Class information for:
Level 1: SIO2 ETCHING//PLASMA ETCHING//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Basic class information
Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
15 4 METALLURGY & METALLURGICAL ENGINEERING//MATERIALS SCIENCE, MULTIDISCIPLINARY//MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING 827627
419 3       PLASMA SOURCES SCIENCE & TECHNOLOGY//REVIEW OF SCIENTIFIC INSTRUMENTS//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 30297
1480 2             PLASMA ETCHING//ELECT DEVICES MAT TECHNOL//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 7897
1654 1                   SIO2 ETCHING//PLASMA ETCHING//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 2575

Terms with highest relevance score


rank Category termType chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 SIO2 ETCHING authKW 261324 1% 69% 31
2 PLASMA ETCHING authKW 258740 5% 17% 123
3 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A journal 189869 18% 3% 470
4 RIE LAG authKW 179882 1% 70% 21
5 FLUOROCARBON PLASMA authKW 137724 1% 51% 22
6 TECHNOL MICROELECT address 121898 2% 24% 42
7 CF2 authKW 119706 1% 65% 15
8 ELECTRON SHADING authKW 99124 0% 90% 9
9 IRLAS authKW 97902 0% 100% 8
10 ULTRAHIGH FREQUENCY PLASMA authKW 97902 0% 100% 8

Web of Science journal categories


chi_square_rank Category chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 Physics, Applied 40594 79% 0% 2022
2 Materials Science, Coatings & Films 38529 28% 0% 719
3 Nanoscience & Nanotechnology 9254 21% 0% 545
4 Engineering, Electrical & Electronic 3549 24% 0% 606
5 Physics, Fluids & Plasmas 1587 7% 0% 169
6 Electrochemistry 530 5% 0% 116
7 Materials Science, Multidisciplinary 341 12% 0% 299
8 Instruments & Instrumentation 324 4% 0% 113
9 Physics, Condensed Matter 287 8% 0% 198
10 Optics 148 5% 0% 120

Address terms


chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 TECHNOL MICROELECT 121898 2% 24% 42
2 LSI BASIC 76245 0% 69% 9
3 MAT MACHINERY GRP 61189 0% 100% 5
4 SI SYST S 48951 0% 100% 4
5 ADV PLASMA SUR E TECHNOL 39789 1% 10% 34
6 ENVIRONM BENIGN ETCHING TECHNOL 39159 0% 80% 4
7 ATTO 36713 0% 100% 3
8 CHEM ENGN ELECT ENGN COMP SCI 36713 0% 100% 3
9 T PJT MEMORY DEVICE SOLUT NETWORK 36713 0% 100% 3
10 PLASMA SUR E INTERACT 36707 0% 50% 6

Journals


chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 189869 18% 3% 470
2 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 67212 12% 2% 304
3 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 23790 10% 1% 247
4 PLASMA SOURCES SCIENCE & TECHNOLOGY 23328 3% 3% 74
5 MICROELECTRONIC ENGINEERING 11445 4% 1% 99
6 JOURNAL OF MICROMECHANICS AND MICROENGINEERING 6179 2% 1% 54
7 JOURNAL OF THE ELECTROCHEMICAL SOCIETY 5187 5% 0% 116
8 JOURNAL OF APPLIED PHYSICS 3947 7% 0% 192
9 PLASMA CHEMISTRY AND PLASMA PROCESSING 3932 1% 1% 22
10 JAPANESE JOURNAL OF APPLIED PHYSICS 3738 3% 0% 72

Author Key Words


chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass LCSH search Wikipedia search
1 SIO2 ETCHING 261324 1% 69% 31 Search SIO2+ETCHING Search SIO2+ETCHING
2 PLASMA ETCHING 258740 5% 17% 123 Search PLASMA+ETCHING Search PLASMA+ETCHING
3 RIE LAG 179882 1% 70% 21 Search RIE+LAG Search RIE+LAG
4 FLUOROCARBON PLASMA 137724 1% 51% 22 Search FLUOROCARBON+PLASMA Search FLUOROCARBON+PLASMA
5 CF2 119706 1% 65% 15 Search CF2 Search CF2
6 ELECTRON SHADING 99124 0% 90% 9 Search ELECTRON+SHADING Search ELECTRON+SHADING
7 IRLAS 97902 0% 100% 8 Search IRLAS Search IRLAS
8 ULTRAHIGH FREQUENCY PLASMA 97902 0% 100% 8 Search ULTRAHIGH+FREQUENCY+PLASMA Search ULTRAHIGH+FREQUENCY+PLASMA
9 C4F8 92241 1% 54% 14 Search C4F8 Search C4F8
10 CF2 RADICAL 87022 0% 89% 8 Search CF2+RADICAL Search CF2+RADICAL

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.

Classes with closest relation at Level 1


rank cluster_id2 link
1 7198 SOLID STATE TECHNOLOGY//AFTER CORROSION//AL SI CU ETCHING
2 17105 ATOMIC LAYER ETCHING//GATE CHARGING//NEUTRAL BEAM ETCHING
3 16132 ELECT DEVICES MAT TECHNOL//ETCH MECHANISM//MICROELECT DEVICES MAT TECHNOL
4 38080 HIGH FREQUENCY ELECTRON CURRENT//MICROWAVE RESONATOR METHOD//TEMPORAL ELECTRON RELAXATION
5 37861 NEUTRAL LOOP DISCHARGE//MAGNETIC NEUTRAL LINE//ELECTRON MEANDERING MOTION
6 741 PLASMA SOURCES SCIENCE & TECHNOLOGY//CAPACITIVELY COUPLED PLASMA//PLASMA ATOM PHYS
7 22057 POST ETCHING TREATMENTS//111 SPLIT INTERSTITIAL//AL1 WT PERCENT SI
8 28566 NISHI YODOGAWA KU//MEMS NANOTECHNOL EXCHANGE//FLETCHER
9 21866 FLUORINATED AMORPHOUS CARBON//A C F//FLUORINATED AMORPHOUS CARBON FILMS
10 28137 WET ETCHING OF GLASS//EBEP//CURRENT BALANCE EQUATION

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