Class information for: |
Basic class information |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
1 | 4 | PHYSICS, CONDENSED MATTER//PHYSICS, APPLIED//MATERIALS SCIENCE, MULTIDISCIPLINARY | 2188495 |
64 | 3 | SEMICONDUCTOR LASERS//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 89567 |
26 | 2 | SUPERLATTICES AND MICROSTRUCTURES//QUANTUM WELLS//PHYSICS, CONDENSED MATTER | 34827 |
11596 | 1 | PHOTOREFLECTANCE//FRANZ KELDYSH OSCILLATIONS//NEW YORK STATE ADV TECHNOL ULTRAFAST PHOTON M | 996 |
Terms with highest relevance score |
rank | Category | termType | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|---|
1 | PHOTOREFLECTANCE | authKW | 880386 | 9% | 32% | 87 |
2 | FRANZ KELDYSH OSCILLATIONS | authKW | 263669 | 2% | 56% | 15 |
3 | NEW YORK STATE ADV TECHNOL ULTRAFAST PHOTON M | address | 168988 | 3% | 21% | 25 |
4 | FIELD INDUCED CHANGE IN THE PSEUDODIELECTRIC FUNCTION | authKW | 158209 | 1% | 100% | 5 |
5 | PHOTOELLIPSOMETRY | authKW | 158209 | 1% | 100% | 5 |
6 | CONTACTLESS ELECTROREFLECTANCE | authKW | 128140 | 1% | 45% | 9 |
7 | FRANZ KELDYSH THEORY | authKW | 126567 | 0% | 100% | 4 |
8 | ELECTROREFLECTANCE | authKW | 112868 | 2% | 21% | 17 |
9 | EPSRC CENT IL 3 5 | address | 71193 | 0% | 75% | 3 |
10 | ELECTROLYTE ELECTROREFLECTANCE SPECTROSCOPY | authKW | 63284 | 0% | 100% | 2 |
Web of Science journal categories |
chi_square_rank | Category | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | Physics, Applied | 7515 | 55% | 0% | 552 |
2 | Physics, Condensed Matter | 5163 | 38% | 0% | 380 |
3 | Materials Science, Coatings & Films | 540 | 6% | 0% | 57 |
4 | Materials Science, Multidisciplinary | 272 | 15% | 0% | 148 |
5 | Engineering, Electrical & Electronic | 225 | 11% | 0% | 113 |
6 | Physics, Multidisciplinary | 221 | 8% | 0% | 84 |
7 | Nanoscience & Nanotechnology | 115 | 5% | 0% | 47 |
8 | Optics | 80 | 5% | 0% | 52 |
9 | Crystallography | 29 | 2% | 0% | 21 |
10 | Instruments & Instrumentation | 23 | 2% | 0% | 24 |
Address terms |
chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | NEW YORK STATE ADV TECHNOL ULTRAFAST PHOTON M | 168988 | 3% | 21% | 25 |
2 | EPSRC CENT IL 3 5 | 71193 | 0% | 75% | 3 |
3 | HIGH CONCENTRAT PHOTOVOLTA PROJECT | 63284 | 0% | 100% | 2 |
4 | URA 0357 | 63284 | 0% | 100% | 2 |
5 | ELE ELECT ENGN NANOELE | 56953 | 0% | 60% | 3 |
6 | MICROWAVE DEVICE DEV | 42188 | 0% | 67% | 2 |
7 | ADV ELECT OPT SCIAREA SOLID STATE ELECT | 31642 | 0% | 100% | 1 |
8 | BLECHMAMMER | 31642 | 0% | 100% | 1 |
9 | ELE ELE TECHNOL | 31642 | 0% | 100% | 1 |
10 | ELE ON SEMICOND | 31642 | 0% | 100% | 1 |
Journals |
chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | JOURNAL OF APPLIED PHYSICS | 9466 | 18% | 0% | 180 |
2 | SUPERLATTICES AND MICROSTRUCTURES | 4858 | 3% | 0% | 32 |
3 | APPLIED PHYSICS LETTERS | 3503 | 11% | 0% | 113 |
4 | SEMICONDUCTOR SCIENCE AND TECHNOLOGY | 2999 | 3% | 0% | 28 |
5 | ADVANCED MATERIALS FOR OPTICS AND ELECTRONICS | 2203 | 0% | 2% | 4 |
6 | SEMICONDUCTORS | 1789 | 2% | 0% | 20 |
7 | PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | 1718 | 3% | 0% | 34 |
8 | SOLID STATE COMMUNICATIONS | 1455 | 4% | 0% | 35 |
9 | PHYSICAL REVIEW B | 1060 | 8% | 0% | 79 |
10 | PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES | 1059 | 2% | 0% | 17 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Classes with closest relation at Level 1 |