Class information for:
Level 1: ATOMIC LAYER ETCHING//GATE CHARGING//NEUTRAL BEAM ETCHING

Basic class information
Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
15 4 METALLURGY & METALLURGICAL ENGINEERING//MATERIALS SCIENCE, MULTIDISCIPLINARY//MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING 827627
419 3       PLASMA SOURCES SCIENCE & TECHNOLOGY//REVIEW OF SCIENTIFIC INSTRUMENTS//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 30297
1480 2             PLASMA ETCHING//ELECT DEVICES MAT TECHNOL//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 7897
17105 1                   ATOMIC LAYER ETCHING//GATE CHARGING//NEUTRAL BEAM ETCHING 645

Terms with highest relevance score


rank Category termType chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 ATOMIC LAYER ETCHING authKW 478839 2% 70% 14
2 GATE CHARGING authKW 342034 1% 100% 7
3 NEUTRAL BEAM ETCHING authKW 287415 2% 59% 10
4 PLASMA INDUCED DAMAGE authKW 273610 2% 40% 14
5 CHARGING PROTECTION authKW 195448 1% 100% 4
6 NEUTRAL BEAM authKW 180717 4% 16% 23
7 PLASMA DAMAGE authKW 166104 3% 20% 17
8 CHARGING DAMAGE authKW 158301 1% 36% 9
9 ELECT DEVICE SYST BUSINESS GRP address 156357 1% 80% 4
10 PLASMA PROCESS INDUCED DAMAGE authKW 156357 1% 80% 4

Web of Science journal categories


chi_square_rank Category chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 Physics, Applied 9045 74% 0% 479
2 Materials Science, Coatings & Films 4063 18% 0% 118
3 Engineering, Electrical & Electronic 1923 33% 0% 214
4 Nanoscience & Nanotechnology 1168 15% 0% 99
5 Physics, Condensed Matter 310 13% 0% 86
6 Materials Science, Multidisciplinary 148 14% 0% 90
7 Optics 30 4% 0% 28
8 Engineering, Manufacturing 26 1% 0% 9
9 Electrochemistry 24 2% 0% 15
10 Physics, Fluids & Plasmas 23 2% 0% 13

Address terms


chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 ELECT DEVICE SYST BUSINESS GRP 156357 1% 80% 4
2 CCD BUSINESS UNITDEV 97724 0% 100% 2
3 CCD DEV 97724 0% 100% 2
4 CENT RELIABIL 97724 0% 100% 2
5 ENGN SYNTH BUNKYO KU 97724 0% 100% 2
6 FLUID SCI 92492 9% 3% 58
7 COMPONENT GRP 65148 0% 67% 2
8 ECOLE POLYTECHCNRS PHYS PLASMAS 65148 0% 67% 2
9 INTELLIGENT NANO PROC 65148 0% 67% 2
10 ADV BACK END LINE TECHNOL 48862 0% 100% 1

Journals


chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 IEEE ELECTRON DEVICE LETTERS 14183 8% 1% 52
2 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 10322 9% 0% 55
3 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 4697 9% 0% 55
4 JAPANESE JOURNAL OF APPLIED PHYSICS 4468 6% 0% 39
5 ACTA POLYTECHNICA SCANDINAVICA-CHEMICAL TECHNOLOGY SERIES 3828 0% 4% 2
6 MICROELECTRONICS RELIABILITY 3787 4% 0% 24
7 ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY 3297 2% 1% 10
8 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 2754 5% 0% 31
9 IEEE TRANSACTIONS ON ELECTRON DEVICES 2398 4% 0% 28
10 MICROELECTRONIC ENGINEERING 1857 3% 0% 20

Author Key Words


chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass LCSH search Wikipedia search
1 ATOMIC LAYER ETCHING 478839 2% 70% 14 Search ATOMIC+LAYER+ETCHING Search ATOMIC+LAYER+ETCHING
2 GATE CHARGING 342034 1% 100% 7 Search GATE+CHARGING Search GATE+CHARGING
3 NEUTRAL BEAM ETCHING 287415 2% 59% 10 Search NEUTRAL+BEAM+ETCHING Search NEUTRAL+BEAM+ETCHING
4 PLASMA INDUCED DAMAGE 273610 2% 40% 14 Search PLASMA+INDUCED+DAMAGE Search PLASMA+INDUCED+DAMAGE
5 CHARGING PROTECTION 195448 1% 100% 4 Search CHARGING+PROTECTION Search CHARGING+PROTECTION
6 NEUTRAL BEAM 180717 4% 16% 23 Search NEUTRAL+BEAM Search NEUTRAL+BEAM
7 PLASMA DAMAGE 166104 3% 20% 17 Search PLASMA+DAMAGE Search PLASMA+DAMAGE
8 CHARGING DAMAGE 158301 1% 36% 9 Search CHARGING+DAMAGE Search CHARGING+DAMAGE
9 PLASMA PROCESS INDUCED DAMAGE 156357 1% 80% 4 Search PLASMA+PROCESS+INDUCED+DAMAGE Search PLASMA+PROCESS+INDUCED+DAMAGE
10 PLASMA CHARGING DAMAGE 122150 1% 50% 5 Search PLASMA+CHARGING+DAMAGE Search PLASMA+CHARGING+DAMAGE

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.

Classes with closest relation at Level 1


rank cluster_id2 link
1 1654 SIO2 ETCHING//PLASMA ETCHING//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
2 22057 POST ETCHING TREATMENTS//111 SPLIT INTERSTITIAL//AL1 WT PERCENT SI
3 22941 SEMICOND EQUIPMENT OPERAT//NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS//ADV COMP SYST UNIT
4 34127 PLASMA LENS//INNOVAT PLASMA TECHNOL GRP//ION BEAM PLASMA
5 3071 STRESS INDUCED LEAKAGE CURRENT//OXIDE RELIABILITY//OXIDE BREAKDOWN
6 7198 SOLID STATE TECHNOLOGY//AFTER CORROSION//AL SI CU ETCHING
7 28137 WET ETCHING OF GLASS//EBEP//CURRENT BALANCE EQUATION
8 11639 ECR PLASMA//UNIFORM PLASMA//ELECTRON CYCLOTRON RESONANCE DISCHARGE
9 6201 FUJIMI KU//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//DRY ETCHING
10 29413 HIGH P SURE SCI ENGN HIPSEC//ADV FIUNCT MAT//ALUMINOVANADATE OXIDE

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