Class information for: |
Basic class information |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
1 | 4 | PHYSICS, CONDENSED MATTER//PHYSICS, APPLIED//MATERIALS SCIENCE, MULTIDISCIPLINARY | 2188495 |
51 | 3 | SURFACE SCIENCE//PHYSICS, CONDENSED MATTER//SCANNING TUNNELING MICROSCOPY | 97901 |
1092 | 2 | GALLIUM ARSENIDE//GAAS//SURFACE SCIENCE | 10114 |
19102 | 1 | ECR HYDROGEN PLASMA//IN SITU VACUUM PROCESS//OXIDE DESORPTION | 544 |
Terms with highest relevance score |
rank | Category | termType | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|---|
1 | ECR HYDROGEN PLASMA | authKW | 115868 | 0% | 100% | 2 |
2 | IN SITU VACUUM PROCESS | authKW | 115868 | 0% | 100% | 2 |
3 | OXIDE DESORPTION | authKW | 115864 | 1% | 50% | 4 |
4 | GA2O | authKW | 77244 | 0% | 67% | 2 |
5 | HIGFET | authKW | 77244 | 0% | 67% | 2 |
6 | SEMICOND INTEGRATED CIRCUIT | address | 65172 | 1% | 38% | 3 |
7 | ACID POLISHED | authKW | 57934 | 0% | 100% | 1 |
8 | AMPS 1D MODELLING | authKW | 57934 | 0% | 100% | 1 |
9 | ARSENIC CAPPING | authKW | 57934 | 0% | 100% | 1 |
10 | ATOMIC HYDROGEN ETCHING CLEANING | authKW | 57934 | 0% | 100% | 1 |
Web of Science journal categories |
chi_square_rank | Category | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | Physics, Applied | 4944 | 60% | 0% | 329 |
2 | Materials Science, Coatings & Films | 3114 | 17% | 0% | 95 |
3 | Physics, Condensed Matter | 1143 | 25% | 0% | 137 |
4 | Crystallography | 452 | 8% | 0% | 45 |
5 | Nanoscience & Nanotechnology | 332 | 9% | 0% | 51 |
6 | Materials Science, Multidisciplinary | 270 | 19% | 0% | 101 |
7 | Chemistry, Physical | 215 | 16% | 0% | 87 |
8 | Engineering, Electrical & Electronic | 192 | 13% | 0% | 73 |
9 | Physics, Multidisciplinary | 45 | 6% | 0% | 32 |
10 | Electrochemistry | 39 | 3% | 0% | 16 |
Address terms |
chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | SEMICOND INTEGRATED CIRCUIT | 65172 | 1% | 38% | 3 |
2 | JANGANG GU | 57934 | 0% | 100% | 1 |
3 | NANOELE ON ABORAT | 57934 | 0% | 100% | 1 |
4 | NOVOSIBIRSK SEMICOND PHYS | 57934 | 0% | 100% | 1 |
5 | OPTOELECT MICROWAVE DEVICES DEV | 28966 | 0% | 50% | 1 |
6 | STRUCT FUNCT PROPERTY GRP | 28966 | 0% | 50% | 1 |
7 | SUR E THIN FILM STAND SECT | 28966 | 0% | 50% | 1 |
8 | GRP FIS SUPERFICIES | 28964 | 0% | 25% | 2 |
9 | TOSHIBA EUROPE LTD | 25745 | 0% | 22% | 2 |
10 | NANOTECHNOL ENGN GRP | 19310 | 0% | 33% | 1 |
Journals |
chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 9587 | 3% | 1% | 14 |
2 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 6337 | 8% | 0% | 43 |
3 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 5828 | 7% | 0% | 38 |
4 | SURFACE SCIENCE | 3217 | 7% | 0% | 39 |
5 | JOURNAL OF CRYSTAL GROWTH | 3201 | 8% | 0% | 42 |
6 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 2286 | 4% | 0% | 22 |
7 | JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA | 953 | 2% | 0% | 10 |
8 | JOURNAL OF APPLIED PHYSICS | 853 | 8% | 0% | 41 |
9 | APPLIED PHYSICS LETTERS | 777 | 7% | 0% | 40 |
10 | SOVIET MICROELECTRONICS | 771 | 0% | 1% | 2 |
Author Key Words |
chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass | LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | ECR HYDROGEN PLASMA | 115868 | 0% | 100% | 2 | Search ECR+HYDROGEN+PLASMA | Search ECR+HYDROGEN+PLASMA |
2 | IN SITU VACUUM PROCESS | 115868 | 0% | 100% | 2 | Search IN+SITU+VACUUM+PROCESS | Search IN+SITU+VACUUM+PROCESS |
3 | OXIDE DESORPTION | 115864 | 1% | 50% | 4 | Search OXIDE+DESORPTION | Search OXIDE+DESORPTION |
4 | GA2O | 77244 | 0% | 67% | 2 | Search GA2O | Search GA2O |
5 | HIGFET | 77244 | 0% | 67% | 2 | Search HIGFET | Search HIGFET |
6 | ACID POLISHED | 57934 | 0% | 100% | 1 | Search ACID+POLISHED | Search ACID+POLISHED |
7 | AMPS 1D MODELLING | 57934 | 0% | 100% | 1 | Search AMPS+1D+MODELLING | Search AMPS+1D+MODELLING |
8 | ARSENIC CAPPING | 57934 | 0% | 100% | 1 | Search ARSENIC+CAPPING | Search ARSENIC+CAPPING |
9 | ATOMIC HYDROGEN ETCHING CLEANING | 57934 | 0% | 100% | 1 | Search ATOMIC+HYDROGEN+ETCHING+CLEANING | Search ATOMIC+HYDROGEN+ETCHING+CLEANING |
10 | ATOMIC MASS NUMBER | 57934 | 0% | 100% | 1 | Search ATOMIC+MASS+NUMBER | Search ATOMIC+MASS+NUMBER |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Classes with closest relation at Level 1 |