Class information for: |
Basic class information |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Terms with highest relevance score |
| rank | Category | termType | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|---|
| 1 | HIGH FREQUENCY ELECTRON CURRENT | authKW | 1350734 | 4% | 100% | 3 |
| 2 | MICROWAVE RESONATOR METHOD | authKW | 1350734 | 4% | 100% | 3 |
| 3 | TEMPORAL ELECTRON RELAXATION | authKW | 1350734 | 4% | 100% | 3 |
| 4 | ELECTRON DENSITY DETERMINATION BY MICROWAVES | authKW | 900490 | 3% | 100% | 2 |
| 5 | TIME DEPENDENT BOLTZMANN EQUATION | authKW | 810438 | 4% | 60% | 3 |
| 6 | ANISOTROPIC PATTERNING | authKW | 450245 | 1% | 100% | 1 |
| 7 | CALCULATED 3 DIMENSIONAL SPATIAL DISTRIBUTION OF RADICAL DENSITY | authKW | 450245 | 1% | 100% | 1 |
| 8 | CH4 PLASMA WITH PARALLEL ELECTRODES | authKW | 450245 | 1% | 100% | 1 |
| 9 | ELECT ATSUTA KU | address | 450245 | 1% | 100% | 1 |
| 10 | ELECT ELECT ENGN TEMPAKU KU | address | 450245 | 1% | 100% | 1 |
Web of Science journal categories |
| chi_square_rank | Category | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | Physics, Fluids & Plasmas | 850 | 27% | 0% | 19 |
| 2 | Physics, Applied | 349 | 46% | 0% | 32 |
| 3 | Materials Science, Coatings & Films | 126 | 10% | 0% | 7 |
| 4 | Physics, Atomic, Molecular & Chemical | 80 | 14% | 0% | 10 |
| 5 | Chemistry, Physical | 41 | 19% | 0% | 13 |
| 6 | Spectroscopy | 25 | 6% | 0% | 4 |
| 7 | Optics | 21 | 9% | 0% | 6 |
| 8 | Engineering, Chemical | 7 | 6% | 0% | 4 |
| 9 | Nanoscience & Nanotechnology | 6 | 4% | 0% | 3 |
| 10 | Materials Science, Composites | 5 | 1% | 0% | 1 |
Address terms |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | ELECT ATSUTA KU | 450245 | 1% | 100% | 1 |
| 2 | ELECT ELECT ENGN TEMPAKU KU | 450245 | 1% | 100% | 1 |
| 3 | EXPT PHYS AG LASER PLASM HYS 5 | 450245 | 1% | 100% | 1 |
| 4 | QIMONDA D DEN | 450245 | 1% | 100% | 1 |
| 5 | BACK END LINE | 225121 | 1% | 50% | 1 |
| 6 | HH STRALSUND | 112560 | 1% | 25% | 1 |
| 7 | UPMCCNRS | 22510 | 1% | 5% | 1 |
| 8 | TU D DEN | 15006 | 1% | 3% | 1 |
| 9 | PHYS TECHNOL PLASMAS | 12503 | 3% | 1% | 2 |
| 10 | INGN MAT HAUTES P S | 10978 | 3% | 1% | 2 |
Journals |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | CONTRIBUTIONS TO PLASMA PHYSICS | 8871 | 10% | 0% | 7 |
| 2 | PLASMA SOURCES SCIENCE & TECHNOLOGY | 5665 | 9% | 0% | 6 |
| 3 | ZEITSCHRIFT FUR PHYSIKALISCHE CHEMIE-LEIPZIG | 5141 | 6% | 0% | 4 |
| 4 | PLASMA CHEMISTRY AND PLASMA PROCESSING | 4827 | 6% | 0% | 4 |
| 5 | BEITRAGE AUS DER PLASMAPHYSIK-CONTRIBUTIONS TO PLASMA PHYSICS | 4640 | 1% | 1% | 1 |
| 6 | JOURNAL OF NON-EQUILIBRIUM THERMODYNAMICS | 525 | 1% | 0% | 1 |
| 7 | CHEMICAL VAPOR DEPOSITION | 451 | 1% | 0% | 1 |
| 8 | PLASTICS RUBBER AND COMPOSITES | 398 | 1% | 0% | 1 |
| 9 | MICROELECTRONIC ENGINEERING | 387 | 4% | 0% | 3 |
| 10 | IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING | 280 | 1% | 0% | 1 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Classes with closest relation at Level 1 |