Class information for:
Level 1: RU2SI3//OSSI2//CHROMIUM DISILICIDE

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
22861 310 19.2 54%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
603 13298 BETA FESI2//SILICIDE//SILICIDES

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 RU2SI3 Author keyword 8 75% 2% 6
2 OSSI2 Author keyword 6 80% 1% 4
3 CHROMIUM DISILICIDE Author keyword 5 44% 3% 8
4 RESI175 Author keyword 4 67% 1% 4
5 RUTHENIUM SILICIDE Author keyword 2 38% 2% 5
6 CR SI SYSTEM Author keyword 2 67% 1% 2
7 CRSI2 Author keyword 2 33% 1% 4
8 AUTOMAT CONTROL SCI Address 1 100% 1% 2
9 RU2GE3 Author keyword 1 100% 1% 2
10 STATE RARE EARTH CHEM PLICAT Address 1 50% 1% 2

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class		 LCSH search Wikipedia search
1 RU2SI3 8 75% 2% 6 Search RU2SI3 Search RU2SI3
2 OSSI2 6 80% 1% 4 Search OSSI2 Search OSSI2
3 CHROMIUM DISILICIDE 5 44% 3% 8 Search CHROMIUM+DISILICIDE Search CHROMIUM+DISILICIDE
4 RESI175 4 67% 1% 4 Search RESI175 Search RESI175
5 RUTHENIUM SILICIDE 2 38% 2% 5 Search RUTHENIUM+SILICIDE Search RUTHENIUM+SILICIDE
6 CR SI SYSTEM 2 67% 1% 2 Search CR+SI+SYSTEM Search CR+SI+SYSTEM
7 CRSI2 2 33% 1% 4 Search CRSI2 Search CRSI2
8 RU2GE3 1 100% 1% 2 Search RU2GE3 Search RU2GE3
9 ALLOY SILICIDE 1 50% 0% 1 Search ALLOY+SILICIDE Search ALLOY+SILICIDE
10 CHANNELED ION IMPLANTATION 1 50% 0% 1 Search CHANNELED+ION+IMPLANTATION Search CHANNELED+ION+IMPLANTATION

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 RESI2 22 67% 6% 20
2 CRSI2 16 42% 10% 30
3 RU2SI3 11 57% 4% 13
4 CHROMIUM DISILICIDE 10 61% 4% 11
5 TRANSPORT PERFORMANCES 8 100% 2% 5
6 RU2GE3 7 64% 2% 7
7 SEMICONDUCTING RHENIUM SILICIDE 7 67% 2% 6
8 DIFFUSIONLESS PHASE TRANSFORMATIONS 5 63% 2% 5
9 DOPED RU2SI3 4 56% 2% 5
10 RUTHENIUM SILICON SYSTEM 3 100% 1% 3

Journals

Reviews


Title Publ. year Cit. Active
references		 % act. ref.
to same field
Microscopic study of electrical properties of CrSi2 nanocrystals in silicon 2011 2 8 63%
Introduction: Fundamental aspects 2003 0 88 10%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 AUTOMAT CONTROL SCI 1 100% 0.6% 2
2 STATE RARE EARTH CHEM PLICAT 1 50% 0.6% 2
3 GRP THERMODYNAM MET 1 33% 1.0% 3
4 AUTOMAT CONTROL PROCESS 1 50% 0.3% 1
5 PHYS MECAN MAT METALL 1 50% 0.3% 1
6 UNIT RECH PHYS 1 50% 0.3% 1
7 NEW OPTOELECT MAT TECHNOL 1 29% 0.6% 2
8 AMARL 0 33% 0.3% 1
9 NUCL FUEL TECHNOL DEV 0 33% 0.3% 1
10 UM2ENSCMUM1UMR 5253 0 33% 0.3% 1

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000295291 BETA FESI2//IRON DISILICIDE//FESI2
2 0.0000202857 VALENCE BAND DENSITY OF STATES//SURFACE MAGNETO OPTIC KERR EFFECT//METAL SEMICONDUCTOR THIN FILM
3 0.0000154560 RESISTIVE FILMS//RELATIVE RESISTANCE CHANGE//MINIST HIGH TEMP MAT TESTS
4 0.0000147567 HIGHER MANGANESE SILICIDE//HIGHER MANGANESE SILICIDES//ADV THIN FILMS
5 0.0000116477 RECONFIGURABLE TRANSISTOR//RFET//SILICIDE NANOWIRES
6 0.0000113051 LASER MOL BEAM EPITAXY//PTSI//IRIDIUM SILICIDES
7 0.0000106100 LINEAR LEAST SQUARES FITTING//LINEAR LEAST SQUARE FIT//LINEAR LEAST SQUARE METHOD
8 0.0000103485 FESI//MNSI//FE1 XCOXSI
9 0.0000099458 MG2SI//MAGNESIUM SILICIDE//MG2SN
10 0.0000084863 TISI2//SALICIDE//NICKEL SILICIDE