Class information for:
Level 2: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//CHEMICALLY AMPLIFIED RESIST//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY

Basic class information
Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
8 4 POLYMER SCIENCE//CHEMISTRY, PHYSICAL//MATERIALS SCIENCE, MULTIDISCIPLINARY 1554940
397 3       JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//MICROELECTRONIC ENGINEERING//NANOSCIENCE & NANOTECHNOLOGY 32153
806 2             JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//CHEMICALLY AMPLIFIED RESIST//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 12229
2517 1                   LINE EDGE ROUGHNESS//CHEMICALLY AMPLIFIED RESIST//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 2253
4286 1                   ELECTRON BEAM INDUCED DEPOSITION//FOCUSED ION BEAM//FOCUSED ELECTRON BEAM INDUCED DEPOSITION 1846
5372 1                   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//PROXIMITY EFFECT CORRECTION//ELECTRON BEAM LITHOGRAPHY 1664
7011 1                   SOLID STATE TECHNOLOGY//DRY DEVELOPMENT//PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS 1443
7908 1                   LIQUID METAL ION SOURCE//ION BEAMS MAT//ALLOY LIQUID METAL ION SOURCES 1338
8822 1                   OPTICAL LITHOGRAPHY//OPTICAL PROXIMITY CORRECTION//PHASE SHIFTING MASK 1244
10655 1                   X RAY MASK//X RAY LITHOGRAPHY//SR LITHOGRAPHY 1074
21211 1                   IMMERSION LITHOGRAPHY//LITHOGRAPHY SIMULATION//DOUBLE PATTERNING 452
26014 1                   STENCIL LITHOGRAPHY//STRESS INDUCED DEFORMATION//RESIST SPRAY COATING 287
28240 1                   HSQ//HYDROGEN SILSESQUIOXANE//HYDROGEN SILSESQUIOXANE HSQ 230
29393 1                   NANOSYST MFG//ION PROJECTION//NANOELECT PROC IL 204
29894 1                   LEHRSTUHL ADHAS INTERPHASEN POLYMEREN//UNITE MICROELECT OPTOELECT POLYMERE//UNITE MICROELECT OPTOELECT POLYME 194

Terms with highest relevance score


rank Category termType chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B journal 1155454 22% 16% 2741
2 CHEMICALLY AMPLIFIED RESIST authKW 360240 1% 82% 171
3 JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY journal 261940 4% 22% 454
4 RESIST authKW 261910 2% 53% 193
5 MICROELECTRONIC ENGINEERING journal 259718 8% 10% 1023
6 LITHOGRAPHY authKW 230723 3% 23% 388
7 ELECTRON BEAM LITHOGRAPHY authKW 221945 3% 28% 311
8 LINE EDGE ROUGHNESS authKW 220856 1% 68% 127
9 FOCUSED ION BEAM authKW 170909 2% 24% 279
10 PHOTORESIST authKW 170906 2% 29% 227

Web of Science journal categories


chi_square_rank Category chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 Nanoscience & Nanotechnology 152609 38% 1% 4705
2 Physics, Applied 111107 60% 1% 7395
3 Engineering, Electrical & Electronic 59526 42% 1% 5081
4 Optics 17172 17% 0% 2038
5 Microscopy 6680 3% 1% 320
6 Polymer Science 4797 9% 0% 1045
7 Materials Science, Coatings & Films 2837 4% 0% 479
8 Materials Science, Multidisciplinary 2220 13% 0% 1575
9 Instruments & Instrumentation 2064 5% 0% 603
10 Physics, Condensed Matter 637 6% 0% 738

Address terms


chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 XRAY LITHOG 45400 0% 77% 23
2 ADV MAT DEV 1 41345 0% 94% 17
3 SUPER FINE SR LITHOG 36054 0% 100% 14
4 HIGH VOLTAGE ELE ON MICROSCOPY STN 33407 0% 38% 34
5 LASTI 29091 0% 26% 44
6 PHOTOMASK 25753 0% 100% 10
7 NEW TECHNOL DEV SECT 23177 0% 100% 9
8 EUV PROC TECHNOL 22898 0% 68% 13
9 SCI IND 22583 2% 4% 212
10 PROC MFG ENGN 20237 0% 25% 32

Journals


chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 1155454 22% 16% 2741
2 JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 261940 4% 22% 454
3 MICROELECTRONIC ENGINEERING 259718 8% 10% 1023
4 JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS 158342 2% 25% 249
5 JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS 66034 1% 33% 79
6 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 60701 7% 3% 863
7 SOLID STATE TECHNOLOGY 55609 2% 11% 201
8 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY 23850 1% 9% 105
9 MICROLITHOGRAPHY WORLD 21815 0% 40% 21
10 PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS 18425 2% 4% 198

Author Key Words


chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass LCSH search Wikipedia search
1 CHEMICALLY AMPLIFIED RESIST 360240 1% 82% 171 Search CHEMICALLY+AMPLIFIED+RESIST Search CHEMICALLY+AMPLIFIED+RESIST
2 RESIST 261910 2% 53% 193 Search RESIST Search RESIST
3 LITHOGRAPHY 230723 3% 23% 388 Search LITHOGRAPHY Search LITHOGRAPHY
4 ELECTRON BEAM LITHOGRAPHY 221945 3% 28% 311 Search ELECTRON+BEAM+LITHOGRAPHY Search ELECTRON+BEAM+LITHOGRAPHY
5 LINE EDGE ROUGHNESS 220856 1% 68% 127 Search LINE+EDGE+ROUGHNESS Search LINE+EDGE+ROUGHNESS
6 FOCUSED ION BEAM 170909 2% 24% 279 Search FOCUSED+ION+BEAM Search FOCUSED+ION+BEAM
7 PHOTORESIST 170906 2% 29% 227 Search PHOTORESIST Search PHOTORESIST
8 ELECTRON BEAM INDUCED DEPOSITION 161043 1% 72% 87 Search ELECTRON+BEAM+INDUCED+DEPOSITION Search ELECTRON+BEAM+INDUCED+DEPOSITION
9 X RAY MASK 157718 1% 84% 73 Search X+RAY+MASK Search X+RAY+MASK
10 IMMERSION LITHOGRAPHY 156930 1% 76% 80 Search IMMERSION+LITHOGRAPHY Search IMMERSION+LITHOGRAPHY

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.

Classes with closest relation at Level 2


rank cluster_id2 link
1 2570 SCANNING//SCANDATE CATHODE//MICROSCOPY
2 2484 TWO PHOTON POLYMERIZATION//MICROLENS ARRAY//MICROLENS
3 2516 NANOIMPRINT//NANOIMPRINT LITHOGRAPHY//IMPRINT LITHOGRAPHY
4 1480 PLASMA ETCHING//ELECT DEVICES MAT TECHNOL//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
5 3509 ELECTRON BEAM ANNEALING//ION SPUTTERING//NANORIPPLES
6 1435 X RAY MICROSCOPY//X RAY OPTICS//MULTILAYER MIRROR
7 1926 PHOTOPOLYMERIZATION//PHOTOINITIATOR//CATIONIC PHOTOPOLYMERIZATION
8 2006 DIP PEN NANOLITHOGRAPHY//MICROCONTACT PRINTING//SCANNING PROBE LITHOGRAPHY
9 2016 FIELD EMISSION//ATOM PROBE TOMOGRAPHY//ATOM PROBE
10 3907 POLYPEROXIDE//POLYSTYRENE PEROXIDE//COPOLYPEROXIDES

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