Telephone: 08-790 91 75
Fax: 08-21 08 51
Visiting address: Brinellvägen 68, room K228
Lars Mattsson was born in Norberg, Västmanland, Sweden, in 1950. He attended the University of Uppsala, majoring in mathematics and physics and received a B.S. degree in physics in 1973 after completing the compulsory year of military duty in 1970-1971. He did his graduate thesis work under Nobel Prize winner Kai Siegbahn in the Electron Spectroscopy group of the Physics Department at the University of Uppsala, and received his Ph.D. degree in 1980. His thesis research involved developing an efficient focusing vacuum-ultraviolet polarizer for strongly enhanced irradiation of gases in angle-resolved photoelectron spectroscopy.
From 1981 to 1988 Dr. Mattsson was involved in several projects at the University of Uppsala to develop high-quality extreme-ultraviolet (EUV) mirrors and to characterize mirror surfaces and thin films by scattering measurements in the EUV and visible regions. He built an in situ angle-resolved scattering system that was later used by Cern in Geneva for the assessment of EUV mirrors for the DELPHI detector in the Large Electron-Positron Collider project. In 1984 he became an associate professor and joined the staff of the Institute of Optical Research in Stockholm on a part-time basis. There he built a low-noise total integrated scattering (TIS) system making surface roughness studies feasible in the subangstrom range, and he quantified the extremely low scatter and roughness of high quality silicon wafers in 1986. Dr. Mattsson moved his laboratory from Uppsala to Stockholm in 1988 and, with former president of the Optical Society of America Dr. J.M. Bennett, set up the Surface Evaluation Laboratory at the Institute of Optical Research. He continuously expanded the laboratory and by 1998 it comprised 13 instruments including angle-resolved scatterometers, total integrated scattering facilities, an instrument for near-specular stray light measurement of infrared optical systems, scanning probe and Nomarski microscopes with image processing facilities and a Talystep surface profiler. In 1991 he became research manager and established the surface characterization group, which by 1998 had expanded to 10 scientists. His main research area has been the exploitation of light scattering at different wavelengths for surface characterization from atomic levels of semiconductor substrates through thin metal films to paper and engineering surfaces with micron roughness. Dr. Mattsson and his group have demonstrated the use of 10.6 mm infrared radiation for rapid assessment of rms surface roughness over large areas of engineering surfaces and have developed an instrument for simultaneous deformation and stress-relaxation analysis of metal films. In the last years of the 1990ies his work was focused on the optics of paper and paper surfaces and he set up the project that has provided Grace, the first thorough light and paper simulation software tool. Efforts were also put on stray light characterization in infrared optical systems. In 1998 Dr. Mattsson was appointed a full professor in industrial metrology at KTH - the Royal Institute of Technology, Stockholm, Sweden. His research is performed with development of laser metrology, measurement of surface deformations, surface characterization by mechanical and optical techniques, ultra-precision dimensional metrology, optical coherence tomography (OCT) in ceramics, measurement of high aspect ratio microstructures, 3D-holographic visualization, and assessment of surfaces with respect to cosmetic appearance. He also contributes to the development of technical aids for visually disabled persons by adapting techniques from industrial metrology. In 2002-2005 he was appointed deputy director of the KTH/KI Nano- and Microtechnology Centre, and in 2004-2009 he was the head of the Metrology Division in the 4M European Network of Excellence for Multi Material Micro Manufacture, a joint project between 30 European universities and research institutes. Within this project an outstanding world record in high aspect ratio micro structure measurements was set in 2007, with a 50:1 height/width ratio on 8 um wide structures, a highly appreciated achievement for MEMS-manufacturers. From 2005 to 2013 he was Head of the Department of Production Engineering at KTH. 2006 he established a joint national metrology project, SIMET, with the objective of increasing the interaction between people active in dimensional metrology people within Sweden. Partners are coming from the manufacturing industry, equipment manufacturers, instrument deliverers, teaching consultants, research institutes and universities throughout Sweden. The purpose of the project is also to raise the status and setting industrial metrology on the agenda for the future in both education and research. He has been work package leader in the FP7-projects EUMINAfab and Multilayer and is currently responsible for precision metrology in the FP7 projects Locomachs and NEMI. The close collaboration with Peter Ekberg at Micronic-Mydata, now employed as researcher in the metrology group, has resulted in a PhD thesis and four articles in the high impact metrology journal Measurement Science and Technology, presenting the most advanced 2D-large area metrology system ever built, capable of measurement uncertainties < 90 nm over square meter sized chromium/glass masks.
Prof. Mattssons group is acknowledged for their precision metrology research by the Elena Ulieru award presented to Bita Daemi for best paper at the 4M 2013 conference and the success of the Multilayer project, to be used as an ad for the upcoming Horizon 2020 program.
Prof. Mattsson is the author or co-author of more than 130 scientific papers and the two editions of the book “Introduction to Surface Roughness and Scattering” published by the Optical Society of America. He has given invited lectures in Sweden, Norway, England, Belgium, Bulgaria, France, the Netherlands, Germany, Austria, Switzerland, Hungary, Poland, Slovenia, Russia, China, and the United States and is a member of the Swedish Optical Society, the European Optical Society and the Euspen organization. He is a Fellow of the Society of Photo-Optical Instrumentation Engineers and is appointed as a metrology evaluator and expert by the European Commission.