Class information for: |
Basic class information |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Terms with highest relevance score |
| rank | Category | termType | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|---|
| 1 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | journal | 577497 | 43% | 4% | 714 |
| 2 | PROXIMITY EFFECT CORRECTION | authKW | 482642 | 2% | 88% | 29 |
| 3 | ELECTRON BEAM LITHOGRAPHY | authKW | 251464 | 7% | 11% | 122 |
| 4 | PHOTOMASK | address | 189387 | 1% | 100% | 10 |
| 5 | CHARACTER PROJECTION | authKW | 181806 | 1% | 80% | 12 |
| 6 | VARIABLE SHAPED BEAM | authKW | 172168 | 1% | 91% | 10 |
| 7 | MICROCOLUMN | authKW | 172128 | 2% | 30% | 30 |
| 8 | ELECTRON BEAM DIRECT WRITING | authKW | 163680 | 1% | 79% | 11 |
| 9 | IC EQUIPMENT | address | 127832 | 1% | 75% | 9 |
| 10 | CELL PROJECTION | authKW | 117997 | 1% | 69% | 9 |
Web of Science journal categories |
| chi_square_rank | Category | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | Nanoscience & Nanotechnology | 49673 | 59% | 0% | 980 |
| 2 | Physics, Applied | 27181 | 80% | 0% | 1329 |
| 3 | Engineering, Electrical & Electronic | 20703 | 65% | 0% | 1075 |
| 4 | Optics | 3356 | 20% | 0% | 327 |
| 5 | Microscopy | 540 | 2% | 0% | 34 |
| 6 | Computer Science, Hardware & Architecture | 160 | 2% | 0% | 34 |
| 7 | Instruments & Instrumentation | 155 | 4% | 0% | 65 |
| 8 | Materials Science, Coatings & Films | 46 | 2% | 0% | 28 |
| 9 | Spectroscopy | 22 | 2% | 0% | 28 |
| 10 | Computer Science, Information Systems | 9 | 1% | 0% | 21 |
Address terms |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | PHOTOMASK | 189387 | 1% | 100% | 10 |
| 2 | IC EQUIPMENT | 127832 | 1% | 75% | 9 |
| 3 | MASK DRAWING EQUIPMENT DEV | 94693 | 0% | 100% | 5 |
| 4 | NEXT GENERAT SEMICOND TECHNOL | 80798 | 0% | 53% | 8 |
| 5 | EB MASK EQUIPMENT ENGN | 78909 | 0% | 83% | 5 |
| 6 | OHI PLANT | 78909 | 0% | 83% | 5 |
| 7 | PL MAT CO | 60602 | 0% | 80% | 4 |
| 8 | ETEC SYST | 56816 | 0% | 100% | 3 |
| 9 | IC LCD EQUIPMENT BUSINESS HEADQUARTERS | 56816 | 0% | 100% | 3 |
| 10 | MASK DEV TEAM | 45446 | 0% | 40% | 6 |
Journals |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 577497 | 43% | 4% | 714 |
| 2 | MICROELECTRONIC ENGINEERING | 90150 | 13% | 2% | 222 |
| 3 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 32387 | 3% | 4% | 45 |
| 4 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 13017 | 9% | 0% | 147 |
| 5 | JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS | 3662 | 1% | 1% | 14 |
| 6 | OPTIK | 3469 | 3% | 0% | 46 |
| 7 | MICROLITHOGRAPHY WORLD | 3272 | 0% | 6% | 3 |
| 8 | JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS | 2794 | 0% | 2% | 6 |
| 9 | HEWLETT-PACKARD JOURNAL | 2756 | 0% | 2% | 7 |
| 10 | ADVANCES IN IMAGING AND ELECTRON PHYSICS | 2441 | 0% | 2% | 7 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Classes with closest relation at Level 1 |