Class information for: |
Basic class information |
| Class id | #P | Avg. number of references |
Database coverage of references |
|---|---|---|---|
| 10911 | 1025 | 20.2 | 65% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
| Cluster id | Level | Cluster label | #P |
|---|---|---|---|
| 10 | 4 | OPTICS//PHYSICS, PARTICLES & FIELDS//PHYSICS, MULTIDISCIPLINARY | 1131262 |
| 37 | 3 | PHYSICS, CONDENSED MATTER//PHYSICAL REVIEW B//QUANTUM DOTS | 103171 |
| 125 | 2 | SUPERLATTICES AND MICROSTRUCTURES//QUANTUM WELLS//PHYSICS, CONDENSED MATTER | 24068 |
| 10911 | 1 | PHOTOREFLECTANCE//FRANZ KELDYSH OSCILLATIONS//NEW YORK STATE ADV TECHNOL ULTRAFAST PHOTON M | 1025 |
Terms with highest relevance score |
| rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
|---|---|---|---|---|---|---|
| 1 | PHOTOREFLECTANCE | authKW | 893552 | 9% | 33% | 90 |
| 2 | FRANZ KELDYSH OSCILLATIONS | authKW | 248229 | 1% | 56% | 15 |
| 3 | NEW YORK STATE ADV TECHNOL ULTRAFAST PHOTON M | address | 172074 | 3% | 22% | 26 |
| 4 | FIELD INDUCED CHANGE IN THE PSEUDODIELECTRIC FUNCTION | authKW | 148945 | 0% | 100% | 5 |
| 5 | PHOTOELLIPSOMETRY | authKW | 148945 | 0% | 100% | 5 |
| 6 | ELECTROREFLECTANCE | authKW | 122145 | 2% | 23% | 18 |
| 7 | CONTACTLESS ELECTROREFLECTANCE | authKW | 120636 | 1% | 45% | 9 |
| 8 | FRANZ KELDYSH THEORY | authKW | 119156 | 0% | 100% | 4 |
| 9 | EPSRC CENT IL 3 5 | address | 67024 | 0% | 75% | 3 |
| 10 | ELECTROLYTE ELECTROREFLECTANCE SPECTROSCOPY | authKW | 59578 | 0% | 100% | 2 |
Web of Science journal categories |
| Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
|---|---|---|---|---|---|
| 1 | Physics, Applied | 8237 | 57% | 0% | 585 |
| 2 | Physics, Condensed Matter | 5103 | 38% | 0% | 385 |
| 3 | Materials Science, Coatings & Films | 603 | 6% | 0% | 61 |
| 4 | Materials Science, Multidisciplinary | 296 | 15% | 0% | 154 |
| 5 | Physics, Multidisciplinary | 249 | 9% | 0% | 90 |
| 6 | Engineering, Electrical & Electronic | 223 | 11% | 0% | 114 |
| 7 | Nanoscience & Nanotechnology | 130 | 5% | 0% | 49 |
| 8 | Optics | 68 | 5% | 0% | 50 |
| 9 | Crystallography | 23 | 2% | 0% | 20 |
| 10 | Instruments & Instrumentation | 22 | 2% | 0% | 24 |
Address terms |
| Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
|---|---|---|---|---|---|
| 1 | NEW YORK STATE ADV TECHNOL ULTRAFAST PHOTON M | 172074 | 3% | 22% | 26 |
| 2 | EPSRC CENT IL 3 5 | 67024 | 0% | 75% | 3 |
| 3 | HIGH CONCENTRAT PHOTOVOLTA PROJECT | 59578 | 0% | 100% | 2 |
| 4 | URA 0357 | 59578 | 0% | 100% | 2 |
| 5 | ELE ELECT ENGN NANOELE | 53618 | 0% | 60% | 3 |
| 6 | MICROWAVE DEVICE DEV | 39717 | 0% | 67% | 2 |
| 7 | ADV ELECT OPT SCIAREA SOLID STATE ELECT | 29789 | 0% | 100% | 1 |
| 8 | BLECHMAMMER | 29789 | 0% | 100% | 1 |
| 9 | COMPOUND SEMICOND DEVICES SECT | 29789 | 0% | 100% | 1 |
| 10 | EDLM | 29789 | 0% | 100% | 1 |
Journals |
| Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
|---|---|---|---|---|---|
| 1 | JOURNAL OF APPLIED PHYSICS | 9731 | 18% | 0% | 187 |
