Class information for: |
Basic class information |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Terms with highest relevance score |
| rank | Category | termType | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|---|
| 1 | SOLID STATE TECHNOLOGY | journal | 122033 | 7% | 5% | 102 |
| 2 | DRY DEVELOPMENT | authKW | 82211 | 1% | 47% | 8 |
| 3 | PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS | journal | 69550 | 9% | 2% | 131 |
| 4 | WT ADDITIVITY | authKW | 65518 | 0% | 100% | 3 |
| 5 | TOP SURFACE IMAGING | authKW | 60661 | 0% | 56% | 5 |
| 6 | BILEVEL STRUCTURE | authKW | 49137 | 0% | 75% | 3 |
| 7 | HALFTONE MASK | authKW | 49137 | 0% | 75% | 3 |
| 8 | PLASMA BLANKING | authKW | 49137 | 0% | 75% | 3 |
| 9 | CHLOROALKYLSILANE | authKW | 43679 | 0% | 100% | 2 |
| 10 | ETCHANT MIGRATION | authKW | 43679 | 0% | 100% | 2 |
Web of Science journal categories |
| chi_square_rank | Category | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | Physics, Applied | 4756 | 38% | 0% | 546 |
| 2 | Materials Science, Coatings & Films | 4116 | 12% | 0% | 180 |
| 3 | Engineering, Electrical & Electronic | 3444 | 30% | 0% | 433 |
| 4 | Polymer Science | 2568 | 17% | 0% | 241 |
| 5 | Nanoscience & Nanotechnology | 2550 | 15% | 0% | 219 |
| 6 | Electrochemistry | 2398 | 12% | 0% | 166 |
| 7 | Spectroscopy | 1463 | 9% | 0% | 133 |
| 8 | Optics | 1137 | 13% | 0% | 186 |
| 9 | Imaging Science & Photographic Technology | 503 | 3% | 0% | 41 |
| 10 | Physics, Condensed Matter | 211 | 8% | 0% | 122 |
Address terms |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | BEREICH MAKROMOL VERBINDUNGEN | 21839 | 0% | 100% | 1 |
| 2 | CENT S MICROELE LITHOG GRP | 21839 | 0% | 100% | 1 |
| 3 | CHEM PL CHEM YAMADAOKA | 21839 | 0% | 100% | 1 |
| 4 | CIENCIES QUIM QUIM FIS | 21839 | 0% | 100% | 1 |
| 5 | COLORADO INTEGRATED CIRCUITS | 21839 | 0% | 100% | 1 |
| 6 | DEV S TECHNOL GRP | 21839 | 0% | 100% | 1 |
| 7 | ENGN IMAGE SCI TECHNOL INAGE KU | 21839 | 0% | 100% | 1 |
| 8 | FAB TECH TEAM 1 | 21839 | 0% | 100% | 1 |
| 9 | HEFEI SYNCHROTORN RADIAT | 21839 | 0% | 100% | 1 |
| 10 | IBARAKI ELECT COMMUN S COMPONENT DEV | 21839 | 0% | 100% | 1 |
Journals |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | SOLID STATE TECHNOLOGY | 122033 | 7% | 5% | 102 |
| 2 | PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS | 69550 | 9% | 2% | 131 |
| 3 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 42069 | 12% | 1% | 180 |
| 4 | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 18300 | 11% | 1% | 161 |
| 5 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 8907 | 2% | 2% | 22 |
| 6 | ACS SYMPOSIUM SERIES | 7938 | 5% | 1% | 74 |
| 7 | POLYMER ENGINEERING AND SCIENCE | 7673 | 4% | 1% | 55 |
| 8 | RCA REVIEW | 7265 | 1% | 4% | 8 |
| 9 | ELECTRON DEVICE LETTERS | 7236 | 1% | 3% | 10 |
| 10 | JOURNAL OF IMAGING SCIENCE | 6579 | 1% | 3% | 10 |
Author Key Words |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass | LCSH search | Wikipedia search |
|---|---|---|---|---|---|---|---|
| 1 | DRY DEVELOPMENT | 82211 | 1% | 47% | 8 | Search DRY+DEVELOPMENT | Search DRY+DEVELOPMENT |
| 2 | WT ADDITIVITY | 65518 | 0% | 100% | 3 | Search WT+ADDITIVITY | Search WT+ADDITIVITY |
| 3 | TOP SURFACE IMAGING | 60661 | 0% | 56% | 5 | Search TOP+SURFACE+IMAGING | Search TOP+SURFACE+IMAGING |
| 4 | BILEVEL STRUCTURE | 49137 | 0% | 75% | 3 | Search BILEVEL+STRUCTURE | Search BILEVEL+STRUCTURE |
| 5 | HALFTONE MASK | 49137 | 0% | 75% | 3 | Search HALFTONE+MASK | Search HALFTONE+MASK |
| 6 | PLASMA BLANKING | 49137 | 0% | 75% | 3 | Search PLASMA+BLANKING | Search PLASMA+BLANKING |
| 7 | CHLOROALKYLSILANE | 43679 | 0% | 100% | 2 | Search CHLOROALKYLSILANE | Search CHLOROALKYLSILANE |
| 8 | ETCHANT MIGRATION | 43679 | 0% | 100% | 2 | Search ETCHANT+MIGRATION | Search ETCHANT+MIGRATION |
| 9 | LCD MANUFACTURING | 43679 | 0% | 100% | 2 | Search LCD+MANUFACTURING | Search LCD+MANUFACTURING |
| 10 | MULTILAYER RESIST TECHNOLOGY | 43679 | 0% | 100% | 2 | Search MULTILAYER+RESIST+TECHNOLOGY | Search MULTILAYER+RESIST+TECHNOLOGY |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Classes with closest relation at Level 1 |