Class information for: |
Basic class information |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Terms with highest relevance score |
| rank | Category | termType | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|---|
| 1 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | journal | 707232 | 11% | 21% | 3486 |
| 2 | MICROELECTRONIC ENGINEERING | journal | 334619 | 6% | 18% | 1886 |
| 3 | NANOSCIENCE & NANOTECHNOLOGY | WoSSC | 222813 | 29% | 3% | 9310 |
| 4 | LITHOGRAPHY | authKW | 202412 | 2% | 35% | 590 |
| 5 | JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | journal | 193079 | 2% | 31% | 633 |
| 6 | PHYSICS, APPLIED | WoSSC | 165234 | 46% | 1% | 14907 |
| 7 | RESIST | authKW | 149959 | 1% | 65% | 237 |
| 8 | CHEMICALLY AMPLIFIED RESIST | authKW | 148245 | 1% | 85% | 178 |
| 9 | NANOIMPRINT | authKW | 146387 | 1% | 53% | 284 |
| 10 | INTEGRAL IMAGING | authKW | 135843 | 0% | 93% | 150 |
Web of Science journal categories |
| chi_square_rank | Category | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | Nanoscience & Nanotechnology | 222813 | 29% | 3% | 9310 |
| 2 | Physics, Applied | 165234 | 46% | 1% | 14907 |
| 3 | Optics | 125608 | 27% | 2% | 8591 |
| 4 | Engineering, Electrical & Electronic | 69651 | 29% | 1% | 9238 |
| 5 | Materials Science, Multidisciplinary | 19541 | 20% | 0% | 6463 |
| 6 | Instruments & Instrumentation | 8809 | 6% | 1% | 1937 |
| 7 | Polymer Science | 6322 | 6% | 0% | 2070 |
| 8 | Microscopy | 5596 | 2% | 1% | 491 |
| 9 | Materials Science, Coatings & Films | 4258 | 3% | 1% | 991 |
| 10 | Physics, Condensed Matter | 3251 | 7% | 0% | 2393 |
Address terms |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | LASTI | 58274 | 0% | 59% | 101 |
| 2 | ADV SCI TECHNOL IND | 32437 | 0% | 29% | 114 |
| 3 | VISUAL CONTENTS | 18203 | 0% | 85% | 22 |
| 4 | STATE FUNDAMENTAL SCI SYNTHET VIS | 17918 | 0% | 54% | 34 |
| 5 | XRAY LITHOG | 17239 | 0% | 77% | 23 |
| 6 | AMBIENT INTELLIGENCE | 17007 | 0% | 87% | 20 |
| 7 | ADV MAT DEV 1 | 15704 | 0% | 94% | 17 |
| 8 | DISPLAY 3D | 13723 | 0% | 59% | 24 |
| 9 | SUPER FINE SR LITHOG | 13695 | 0% | 100% | 14 |
| 10 | HIGH VOLTAGE ELE ON MICROSCOPY STN | 12664 | 0% | 38% | 34 |
Journals |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 707232 | 11% | 21% | 3486 |
| 2 | MICROELECTRONIC ENGINEERING | 334619 | 6% | 18% | 1886 |
| 3 | JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 193079 | 2% | 31% | 633 |
| 4 | JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS | 102270 | 1% | 32% | 325 |
| 5 | JOURNAL OF DISPLAY TECHNOLOGY | 73060 | 1% | 24% | 312 |
| 6 | JOURNAL OF THE SOCIETY FOR INFORMATION DISPLAY | 61825 | 1% | 22% | 296 |
| 7 | JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS | 45970 | 0% | 44% | 107 |
| 8 | JOURNAL OF MICROMECHANICS AND MICROENGINEERING | 43203 | 2% | 9% | 506 |
| 9 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 41542 | 4% | 4% | 1173 |
| 10 | APPLIED OPTICS | 37572 | 4% | 3% | 1202 |
Author Key Words |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass | LCSH search | Wikipedia search |
|---|---|---|---|---|---|---|---|
| 1 | LITHOGRAPHY | 202412 | 2% | 35% | 590 | Search LITHOGRAPHY | Search LITHOGRAPHY |
| 2 | RESIST | 149959 | 1% | 65% | 237 | Search RESIST | Search RESIST |
| 3 | CHEMICALLY AMPLIFIED RESIST | 148245 | 1% | 85% | 178 | Search CHEMICALLY+AMPLIFIED+RESIST | Search CHEMICALLY+AMPLIFIED+RESIST |
| 4 | NANOIMPRINT | 146387 | 1% | 53% | 284 | Search NANOIMPRINT | Search NANOIMPRINT |
| 5 | INTEGRAL IMAGING | 135843 | 0% | 93% | 150 | Search INTEGRAL+IMAGING | Search INTEGRAL+IMAGING |
| 6 | NANOIMPRINT LITHOGRAPHY | 131870 | 1% | 46% | 292 | Search NANOIMPRINT+LITHOGRAPHY | Search NANOIMPRINT+LITHOGRAPHY |
| 7 | ELECTRON BEAM LITHOGRAPHY | 128958 | 1% | 34% | 385 | Search ELECTRON+BEAM+LITHOGRAPHY | Search ELECTRON+BEAM+LITHOGRAPHY |
| 8 | NANOLITHOGRAPHY | 110942 | 1% | 40% | 285 | Search NANOLITHOGRAPHY | Search NANOLITHOGRAPHY |
| 9 | PHOTORESIST | 105791 | 1% | 37% | 290 | Search PHOTORESIST | Search PHOTORESIST |
| 10 | LINE EDGE ROUGHNESS | 91964 | 0% | 71% | 133 | Search LINE+EDGE+ROUGHNESS | Search LINE+EDGE+ROUGHNESS |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Classes with closest relation at Level 3 |