Class information for: |
Basic class information |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
| Cluster id | Level | Cluster label | #P |
|---|---|---|---|
| 1 | 4 | PHYSICS, CONDENSED MATTER//PHYSICS, APPLIED//MATERIALS SCIENCE, MULTIDISCIPLINARY | 2188495 |
| 160 | 3 | IEEE TRANSACTIONS ON MAGNETICS//JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS//JOURNAL OF APPLIED PHYSICS | 62635 |
| 2133 | 2 | IRON NITRIDE//IEEE TRANSACTIONS ON MAGNETICS//MICROINDUCTOR | 5396 |
| 33150 | 1 | AU NI50FE50//BIASED DC PLASMA SPUTTERING//HCL DOPED POLYANILINE | 142 |
Terms with highest relevance score |
| rank | Category | termType | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|---|
| 1 | AU NI50FE50 | authKW | 443901 | 1% | 100% | 2 |
| 2 | BIASED DC PLASMA SPUTTERING | authKW | 443901 | 1% | 100% | 2 |
| 3 | HCL DOPED POLYANILINE | authKW | 332923 | 2% | 50% | 3 |
| 4 | ATOMIC FORCE MEASUREMENTS | authKW | 221951 | 1% | 100% | 1 |
| 5 | AU CR BILAYER FILM | authKW | 221951 | 1% | 100% | 1 |
| 6 | AU NI30FE70 | authKW | 221951 | 1% | 100% | 1 |
| 7 | AU NI80FE20 | authKW | 221951 | 1% | 100% | 1 |
| 8 | BIASED PLASMA SPUTTER DEPOSITION | authKW | 221951 | 1% | 100% | 1 |
| 9 | CHROMIUM BILAYER FILM | authKW | 221951 | 1% | 100% | 1 |
| 10 | COPPER DEPOSITIONS | authKW | 221951 | 1% | 100% | 1 |
Web of Science journal categories |
| chi_square_rank | Category | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | Materials Science, Coatings & Films | 2163 | 28% | 0% | 40 |
| 2 | Physics, Applied | 994 | 54% | 0% | 76 |
| 3 | Physics, Condensed Matter | 851 | 41% | 0% | 58 |
| 4 | Materials Science, Multidisciplinary | 475 | 42% | 0% | 59 |
| 5 | Mining & Mineral Processing | 153 | 4% | 0% | 5 |
| 6 | Materials Science, Ceramics | 22 | 3% | 0% | 4 |
| 7 | Engineering, Electrical & Electronic | 22 | 10% | 0% | 14 |
| 8 | Instruments & Instrumentation | 16 | 4% | 0% | 6 |
| 9 | Crystallography | 9 | 3% | 0% | 4 |
| 10 | Nanoscience & Nanotechnology | 7 | 4% | 0% | 5 |
Address terms |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | THE ANGSTROM | 221951 | 1% | 100% | 1 |
| 2 | ECS ENGN | 110974 | 1% | 50% | 1 |
| 3 | ENGN PL PHYS AOBA KU | 110974 | 1% | 50% | 1 |
| 4 | S IPNS | 110974 | 1% | 50% | 1 |
| 5 | INORGAN CHEM SUR ES | 63411 | 1% | 14% | 2 |
| 6 | IJA DEV GRP | 55486 | 1% | 25% | 1 |
| 7 | CNBC | 24659 | 1% | 11% | 1 |
| 8 | PL PHYS CHEM | 21626 | 10% | 1% | 14 |
| 9 | DATA STORAGE MAT | 12329 | 1% | 6% | 1 |
| 10 | FCIPT | 12158 | 1% | 3% | 2 |
Journals |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | JOURNAL OF UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING | 5451 | 4% | 0% | 5 |
| 2 | THIN SOLID FILMS | 2665 | 15% | 0% | 21 |
| 3 | ZEITSCHRIFT FUR PHYSIK B-CONDENSED MATTER | 2621 | 5% | 0% | 7 |
| 4 | VACUUM | 1450 | 6% | 0% | 8 |
| 5 | IET SCIENCE MEASUREMENT & TECHNOLOGY | 1241 | 1% | 0% | 2 |
| 6 | EMERGING MATERIALS RESEARCH | 1002 | 1% | 0% | 1 |
| 7 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 987 | 6% | 0% | 8 |
| 8 | MICROELECTRONICS JOURNAL | 898 | 3% | 0% | 4 |
| 9 | NIPPON SERAMIKKUSU KYOKAI GAKUJUTSU RONBUNSHI-JOURNAL OF THE CERAMIC SOCIETY OF JAPAN | 638 | 1% | 0% | 2 |
| 10 | MICROELECTRONICS INTERNATIONAL | 623 | 1% | 0% | 1 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Classes with closest relation at Level 1 |