Class information for: |
Basic class information |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
| Cluster id | Level | Cluster label | #P |
|---|---|---|---|
| 1 | 4 | PHYSICS, CONDENSED MATTER//PHYSICS, APPLIED//MATERIALS SCIENCE, MULTIDISCIPLINARY | 2188495 |
| 596 | 3 | RESISTIVE SWITCHING//MEMRISTOR//RRAM | 14780 |
| 4165 | 2 | ULTRASONIC EMISSION//NANOCRYSTALLINE POROUS SILICON//THERMOACOUSTIC EFFECT | 600 |
| 25655 | 1 | AG CLUSTER FILM//BETA DIKETONATE EU//CONDUCTANCE FLUCTUATION AND DEGENERACY | 298 |
Terms with highest relevance score |
| rank | Category | termType | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|---|
| 1 | AG CLUSTER FILM | authKW | 141013 | 1% | 67% | 2 |
| 2 | BETA DIKETONATE EU | authKW | 105761 | 0% | 100% | 1 |
| 3 | CONDUCTANCE FLUCTUATION AND DEGENERACY | authKW | 105761 | 0% | 100% | 1 |
| 4 | CU ISLAND FILM | authKW | 105761 | 0% | 100% | 1 |
| 5 | DIFFERENTIAL NEGATIVE RESISTANCE PROPERTIES | authKW | 105761 | 0% | 100% | 1 |
| 6 | ELECTRON STIMULATED PHOTON EMISSION | authKW | 105761 | 0% | 100% | 1 |
| 7 | EMISSION ELECTRON MICROSCOPY EEM | authKW | 105761 | 0% | 100% | 1 |
| 8 | EVAPORATED SILICON OXIDE SIOX | authKW | 105761 | 0% | 100% | 1 |
| 9 | GAS PULSING TECHNIQUE | authKW | 105761 | 0% | 100% | 1 |
| 10 | GE NANOPARTICLE FILM | authKW | 105761 | 0% | 100% | 1 |
Web of Science journal categories |
| chi_square_rank | Category | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | Materials Science, Coatings & Films | 1637 | 17% | 0% | 51 |
| 2 | Physics, Applied | 1275 | 43% | 0% | 127 |
| 3 | Physics, Condensed Matter | 1074 | 32% | 0% | 96 |
| 4 | Materials Science, Multidisciplinary | 948 | 41% | 0% | 121 |
| 5 | Engineering, Electrical & Electronic | 422 | 24% | 0% | 71 |
| 6 | Physics, Multidisciplinary | 36 | 7% | 0% | 20 |
| 7 | Materials Science, Ceramics | 13 | 2% | 0% | 5 |
| 8 | Electrochemistry | 7 | 2% | 0% | 6 |
| 9 | Nanoscience & Nanotechnology | 4 | 2% | 0% | 7 |
| 10 | Chemistry, Physical | 2 | 5% | 0% | 16 |
Address terms |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | OPT MEASUREMENT THIN FILM SHANXI PROV | 105761 | 0% | 100% | 1 |
| 2 | SCI TECHNOL PHYS SETAGAYA KU | 105761 | 0% | 100% | 1 |
| 3 | PHYS SPACE NANOSCALE PHYS | 35252 | 0% | 33% | 1 |
| 4 | MICROELECT INFORMAT SCI | 26439 | 0% | 25% | 1 |
| 5 | CERAM GLASS ENGN CICECO | 3645 | 0% | 3% | 1 |
| 6 | THIN FILMS | 2514 | 1% | 1% | 2 |
| 7 | MICROELECT INFORMAT | 1853 | 0% | 2% | 1 |
| 8 | FRITZ HABER | 1479 | 3% | 0% | 8 |
| 9 | YAROSLAVL BRANCH | 1200 | 0% | 1% | 1 |
| 10 | LENS | 660 | 1% | 0% | 2 |
Journals |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | INTERNATIONAL JOURNAL OF ELECTRONICS | 82727 | 21% | 1% | 62 |
| 2 | THIN SOLID FILMS | 6096 | 15% | 0% | 46 |
| 3 | PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | 2235 | 7% | 0% | 21 |
| 4 | JOURNAL OF MATERIALS SCIENCE LETTERS | 1370 | 4% | 0% | 12 |
| 5 | JOURNAL OF MATERIALS SCIENCE | 990 | 6% | 0% | 17 |
| 6 | TELECOMMUNICATIONS AND RADIO ENGINEERING | 759 | 0% | 1% | 1 |
| 7 | TECHNICAL PHYSICS | 646 | 2% | 0% | 6 |
| 8 | PROGRESS IN SURFACE SCIENCE | 591 | 1% | 0% | 2 |
| 9 | VACUUM | 521 | 2% | 0% | 7 |
| 10 | ZHURNAL TEKHNICHESKOI FIZIKI | 426 | 2% | 0% | 5 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Classes with closest relation at Level 1 |