Class information for:
Level 1: SILICON TETRAACETATE//F 2 LASER//N2O GAS

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
23805 279 16.6 58%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
252 19240 MICROCRYSTALLINE SILICON//JOURNAL OF NON-CRYSTALLINE SOLIDS//PHOTOVOLTA THIN FILM ELECT

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 SILICON TETRAACETATE Author keyword 3 60% 1% 3
2 F 2 LASER Author keyword 2 12% 5% 14
3 N2O GAS Author keyword 2 43% 1% 3
4 THIN SIO2 FILM Author keyword 1 38% 1% 3
5 DIELECTRIC TANGENT Author keyword 1 100% 1% 2
6 PHOTOCHEMICAL WELDING Author keyword 1 100% 1% 2
7 SI2H6 GAS Author keyword 1 100% 1% 2
8 SILICONE FILM Author keyword 1 40% 1% 2
9 CHEMICAL WET TREATMENT Author keyword 1 50% 0% 1
10 CURVILINEAR ARRAY Author keyword 1 50% 0% 1

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class		 LCSH search Wikipedia search
1 SILICON TETRAACETATE 3 60% 1% 3 Search SILICON+TETRAACETATE Search SILICON+TETRAACETATE
2 F 2 LASER 2 12% 5% 14 Search F+2+LASER Search F+2+LASER
3 N2O GAS 2 43% 1% 3 Search N2O+GAS Search N2O+GAS
4 THIN SIO2 FILM 1 38% 1% 3 Search THIN+SIO2+FILM Search THIN+SIO2+FILM
5 DIELECTRIC TANGENT 1 100% 1% 2 Search DIELECTRIC+TANGENT Search DIELECTRIC+TANGENT
6 PHOTOCHEMICAL WELDING 1 100% 1% 2 Search PHOTOCHEMICAL+WELDING Search PHOTOCHEMICAL+WELDING
7 SI2H6 GAS 1 100% 1% 2 Search SI2H6+GAS Search SI2H6+GAS
8 SILICONE FILM 1 40% 1% 2 Search SILICONE+FILM Search SILICONE+FILM
9 CHEMICAL WET TREATMENT 1 50% 0% 1 Search CHEMICAL+WET+TREATMENT Search CHEMICAL+WET+TREATMENT
10 CURVILINEAR ARRAY 1 50% 0% 1 Search CURVILINEAR+ARRAY Search CURVILINEAR+ARRAY

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 F 2 LASER 5 32% 5% 14
2 DIMETHYLPOLYSILOXANE 4 67% 1% 4
3 DEUTERIUM LAMP 2 43% 1% 3
4 SI3H8 1 30% 1% 3
5 SIO2 FILM 1 18% 1% 4
6 PHOTO CVD 1 15% 2% 5
7 SIH4 O2 1 50% 0% 1
8 PRIMER FILMS 0 33% 0% 1
9 SPECTROSCOPY IN SITU 0 33% 0% 1
10 TUNNELING PARAMETERS 0 33% 0% 1

Journals

Reviews

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 ELECT ENGN SAKYO KU 1 50% 0.4% 1
2 SZEWALSKI 1 29% 0.7% 2
3 SERV 4MAT 0 33% 0.4% 1
4 CDPCNRS URA 250 DMO 0 100% 0.4% 1
5 CDPDTD 0 100% 0.4% 1
6 CNET CNS MEYLAN 0 100% 0.4% 1
7 CNRS URA 250 CONCEPTS DEVICES PHOTO 196 0 100% 0.4% 1
8 COURSE ELECT PHOTO OPT 0 100% 0.4% 1
9 DTD CDP 0 100% 0.4% 1
10 FIS LICADA LAGOAS MARCOSENDE 9 0 100% 0.4% 1

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000167392 LASER MICRO CLADDING//FREEFORM FABRICAT S//DIMETHYLALUMINUM HYDRIDE
2 0.0000159298 BOROPHOSPHOSILICATE GLASS BPSG//ATMOSPHERIC PRESSURE CVD//BPSG
3 0.0000149062 MESA STEP HEIGHT//LAVOISIER IREM//IMAGE ARRAY
4 0.0000131684 SIH2//SIH3//SILANE PLASMA
5 0.0000124634 SEMICOND INTEGRATED CIRCUIT//SCI TECH FES SAIS//HIGFET
6 0.0000122162 SYNCHROTRON RADIATION STIMULATED ETCHING//SYNCHROTRON RADIATION EXCITED GROWTH//VACUUM UV PHOTOSCI
7 0.0000121526 SILICON OXYNITRIDE//SILICON NITRIDE FILMS//CONDUCTANCE TRANSIENTS
8 0.0000116549 SIPOS//MSOS O P STRUCTURE//SEMI INSULATING POLYCRYSTALLINE SILICON
9 0.0000097568 1 3 DISILACYCLOBUTANE//LASER CHEM GRP//SPIRO SI HETEROCYCLIC RING COMPOUND
10 0.0000095371 EXCILAMP//KRCL EXCILAMP//EXCILAMPS