Class information for: |
Basic class information |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Terms with highest relevance score |
| rank | Category | termType | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|---|
| 1 | PLASMA SOURCES SCIENCE & TECHNOLOGY | journal | 485929 | 12% | 13% | 372 |
| 2 | CAPACITIVELY COUPLED PLASMA | authKW | 311946 | 2% | 53% | 59 |
| 3 | PLASMA ATOM PHYS | address | 183726 | 1% | 43% | 43 |
| 4 | INDUCTIVELY COUPLED PLASMA | authKW | 180491 | 4% | 14% | 125 |
| 5 | RF DISCHARGE | authKW | 156541 | 2% | 28% | 56 |
| 6 | ELECTRICAL ASYMMETRY EFFECT | authKW | 140540 | 0% | 100% | 14 |
| 7 | LADDER SHAPED ELECTRODE | authKW | 130501 | 0% | 100% | 13 |
| 8 | PLASMA SCI TECHNOL | address | 120656 | 2% | 17% | 71 |
| 9 | LANGMUIR PROBE | authKW | 115006 | 3% | 14% | 81 |
| 10 | VHF PLASMA | authKW | 113232 | 1% | 59% | 19 |
Web of Science journal categories |
| chi_square_rank | Category | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | Physics, Fluids & Plasmas | 59868 | 34% | 1% | 1063 |
| 2 | Physics, Applied | 21035 | 52% | 0% | 1646 |
| 3 | Materials Science, Coatings & Films | 8045 | 12% | 0% | 372 |
| 4 | Physics, Multidisciplinary | 425 | 7% | 0% | 220 |
| 5 | Physics, Mathematical | 236 | 3% | 0% | 98 |
| 6 | Instruments & Instrumentation | 203 | 3% | 0% | 107 |
| 7 | Physics, Condensed Matter | 50 | 4% | 0% | 139 |
| 8 | Materials Science, Multidisciplinary | 46 | 7% | 0% | 209 |
| 9 | Computer Science, Interdisciplinary Applications | 16 | 1% | 0% | 41 |
| 10 | Nanoscience & Nanotechnology | 3 | 1% | 0% | 46 |
Address terms |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | PLASMA ATOM PHYS | 183726 | 1% | 43% | 43 |
| 2 | PLASMA SCI TECHNOL | 120656 | 2% | 17% | 71 |
| 3 | PLASMA PROC | 108712 | 2% | 21% | 51 |
| 4 | PHYS TECHNOL PLASMAS | 66945 | 1% | 22% | 31 |
| 5 | THEORET ELECT ENGN | 56997 | 1% | 20% | 29 |
| 6 | ELECT ENGN COMP SCI 1770 | 49185 | 0% | 70% | 7 |
| 7 | PHYS OPTOELECT TECHNOL | 46164 | 3% | 5% | 98 |
| 8 | LPP CNRS | 40985 | 0% | 58% | 7 |
| 9 | IMPEDANS LTD | 40154 | 0% | 100% | 4 |
| 10 | VACUUM TECHNOL | 38952 | 1% | 19% | 20 |
Journals |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | PLASMA SOURCES SCIENCE & TECHNOLOGY | 485929 | 12% | 13% | 372 |
| 2 | IEEE TRANSACTIONS ON PLASMA SCIENCE | 44091 | 7% | 2% | 210 |
| 3 | PHYSICS OF PLASMAS | 27857 | 7% | 1% | 234 |
| 4 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 24935 | 6% | 1% | 189 |
| 5 | JOURNAL OF PHYSICS D-APPLIED PHYSICS | 20925 | 7% | 1% | 213 |
| 6 | JOURNAL OF APPLIED PHYSICS | 14303 | 13% | 0% | 396 |
| 7 | PLASMA SCIENCE & TECHNOLOGY | 10564 | 2% | 2% | 50 |
| 8 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 5512 | 4% | 0% | 133 |
| 9 | PLASMA CHEMISTRY AND PLASMA PROCESSING | 5227 | 1% | 2% | 28 |
| 10 | CONTRIBUTIONS TO PLASMA PHYSICS | 5169 | 1% | 1% | 36 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Classes with closest relation at Level 1 |