Class information for:
Level 1: BIOMACHINING//MATRIX EXPOSURE//LIGHT VALVE DISPLAYS

Basic class information
ID Publications Average number
of references		 Avg. shr. active
ref. in WoS
26431 209 13.3 50%


Bar chart of Publication_year

Last years might be incomplete

Classes in level above (level 2)


ID, lev.
above		 Publications Label for level above
1859 5530 NANOIMPRINT//NANOIMPRINT LITHOGRAPHY//UV NANOIMPRINT

Terms with highest relevance score


Rank Term Type of term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class
1 BIOMACHINING Author keyword 15 73% 5% 11
2 MATRIX EXPOSURE Author keyword 8 100% 2% 5
3 LIGHT VALVE DISPLAYS Author keyword 6 100% 2% 4
4 RETICLELESS EXPOSURE Author keyword 3 100% 1% 3
5 ROBOT SYST ENGN Address 2 33% 3% 6
6 PROJECTION EXPOSURE Author keyword 2 38% 2% 5
7 CODE MARK Author keyword 2 67% 1% 2
8 DIGITAL MASKLESS LITHOGRAPHY Author keyword 2 67% 1% 2
9 OPTICAL MASKLESS LITHOGRAPHY Author keyword 2 50% 1% 3
10 MASKLESS LITHOGRAPHY Author keyword 2 11% 8% 16

Web of Science journal categories

Author Key Words


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ. in
class		 LCSH search Wikipedia search
1 BIOMACHINING 15 73% 5% 11 Search BIOMACHINING Search BIOMACHINING
2 MATRIX EXPOSURE 8 100% 2% 5 Search MATRIX+EXPOSURE Search MATRIX+EXPOSURE
3 LIGHT VALVE DISPLAYS 6 100% 2% 4 Search LIGHT+VALVE+DISPLAYS Search LIGHT+VALVE+DISPLAYS
4 RETICLELESS EXPOSURE 3 100% 1% 3 Search RETICLELESS+EXPOSURE Search RETICLELESS+EXPOSURE
5 PROJECTION EXPOSURE 2 38% 2% 5 Search PROJECTION+EXPOSURE Search PROJECTION+EXPOSURE
6 CODE MARK 2 67% 1% 2 Search CODE+MARK Search CODE+MARK
7 DIGITAL MASKLESS LITHOGRAPHY 2 67% 1% 2 Search DIGITAL+MASKLESS+LITHOGRAPHY Search DIGITAL+MASKLESS+LITHOGRAPHY
8 OPTICAL MASKLESS LITHOGRAPHY 2 50% 1% 3 Search OPTICAL+MASKLESS+LITHOGRAPHY Search OPTICAL+MASKLESS+LITHOGRAPHY
9 MASKLESS LITHOGRAPHY 2 11% 8% 16 Search MASKLESS+LITHOGRAPHY Search MASKLESS+LITHOGRAPHY
10 BIOCOMPATIBLE POLYSILOXANE 1 100% 1% 2 Search BIOCOMPATIBLE+POLYSILOXANE Search BIOCOMPATIBLE+POLYSILOXANE

Key Words Plus


Rank Web of Science journal category Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 RETICLE 3 35% 3% 7
2 BIOCOMPATIBLE SILICONE ELASTOMER 3 60% 1% 3
3 FREE EXPOSURE METHOD 1 100% 1% 2
4 LED LIGHT 1 50% 1% 2
5 MASKLESS LITHOGRAPHY 1 14% 3% 6
6 E TRACKING 1 50% 0% 1
7 GRAIN TRACEABILITY 1 50% 0% 1
8 MIRROR ARRAYS 1 50% 0% 1
9 POULTRY FOOD CHAIN 1 50% 0% 1
10 FEATURE SIZES LARGER 0 33% 0% 1

Journals

Reviews


Title Publ. year Cit. Active
references		 % act. ref.
to same field
SLM-based maskless lithography for TFT-LCD 2009 13 5 40%

Address terms


Rank Address term Relevance score
(tfidf)		 Class's shr.
of term's tot.
occurrences		 Shr. of publ.
in class containing
term		 Num. of
publ.
in class
1 ROBOT SYST ENGN 2 33% 2.9% 6
2 NONDESTRUCT TEST MINIST EDUC CHINA 1 100% 1.0% 2
3 NDMS 1 50% 0.5% 1
4 OHMORI MAT FABRICAT 1 50% 0.5% 1
5 NANO PHOTON 1 12% 2.4% 5
6 705 1 22% 1.0% 2
7 EVOLUT IMMUNOL 0 33% 0.5% 1
8 RD PROGRAM 0 33% 0.5% 1
9 KUMAMOTO TECHNOL 0 25% 0.5% 1
10 N LES UNIT 0 25% 0.5% 1

Related classes at same level (level 1)


Rank Relatedness score Related classes
1 0.0000114720 MICROCOLUMN//SCHOTTKY EMITTER//PROD DESIGN TECHNOL
2 0.0000108123 LASER SCAN LITHOGRAPHY//ADV SCI TECHNOL IND//WORM INJECTION MOLDING
3 0.0000103177 MICROLENS ARRAY//MICROLENS//MICROLENSES
4 0.0000078704 SU 8//ZNCL2 NACL KCL//DEVICE TECHNOL GRP
5 0.0000071040 METATOYS//CONFOCAL LENSLET ARRAYS//ROOF DOVE PRISM
6 0.0000068564 RADIOMETR PHYS//SCALAR WAVE FUNCTIONS//HE I 10830 ANGSTROM
7 0.0000065205 KINOFORM//ENGN PHYS SCI PHYS//KINOFORMS
8 0.0000064484 157 NM LASER//SUR E ENGN OPTOELECT F4//HYBRIDIZATION REACTION
9 0.0000063540 NONRADIATING SOURCES//GLITTER PATTERN//ANTENNA LIMITS
10 0.0000059948 VISUALIZATION OF PHASE OBJECTS//COLOR INTERFEROMETRY//FOCUSING SCHLIEREN