| 2 | SUPERLATTICES AND MICROSTRUCTURES | 5059 | 3% | 1% | 33 |
| 3 | APPLIED PHYSICS LETTERS | 3782 | 12% | 0% | 120 |
| 4 | SEMICONDUCTORS | 2725 | 2% | 0% | 25 |
| 5 | SEMICONDUCTOR SCIENCE AND TECHNOLOGY | 2687 | 3% | 0% | 27 |
| 6 | PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | 1971 | 4% | 0% | 37 |
| 7 | SOLID STATE COMMUNICATIONS | 1216 | 3% | 0% | 33 |
| 8 | ADVANCED MATERIALS FOR OPTICS AND ELECTRONICS | 1165 | 0% | 1% | 3 |
| 9 | PHYSICAL REVIEW B | 1011 | 8% | 0% | 79 |
| 10 | INSTITUTE OF PHYSICS CONFERENCE SERIES | 960 | 2% | 0% | 18 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
| Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
|---|---|---|---|---|
| 1 | POLLAK, FH , SHEN, H , (1993) MODULATION SPECTROSCOPY OF SEMICONDUCTORS - BULK THIN-FILM, MICROSTRUCTURES, SURFACES INTERFACES AND DEVICES.MATERIALS SCIENCE & ENGINEERING R-REPORTS. VOL. 10. ISSUE 7-8. P. 275-374 | 176 | 56% | 295 |
| 2 | SHEN, H , DUTTA, M , (1995) FRANZ-KELDYSH OSCILLATIONS IN MODULATION SPECTROSCOPY.JOURNAL OF APPLIED PHYSICS. VOL. 78. ISSUE 4. P. 2151 -2176 | 69 | 78% | 237 |
| 3 | MISIEWICZ, J , SITAREK, P , SEK, G , KUDRAWIEC, R , (2003) SEMICONDUCTOR HETEROSTRUCTURES AND DEVICE STRUCTURES INVESTIGATED BY PHOTOREFLECTANCE SPECTROSCOPY.MATERIALS SCIENCE-POLAND. VOL. 21. ISSUE 3. P. 263 -320 | 75 | 64% | 84 |
| 4 | POLLAK, FH , (2001) STUDY OF SEMICONDUCTOR SURFACES AND INTERFACES USING ELECTROMODULATION.SURFACE AND INTERFACE ANALYSIS. VOL. 31. ISSUE 10. P. 938 -953 | 65 | 74% | 28 |
| 5 | HUANG, YS , POLLAK, FH , (2005) NON-DESTRUCTIVE, ROOM TEMPERATURE CHARACTERIZATION OF WAFER-SIZED III-V SEMICONDUCTOR DEVICE STRUCTURES USING CONTACTLESS ELECTROMODULATION AND WAVELENGTH-MODULATED SURFACE PHOTOVOLTAGE SPECTROSCOPY.PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE. VOL. 202. ISSUE 7. P. 1193 -1207 | 46 | 81% | 45 |
| 6 | POLLAK, FH , (2001) CONTACTLESS ELECTROMODULATION AND SURFACE PHOTOVOLTAGE SPECTROSCOPY FOR THE NONDESTRUCTIVE, ROOM TEMPERATURE CHARACTERIZATION OF WAFER-SEALS III-V SEMICONDUCTOR DEVICE STRUCTURES.MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY. VOL. 80. ISSUE 1-3. P. 178 -183 | 39 | 89% | 15 |
| 7 | MISIEWICZ, J , SEK, G , SITAREK, P , (1999) PHOTOREFLECTANCE SPECTROSCOPY APPLIED TO SEMICONDUCTORS AND SEMICONDUCTOR HETEROSTRUCTURES.OPTICA APPLICATA. VOL. 29. ISSUE 3. P. 327 -363 | 55 | 66% | 0 |
| 8 | MISIEWICZ, J , SITAREK, P , SEK, G , (2000) PHOTOREFLECTANCE SPECTROSCOPY OF LOW-DIMENSIONAL SEMICONDUCTOR STRUCTURES.OPTO-ELECTRONICS REVIEW. VOL. 8. ISSUE 1. P. 1-24 | 34 | 85% | 17 |
| 9 | SOARES, JANT , ENDERLEIN, R , BELIAEV, D , LEITE, JR , SAITO, M , (1998) PHOTOREFLECTANCE SPECTRA FROM GAAS HEMT STRUCTURES REINVESTIGATED: SOLUTION OF AN OLD CONTROVERSY.SEMICONDUCTOR SCIENCE AND TECHNOLOGY. VOL. 13. ISSUE 12. P. 1418-1425 | 26 | 96% | 7 |
| 10 | HOSEA, TJC , (2004) ADVANCES IN THE APPLICATION OF MODULATION SPECTROSCOPY TO VERTICAL CAVITY STRUCTURES.THIN SOLID FILMS. VOL. 450. ISSUE 1. P. 3 -13 | 21 | 88% | 20 |
Classes with closest relation at Level 1 |