 79% 2% 38
4 DIELECTRIC CONSTANT MATERIALS 46 47% 3% 72
5 SIOF FILMS 38 76% 1% 26
6 LOW K DIELECTRICS 33 46% 2% 54
7 CONSTANT MATERIALS 30 44% 2% 52
8 COPPER DRIFT 30 84% 1% 16
9 SPIN ON GLASS 27 47% 2% 43
10 INTERLAYER DIELECTRICS 24 53% 1% 32

Journals

Reviews


Title Publ. year Cit. Active references % act. ref.
to same field
Low dielectric constant materials for microelectronics 2003 848 147 56%
Low Dielectric Constant Materials 2010 186 384 47%
Porous pSiCOH Ultralow-k Dielectrics for Chip Interconnects Prepared by PECVD 2009 58 26 92%
Progress in the development and understanding of advanced low k and ultralow k dielectrics for very large-scale integrated interconnects-State of the art 2014 13 22 55%
Review of polymer materials with low dielectric constant 2010 37 57 63%
The effects of vacuum ultraviolet radiation on low-k dielectric films 2012 14 71 63%
Low-Dielectric Constant Insulators for Future Integrated Circuits and Packages 2011 15 61 52%
Time Dependent Dielectric Breakdown in Copper Low-k Interconnects: Mechanisms and Reliability Models 2012 8 31 61%
Porous Dielectrics in Microelectronic Wiring Applications 2010 10 72 88%
Development of a low-dielectric-constant polymer for the fabrication of integrated circuit interconnect 2000 201 4 25%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 PLASMA PROC TECHNOL 61 82% 1.6% 36
2 NANO THIN FILM MAT 35 74% 1.2% 26
3 XPEQT 21 90% 0.4% 9
4 NANOTHIN FILM MAT 17 79% 0.5% 11
5 LOG TECHNOL DEV 16 39% 1.5% 33
6 MECH ENERGY PROD ENGN 8 45% 0.6% 14
7 NANODEVICES SYST 5 15% 1.4% 32
8 OCOTILLO MAT 5 63% 0.2% 5
9 SEMICOND MAT PROC 4 31% 0.5% 12
10 ADV NANOTECH DEV TEAM 4 75% 0.1% 3

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000125421 FLUOROCARBON FILMS//FLUORINATED AMORPHOUS CARBON//A C F
2 0.0000075484 HMDSO//HEXAMETHYLDISILOXANE//HEXAMETHYLDISILOXANE HMDSO
3 0.0000069682 DIFFUSION BARRIER//CU METALLIZATION//TANTALUM NITRIDE
4 0.0000065719 HYDROGEN SILSESQUIOXANE//HSQ//HSQ RESIST
5 0.0000063358 BOROPHOSPHOSILICATE GLASS BPSG//ATMOSPHERIC PRESSURE CVD//BPSG
6 0.0000057462 ATOMIC LAYER ETCHING//GATE CHARGING//NEUTRAL BEAM ETCHING
7 0.0000052694 LEHRSTUHL FUNKT MAT//BK MOL SCI//LS E13
8 0.0000052372 PLASMA POLYMERIZATION//SINTESIS CARACTERIZAC//GEORGE SUDARSHAN PHYS COMP SCI
9 0.0000049150 SILICON CARBONITRIDE//SILICON CARBON NITRIDE//SILICON CARBONITRIDE FILM
10 0.0000046088 ELECT DEVICES MAT TECHNOL//SIO2 ETCHING//PLASMA ETCHING