Class information for: |
Basic class information |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
| Cluster id | Level | Cluster label | #P |
|---|---|---|---|
| 1 | 4 | PHYSICS, CONDENSED MATTER//PHYSICS, APPLIED//MATERIALS SCIENCE, MULTIDISCIPLINARY | 2188495 |
| 51 | 3 | SURFACE SCIENCE//PHYSICS, CONDENSED MATTER//SCANNING TUNNELING MICROSCOPY | 97901 |
| 1521 | 2 | SURFACE DIFFUSION//SURFACE INDUCED DISSOCIATION//LIQUID SUBSTRATE | 7744 |
| 21092 | 1 | SOLID ELECTROLYTIC CAPACITOR//IONIZED CLUSTER BEAM DEPOSITION//LANGMUIR SORPTION MODEL | 456 |
Terms with highest relevance score |
| rank | Category | termType | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|---|
| 1 | SOLID ELECTROLYTIC CAPACITOR | authKW | 221166 | 1% | 80% | 4 |
| 2 | IONIZED CLUSTER BEAM DEPOSITION | authKW | 157074 | 1% | 45% | 5 |
| 3 | LANGMUIR SORPTION MODEL | authKW | 155507 | 1% | 75% | 3 |
| 4 | ALUMINUM SOLID ELECTROLYTE CAPACITORS | authKW | 138230 | 0% | 100% | 2 |
| 5 | CHALCOPYRITE TYPE COMPOUNDS | authKW | 138230 | 0% | 100% | 2 |
| 6 | CONTACT FILL | authKW | 138230 | 0% | 100% | 2 |
| 7 | NANOPOROUS TANTALUM | authKW | 138230 | 0% | 100% | 2 |
| 8 | SINGLE CRYSTAL ALUMINUM FILM | authKW | 138230 | 0% | 100% | 2 |
| 9 | SPREADING INDEX | authKW | 138230 | 0% | 100% | 2 |
| 10 | ION CLUSTER BEAM DEPOSITION | authKW | 92152 | 0% | 67% | 2 |
Web of Science journal categories |
| chi_square_rank | Category | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | Physics, Applied | 2681 | 49% | 0% | 225 |
| 2 | Materials Science, Coatings & Films | 1942 | 15% | 0% | 69 |
| 3 | Physics, Nuclear | 555 | 11% | 0% | 49 |
| 4 | Nuclear Science & Technology | 553 | 11% | 0% | 49 |
| 5 | Instruments & Instrumentation | 529 | 11% | 0% | 52 |
| 6 | Physics, Atomic, Molecular & Chemical | 451 | 13% | 0% | 61 |
| 7 | Physics, Condensed Matter | 410 | 17% | 0% | 79 |
| 8 | Materials Science, Multidisciplinary | 336 | 22% | 0% | 99 |
| 9 | Electrochemistry | 177 | 6% | 0% | 27 |
| 10 | Physics, Multidisciplinary | 73 | 7% | 0% | 34 |
Address terms |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | C ACITOR BUSINESS UNIT | 69115 | 0% | 100% | 1 |
| 2 | CNRSSPRAMUMR 5819DRFMC | 69115 | 0% | 100% | 1 |
| 3 | ELE MAT ENGN YU SEUNG KU | 69115 | 0% | 100% | 1 |
| 4 | ION BEAM ENGN EXPTL | 69115 | 0% | 100% | 1 |
| 5 | KERNVERFAHRENSTECH | 69115 | 0% | 100% | 1 |
| 6 | NUCL ANAN TECHNIQUES | 69115 | 0% | 100% | 1 |
| 7 | TUEDUK GU | 69115 | 0% | 100% | 1 |
| 8 | UL ENGN OURCE SCI | 69115 | 0% | 100% | 1 |
| 9 | ADV NUCL MAT | 47844 | 1% | 23% | 3 |
| 10 | DIMES S | 34556 | 0% | 50% | 1 |
Journals |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 5155 | 11% | 0% | 49 |
| 2 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 4931 | 7% | 0% | 32 |
| 3 | JOURNAL OF APPLIED MECHANICS AND TECHNICAL PHYSICS | 3070 | 2% | 1% | 7 |
| 4 | ZEITSCHRIFT FUR PHYSIK D-ATOMS MOLECULES AND CLUSTERS | 2148 | 2% | 0% | 9 |
| 5 | ELECTROCHEMISTRY | 1880 | 2% | 0% | 8 |
| 6 | THIN SOLID FILMS | 965 | 5% | 0% | 23 |
| 7 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 903 | 3% | 0% | 15 |
| 8 | DENKI KAGAKU | 892 | 1% | 0% | 6 |
| 9 | HIGH TEMPERATURE | 849 | 2% | 0% | 7 |
| 10 | JOURNAL OF SURFACE INVESTIGATION | 834 | 1% | 0% | 4 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Classes with closest relation at Level 1 |