Class information for: |
Basic class information |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
1 | 4 | PHYSICS, CONDENSED MATTER//PHYSICS, APPLIED//MATERIALS SCIENCE, MULTIDISCIPLINARY | 2188495 |
51 | 3 | SURFACE SCIENCE//PHYSICS, CONDENSED MATTER//SCANNING TUNNELING MICROSCOPY | 97901 |
767 | 2 | MOLECULAR ELECTRONICS//MOLECULAR JUNCTIONS//SINGLE MOLECULE JUNCTION | 12723 |
17296 | 1 | MATH PHYS COMP AIDED SCI//LIGHT EMISSION SPECTROSCOPY//PHOTON EMISSION | 635 |
Terms with highest relevance score |
rank | Category | termType | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|---|
1 | MATH PHYS COMP AIDED SCI | address | 248158 | 1% | 100% | 5 |
2 | LIGHT EMISSION SPECTROSCOPY | authKW | 198526 | 1% | 100% | 4 |
3 | PHOTON EMISSION | authKW | 195019 | 4% | 15% | 26 |
4 | STM INDUCED LUMINESCENCE | authKW | 158819 | 1% | 80% | 4 |
5 | SCANNING TUNNELING MICROSCOPE INDUCED LUMINESCENCE | authKW | 148895 | 0% | 100% | 3 |
6 | STM INDUCED LIGHT EMISSION | authKW | 148895 | 0% | 100% | 3 |
7 | STM LIGHT EMISSION | authKW | 148895 | 0% | 100% | 3 |
8 | TUNNELING ELECTRON | authKW | 132348 | 1% | 67% | 4 |
9 | NEGATIVE RESISTANCE PHENOMENON | authKW | 99263 | 0% | 100% | 2 |
10 | PHOTON INTENSITY MAP | authKW | 99263 | 0% | 100% | 2 |
Web of Science journal categories |
chi_square_rank | Category | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | Physics, Condensed Matter | 3169 | 37% | 0% | 238 |
2 | Physics, Applied | 2107 | 38% | 0% | 241 |
3 | Physics, Multidisciplinary | 771 | 17% | 0% | 109 |
4 | Microscopy | 410 | 3% | 0% | 18 |
5 | Nanoscience & Nanotechnology | 365 | 9% | 0% | 58 |
6 | Chemistry, Physical | 362 | 18% | 0% | 117 |
7 | Materials Science, Coatings & Films | 278 | 5% | 0% | 33 |
8 | Materials Science, Multidisciplinary | 89 | 12% | 0% | 75 |
9 | Optics | 65 | 6% | 0% | 36 |
10 | Engineering, Electrical & Electronic | 24 | 6% | 0% | 41 |
Address terms |
chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | MATH PHYS COMP AIDED SCI | 248158 | 1% | 100% | 5 |
2 | AOBA KU 2 1 1 | 49632 | 0% | 100% | 1 |
3 | DRT LITEN LCC | 49632 | 0% | 100% | 1 |
4 | ELECT COMMUN CORE EVOLUT SCI TEC | 49632 | 0% | 100% | 1 |
5 | J AN SCI TECHNOL CORPAOBA KU | 49632 | 0% | 100% | 1 |
6 | MAT MESOSCOP NANOSTRUCT | 49632 | 0% | 100% | 1 |
7 | MOE ENGN NANOPHOTON ADV RUMENT | 49632 | 0% | 100% | 1 |
8 | NANOSCALE QUANTOM CONDUCTOR ARRAY PROJECT | 49632 | 0% | 100% | 1 |
9 | NANOSTRUCT MEDIA GRP | 49632 | 0% | 100% | 1 |
10 | PL PHYSQUANTUM PHASE ELECT | 49632 | 0% | 100% | 1 |
Journals |
chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | SURFACE SCIENCE | 5504 | 9% | 0% | 55 |
2 | PHYSICAL REVIEW B | 1888 | 13% | 0% | 82 |
3 | APPLIED PHYSICS LETTERS | 1136 | 8% | 0% | 52 |
4 | PHYSICAL REVIEW LETTERS | 1035 | 7% | 0% | 46 |
5 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 730 | 3% | 0% | 16 |
6 | ULTRAMICROSCOPY | 690 | 1% | 0% | 9 |
7 | OPTOELECTRONICS-DEVICES AND TECHNOLOGIES | 537 | 0% | 1% | 1 |
8 | APPLIED SURFACE SCIENCE | 460 | 3% | 0% | 19 |
9 | NANO LETTERS | 449 | 2% | 0% | 11 |
10 | CHINESE JOURNAL OF CHEMICAL PHYSICS | 418 | 1% | 0% | 4 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Classes with closest relation at Level 1 |