Class information for: |
Basic class information |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Terms with highest relevance score |
| rank | Category | termType | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|---|
| 1 | OPTICAL LITHOGRAPHY | authKW | 990721 | 7% | 44% | 88 |
| 2 | OPTICAL PROXIMITY CORRECTION | authKW | 688050 | 3% | 70% | 39 |
| 3 | PHASE SHIFTING MASK | authKW | 546278 | 2% | 74% | 29 |
| 4 | RESOLUTION ENHANCEMENT TECHNIQUES | authKW | 446875 | 2% | 84% | 21 |
| 5 | JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS | journal | 374600 | 10% | 12% | 122 |
| 6 | LAYOUT DECOMPOSITION | authKW | 356249 | 1% | 94% | 15 |
| 7 | ATTENUATED PHASE SHIFTING MASK | authKW | 280615 | 1% | 92% | 12 |
| 8 | ANNULAR ILLUMINATION | authKW | 275847 | 1% | 78% | 14 |
| 9 | OPTICAL PROXIMITY CORRECTION OPC | authKW | 273587 | 1% | 60% | 18 |
| 10 | PHASE SHIFT MASK | authKW | 253314 | 2% | 50% | 20 |
Web of Science journal categories |
| chi_square_rank | Category | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | Nanoscience & Nanotechnology | 14113 | 37% | 0% | 457 |
| 2 | Engineering, Electrical & Electronic | 9696 | 52% | 0% | 644 |
| 3 | Optics | 9468 | 37% | 0% | 456 |
| 4 | Physics, Applied | 8410 | 53% | 0% | 655 |
| 5 | Computer Science, Hardware & Architecture | 1416 | 6% | 0% | 78 |
| 6 | Computer Science, Interdisciplinary Applications | 244 | 4% | 0% | 55 |
| 7 | Materials Science, Multidisciplinary | 225 | 13% | 0% | 160 |
| 8 | Engineering, Manufacturing | 122 | 2% | 0% | 25 |
| 9 | Physics, Condensed Matter | 97 | 7% | 0% | 85 |
| 10 | Materials Science, Coatings & Films | 15 | 1% | 0% | 16 |
Address terms |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | OPT TECHNOL HEADQUARTERS | 101334 | 0% | 100% | 4 |
| 2 | ULSI PROC DEV 1 | 101334 | 0% | 100% | 4 |
| 3 | INFORMAT OPT OPTOELECT TECHNOL | 90360 | 1% | 21% | 17 |
| 4 | EUV PROC TECHNOL | 85324 | 1% | 42% | 8 |
| 5 | PHOTOMASK TEAM | 73012 | 1% | 41% | 7 |
| 6 | PROC MFG ENGN | 70317 | 2% | 15% | 19 |
| 7 | PHOTOELECT IMAGING TECHNOL SYST | 70027 | 2% | 13% | 22 |
| 8 | MASK TECHNOL | 56999 | 0% | 75% | 3 |
| 9 | LITHOG GRP | 50667 | 0% | 100% | 2 |
| 10 | SEMICOND ADV PROC ENGN 2 | 50667 | 0% | 100% | 2 |
Journals |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS | 374600 | 10% | 12% | 122 |
| 2 | JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS | 127650 | 3% | 14% | 35 |
| 3 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 62807 | 16% | 1% | 204 |
| 4 | MICROLITHOGRAPHY WORLD | 39447 | 1% | 17% | 9 |
| 5 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 29674 | 15% | 1% | 191 |
| 6 | MICROELECTRONIC ENGINEERING | 28995 | 9% | 1% | 109 |
| 7 | IEEE TRANSACTIONS ON COMPUTER-AIDED DESIGN OF INTEGRATED CIRCUITS AND SYSTEMS | 13728 | 4% | 1% | 52 |
| 8 | SOLID STATE TECHNOLOGY | 13035 | 2% | 2% | 31 |
| 9 | IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING | 8341 | 2% | 1% | 23 |
| 10 | JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 4026 | 1% | 1% | 18 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Classes with closest relation at Level 1 |