Class information for:
Level 1: HIPIMS//HPPMS//HIGH POWER IMPULSE MAGNETRON SPUTTERING

Basic class information
Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
15 4 METALLURGY & METALLURGICAL ENGINEERING//MATERIALS SCIENCE, MULTIDISCIPLINARY//MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING 827627
419 3       PLASMA SOURCES SCIENCE & TECHNOLOGY//REVIEW OF SCIENTIFIC INSTRUMENTS//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 30297
2467 2             HIPIMS//PNCA//HPPMS 4221
2132 1                   HIPIMS//HPPMS//HIGH POWER IMPULSE MAGNETRON SPUTTERING 2382

Terms with highest relevance score


rank Category termType chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 HIPIMS authKW 1106196 5% 65% 129
2 HPPMS authKW 400163 2% 69% 44
3 HIGH POWER IMPULSE MAGNETRON SPUTTERING authKW 345559 2% 57% 46
4 MAGNETRON authKW 282732 4% 25% 87
5 REACTIVE SPUTTERING authKW 266559 5% 15% 131
6 IFM MAT PHYS address 253188 1% 55% 35
7 PLASMA COATINGS PHYS address 202263 1% 53% 29
8 GRP DRAFT address 182463 1% 69% 20
9 HIGH POWER PULSED MAGNETRON SPUTTERING authKW 151176 1% 57% 20
10 MAGNETRON SPUTTERING authKW 150300 9% 6% 203

Web of Science journal categories


chi_square_rank Category chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 Materials Science, Coatings & Films 75249 40% 1% 961
2 Physics, Applied 35910 77% 0% 1831
3 Physics, Fluids & Plasmas 5198 12% 0% 282
4 Materials Science, Multidisciplinary 2246 24% 0% 572
5 Physics, Condensed Matter 1421 15% 0% 347
6 Nanoscience & Nanotechnology 61 3% 0% 67
7 Instruments & Instrumentation 42 2% 0% 53
8 Physics, Multidisciplinary 19 3% 0% 75
9 Metallurgy & Metallurgical Engineering 5 2% 0% 37
10 Polymer Science 5 2% 0% 44

Address terms


chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 IFM MAT PHYS 253188 1% 55% 35
2 PLASMA COATINGS PHYS 202263 1% 53% 29
3 GRP DRAFT 182463 1% 69% 20
4 CHIM INORGAN ANALYT 119207 1% 35% 26
5 PHYS VVI 89418 1% 52% 13
6 NANOTECHNOL PVD 80617 1% 38% 16
7 SPACE PLASMA PHYS 63894 1% 17% 29
8 SOLID STATE SCI 62212 3% 6% 79
9 CHIM INTERACT PLASMA SUR E CHIPS 57602 1% 31% 14
10 ADV MAT SUR E ENGN 57508 0% 43% 10

Journals


chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 94384 13% 2% 319
2 SURFACE & COATINGS TECHNOLOGY 80502 15% 2% 350
3 PLASMA SOURCES SCIENCE & TECHNOLOGY 54844 5% 4% 109
4 VACUUM 51549 8% 2% 195
5 THIN SOLID FILMS 19230 10% 1% 232
6 PLASMA PROCESSES AND POLYMERS 14511 2% 3% 43
7 VAKUUM-TECHNIK 12107 0% 8% 11
8 JOURNAL OF PHYSICS D-APPLIED PHYSICS 9137 5% 1% 123
9 VIDE-SCIENCE TECHNIQUE ET APPLICATIONS 8858 1% 4% 18
10 IEEE TRANSACTIONS ON PLASMA SCIENCE 4513 2% 1% 59

Author Key Words


chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass LCSH search Wikipedia search
1 HIPIMS 1106196 5% 65% 129 Search HIPIMS Search HIPIMS
2 HPPMS 400163 2% 69% 44 Search HPPMS Search HPPMS
3 HIGH POWER IMPULSE MAGNETRON SPUTTERING 345559 2% 57% 46 Search HIGH+POWER+IMPULSE+MAGNETRON+SPUTTERING Search HIGH+POWER+IMPULSE+MAGNETRON+SPUTTERING
4 MAGNETRON 282732 4% 25% 87 Search MAGNETRON Search MAGNETRON
5 REACTIVE SPUTTERING 266559 5% 15% 131 Search REACTIVE+SPUTTERING Search REACTIVE+SPUTTERING
6 HIGH POWER PULSED MAGNETRON SPUTTERING 151176 1% 57% 20 Search HIGH+POWER+PULSED+MAGNETRON+SPUTTERING Search HIGH+POWER+PULSED+MAGNETRON+SPUTTERING
7 MAGNETRON SPUTTERING 150300 9% 6% 203 Search MAGNETRON+SPUTTERING Search MAGNETRON+SPUTTERING
8 IONIZED PHYSICAL VAPOR DEPOSITION 149048 1% 87% 13 Search IONIZED+PHYSICAL+VAPOR+DEPOSITION Search IONIZED+PHYSICAL+VAPOR+DEPOSITION
9 HIGH POWER IMPULSE MAGNETRON SPUTTERING HIPIMS 138888 1% 50% 21 Search HIGH+POWER+IMPULSE+MAGNETRON+SPUTTERING+HIPIMS Search HIGH+POWER+IMPULSE+MAGNETRON+SPUTTERING+HIPIMS
10 MAGNETRON DISCHARGE 127429 1% 57% 17 Search MAGNETRON+DISCHARGE Search MAGNETRON+DISCHARGE

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.

Classes with closest relation at Level 1


rank cluster_id2 link
1 31572 TRIODE ION PLATING//ENERGY RESOLVED MASS SPECTROSCOPY//HOLLOW CATHODE ARC PLASMA
2 38234 ALUMINUM MATRIX NANOCOMPOSITE FILM//ELECTRON BEAM EVAPORATIVE PVD//HIGHLY SUPERSATURATED SOLID SOLUTION
3 26187 PLANE PLASMA DISCHARGE//ELECT ENGN SEMICOND//IN SITU GRAZING INCIDENCE X RAY DIFFRACTOMETRY GIXRD
4 3225 TITANIUM NITRIDE//ZIRCONIUM NITRIDE//ZIRCONIUM OXYNITRIDE
5 26765 HOLLOW CATHODE//FUSED HOLLOW CATHODE//PLASMA GRP
6 11980 AL CR2O 3//KAPPA AL2O3//ALUMINUM OXIDE
7 35530 OPTICAL MOUSE//OPTICAL MOUSE SENSOR//PG PL ELECT
8 33150 AU NI50FE50//BIASED DC PLASMA SPUTTERING//HCL DOPED POLYANILINE
9 20657 ION BEAM ASSISTED DEPOSITION//DYNAMIC ION BEAM MIXING//DYNAMIC MIXING METHOD
10 22409 HILLOCKS//SUR E EVALUAT//ARRAY PROC TECHNOL GRP

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