Class information for:
Level 1: STENCIL LITHOGRAPHY//STRESS INDUCED DEFORMATION//RESIST SPRAY COATING

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
22152 335 21.8 71%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
1859 5530 NANOIMPRINT//NANOIMPRINT LITHOGRAPHY//UV NANOIMPRINT

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 STENCIL LITHOGRAPHY Author keyword 25 77% 5% 17
2 STRESS INDUCED DEFORMATION Author keyword 9 83% 1% 5
3 RESIST SPRAY COATING Author keyword 6 80% 1% 4
4 THREE DIMENSIONAL PHOTOLITHOGRAPHY Author keyword 4 75% 1% 3
5 MICROSYST 1 Address 3 60% 1% 3
6 SHADOW MASK Author keyword 2 13% 5% 16
7 AGILE FAB Author keyword 2 67% 1% 2
8 PARTICLE ASSISTED WETTING Author keyword 2 67% 1% 2
9 NANOSTENCIL Author keyword 2 31% 1% 5
10 MICROSIEVES Author keyword 2 36% 1% 4

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class		 LCSH search Wikipedia search
1 STENCIL LITHOGRAPHY 25 77% 5% 17 Search STENCIL+LITHOGRAPHY Search STENCIL+LITHOGRAPHY
2 STRESS INDUCED DEFORMATION 9 83% 1% 5 Search STRESS+INDUCED+DEFORMATION Search STRESS+INDUCED+DEFORMATION
3 RESIST SPRAY COATING 6 80% 1% 4 Search RESIST+SPRAY+COATING Search RESIST+SPRAY+COATING
4 THREE DIMENSIONAL PHOTOLITHOGRAPHY 4 75% 1% 3 Search THREE+DIMENSIONAL+PHOTOLITHOGRAPHY Search THREE+DIMENSIONAL+PHOTOLITHOGRAPHY
5 SHADOW MASK 2 13% 5% 16 Search SHADOW+MASK Search SHADOW+MASK
6 AGILE FAB 2 67% 1% 2 Search AGILE+FAB Search AGILE+FAB
7 PARTICLE ASSISTED WETTING 2 67% 1% 2 Search PARTICLE+ASSISTED+WETTING Search PARTICLE+ASSISTED+WETTING
8 NANOSTENCIL 2 31% 1% 5 Search NANOSTENCIL Search NANOSTENCIL
9 MICROSIEVES 2 36% 1% 4 Search MICROSIEVES Search MICROSIEVES
10 EBDW LITHOGRAPHY 1 100% 1% 2 Search EBDW+LITHOGRAPHY Search EBDW+LITHOGRAPHY

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 SHADOW MASK 27 52% 11% 37
2 NANOSTENCILS 26 80% 5% 16
3 MICROSIEVES 9 64% 3% 9
4 MICRO NANOSTENCIL 8 100% 1% 5
5 MICRO NANOSTENCIL LITHOGRAPHY 4 75% 1% 3
6 WAFER STENCIL LITHOGRAPHY 3 100% 1% 3
7 DIAZO TYPE RESIST 2 67% 1% 2
8 REED METHOD 2 67% 1% 2
9 SHADOW MASK EVAPORATION 2 67% 1% 2
10 SINGLE STEP LIFTOFF 2 67% 1% 2

Journals

Reviews


Title Publ. year Cit. Active references % act. ref.
to same field
Resistless nanofabrication by stencil lithography: A review 2015 1 122 58%
Isoporous Micro/Nanoengineered Membranes 2013 28 187 14%
Toward an understanding of immune cell sociology: real-time monitoring of cytokine secretion at the single-cell level 2013 0 22 5%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 MICROSYST 1 3 60% 0.9% 3
2 TRANSDUCT TECHNOL GRP 1 100% 0.6% 2
3 BARCELONA MICROELECT 1 40% 0.6% 2
4 ALPNACH 1 50% 0.3% 1
5 AXETRIS MICROSYST 1 50% 0.3% 1
6 CNRS IIS UMI 2820MEGURO KU 1 50% 0.3% 1
7 DIMES DELFT MICROSYST NANOELECT 1 50% 0.3% 1
8 ELECT ENGN MESA 1 50% 0.3% 1
9 FAB SORT MFG 1 50% 0.3% 1
10 ICTM MICROELECT TECHNOL SINGLE CRYSTALS 1 50% 0.3% 1

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000213405 NANOSYST MFG//NANOELECT PROC IL//ION PROJECTION
2 0.0000096032 SU 8//ZNCL2 NACL KCL//DEVICE TECHNOL GRP
3 0.0000090258 LASER SCAN LITHOGRAPHY//ADV SCI TECHNOL IND//WORM INJECTION MOLDING
4 0.0000071612 MICROCONTACT PRINTING//SOFT LITHOGRAPHY//CAPILLARY FORCE LITHOGRAPHY
5 0.0000070348 BIOARTIFICIAL KIDNEY//WEARABLE ARTIFICIAL KIDNEY//BIOARTIFICIAL RENAL TUBULE DEVICE
6 0.0000068525 INTERPARTICLE CROSSLINKING//ALUMINA NANOFIBER//ORGAN NANOMAT
7 0.0000065550 LASER INTERFERENCE METALLURGY//DIRECT DIGITAL MFG//JR3CN
8 0.0000064317 HYDROGEN SILSESQUIOXANE//HSQ//HSQ RESIST
9 0.0000059525 DIP PEN NANOLITHOGRAPHY//POLYMER PEN LITHOGRAPHY//DIP PEN NANOLITHOGRAPHY DPN
10 0.0000055969 CLEAN LIMIT//QUASI CLASSICAL GREENS FUNCTION//DIAMAGNETIC RESPONSE