Class information for:
Level 1: FUJIMI KU//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//DRY ETCHING

Basic class information
Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
15 4 METALLURGY & METALLURGICAL ENGINEERING//MATERIALS SCIENCE, MULTIDISCIPLINARY//MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING 827627
419 3       PLASMA SOURCES SCIENCE & TECHNOLOGY//REVIEW OF SCIENTIFIC INSTRUMENTS//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 30297
1480 2             PLASMA ETCHING//ELECT DEVICES MAT TECHNOL//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 7897
6201 1                   FUJIMI KU//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//DRY ETCHING 1542

Terms with highest relevance score


rank Category termType chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 FUJIMI KU address 163498 1% 100% 8
2 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B journal 140152 22% 2% 339
3 DRY ETCHING authKW 110742 3% 11% 50
4 REACTIVE ION BEAM ETCHING authKW 84069 1% 34% 12
5 GAAS OXIDE authKW 65397 0% 80% 4
6 IN SITU EB LITHOGRAPHY authKW 61312 0% 100% 3
7 INSITU PROCESS authKW 61312 0% 100% 3
8 ECR RIBE authKW 46710 0% 57% 4
9 NANO TECHNOL PLICAT address 45982 0% 75% 3
10 SOLID SOURCE authKW 45982 0% 75% 3

Web of Science journal categories


chi_square_rank Category chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 Physics, Applied 19454 71% 0% 1089
2 Nanoscience & Nanotechnology 8102 25% 0% 391
3 Engineering, Electrical & Electronic 6846 40% 0% 614
4 Materials Science, Coatings & Films 5073 13% 0% 206
5 Physics, Condensed Matter 1373 17% 0% 266
6 Electrochemistry 357 5% 0% 73
7 Materials Science, Multidisciplinary 222 12% 0% 184
8 Optics 82 5% 0% 70
9 Chemistry, Physical 43 7% 0% 108
10 Physics, Fluids & Plasmas 32 2% 0% 26

Address terms


chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 FUJIMI KU 163498 1% 100% 8
2 NANO TECHNOL PLICAT 45982 0% 75% 3
3 IMAGING ADV NANOTECHNOL 40874 0% 100% 2
4 SEMICOND MEMS PROC 31889 1% 20% 8
5 NANO ENG 27248 0% 67% 2
6 BIOMAT ANAL 22988 0% 38% 3
7 PLASMAS COUCHES MINCES 22945 1% 11% 10
8 FESTKORPERPHYS LOTHARSTR 20437 0% 100% 1
9 GENE PHYS 20437 0% 100% 1
10 IONENSTRAHLTECH 20437 0% 100% 1

Journals


chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 140152 22% 2% 339
2 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 8620 5% 1% 78
3 APPLIED PHYSICS LETTERS 3946 10% 0% 150
4 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 3590 5% 0% 75
5 SOLID-STATE ELECTRONICS 3546 3% 0% 42
6 JOURNAL OF THE ELECTROCHEMICAL SOCIETY 3342 5% 0% 72
7 SEMICONDUCTOR SCIENCE AND TECHNOLOGY 3190 2% 0% 36
8 PLASMA CHEMISTRY AND PLASMA PROCESSING 3057 1% 1% 15
9 MICROELECTRONIC ENGINEERING 2940 3% 0% 39
10 VACUUM 2372 2% 0% 34

Author Key Words


chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass LCSH search Wikipedia search
1 DRY ETCHING 110742 3% 11% 50 Search DRY+ETCHING Search DRY+ETCHING
2 REACTIVE ION BEAM ETCHING 84069 1% 34% 12 Search REACTIVE+ION+BEAM+ETCHING Search REACTIVE+ION+BEAM+ETCHING
3 GAAS OXIDE 65397 0% 80% 4 Search GAAS+OXIDE Search GAAS+OXIDE
4 IN SITU EB LITHOGRAPHY 61312 0% 100% 3 Search IN+SITU+EB+LITHOGRAPHY Search IN+SITU+EB+LITHOGRAPHY
5 INSITU PROCESS 61312 0% 100% 3 Search INSITU+PROCESS Search INSITU+PROCESS
6 ECR RIBE 46710 0% 57% 4 Search ECR+RIBE Search ECR+RIBE
7 SOLID SOURCE 45982 0% 75% 3 Search SOLID+SOURCE Search SOLID+SOURCE
8 AS VACANCY 40874 0% 100% 2 Search AS+VACANCY Search AS+VACANCY
9 BCL3 N 2 40874 0% 100% 2 Search BCL3+N+2 Search BCL3+N+2
10 CL 2 XE 40874 0% 100% 2 Search CL+2+XE Search CL+2+XE

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.

Classes with closest relation at Level 1


rank cluster_id2 link
1 19124 SOCIOTECHNO SCI TECHNOL//MAT STUDY TESTING//NAT MAT STUDY TESTING
2 28194 DYNAMIC CHEMICAL POLISHING//ACOUSTIC DROPLET EJECTOR//AL AL2O3 NANO PARTICLE
3 19102 ECR HYDROGEN PLASMA//IN SITU VACUUM PROCESS//OXIDE DESORPTION
4 22057 POST ETCHING TREATMENTS//111 SPLIT INTERSTITIAL//AL1 WT PERCENT SI
5 27996 SEMICONDUCTOR RING LASER SRL//MICRORING LASERS//SEMICONDUCTOR RING LASERS SRLS
6 7198 SOLID STATE TECHNOLOGY//AFTER CORROSION//AL SI CU ETCHING
7 32314 MEMBRANE LASER//GAINASP INP//DISTRIBUTED REFLECTOR LASER
8 27042 INDUCTIVELY COUPLED PLASMA REACTIVE ION ETCHING//TI HARD MASK//MAGNETIC TUNNEL JUNCTION MATERIALS
9 17105 ATOMIC LAYER ETCHING//GATE CHARGING//NEUTRAL BEAM ETCHING
10 11639 ECR PLASMA//UNIFORM PLASMA//ELECTRON CYCLOTRON RESONANCE DISCHARGE

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