Class information for:
Level 1: LINE EDGE ROUGHNESS//CHEMICALLY AMPLIFIED RESIST//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY

Basic class information
Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
8 4 POLYMER SCIENCE//CHEMISTRY, PHYSICAL//MATERIALS SCIENCE, MULTIDISCIPLINARY 1554940
397 3       JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//MICROELECTRONIC ENGINEERING//NANOSCIENCE & NANOTECHNOLOGY 32153
806 2             JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//CHEMICALLY AMPLIFIED RESIST//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 12229
2517 1                   LINE EDGE ROUGHNESS//CHEMICALLY AMPLIFIED RESIST//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 2253

Terms with highest relevance score


rank Category termType chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 LINE EDGE ROUGHNESS authKW 1035845 5% 63% 118
2 CHEMICALLY AMPLIFIED RESIST authKW 1028916 6% 59% 124
3 JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY journal 618221 13% 15% 299
4 EUV LITHOGRAPHY authKW 459894 3% 42% 78
5 MOLECULAR RESIST authKW 449135 2% 94% 34
6 PHOTORESIST authKW 444609 7% 20% 157
7 RESIST authKW 413194 5% 28% 104
8 LINE WIDTH ROUGHNESS authKW 390762 2% 76% 37
9 EUV RESIST authKW 259877 1% 77% 24
10 CHEMICAL AMPLIFICATION authKW 243207 2% 43% 40

Web of Science journal categories


chi_square_rank Category chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 Nanoscience & Nanotechnology 24510 36% 0% 811
2 Physics, Applied 15279 53% 0% 1188
3 Polymer Science 11796 28% 0% 624
4 Engineering, Electrical & Electronic 8493 37% 0% 832
5 Optics 2811 16% 0% 356
6 Materials Science, Multidisciplinary 417 13% 0% 292
7 Materials Science, Coatings & Films 68 2% 0% 39
8 Chemistry, Physical 47 7% 0% 148
9 Chemistry, Multidisciplinary 24 6% 0% 124
10 Physics, Condensed Matter 17 4% 0% 86

Address terms


chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 NEW TECHNOL DEV SECT 125883 0% 100% 9
2 SCI IND 117491 9% 4% 206
3 POLYMER CHEM NANOTECHNOL 97909 0% 100% 7
4 ADV MAT DEV 1 77697 0% 56% 10
5 EUVL 62301 0% 64% 7
6 FINE ELECT S 59078 1% 33% 13
7 XRAY OPT 58030 2% 9% 44
8 ADV IST 55948 0% 100% 4
9 MICROELECT MAT DEV S 55948 0% 100% 4
10 TECHNOL ELECT MAT 37296 0% 67% 4

Journals


chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 618221 13% 15% 299
2 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 162973 20% 3% 442
3 JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS 88836 4% 8% 80
4 MICROELECTRONIC ENGINEERING 67673 10% 2% 224
5 JAPANESE JOURNAL OF APPLIED PHYSICS 14423 6% 1% 131
6 JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS 8266 1% 5% 12
7 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 8022 6% 0% 135
8 APPLIED PHYSICS EXPRESS 3222 1% 1% 30
9 CHEMISTRY OF MATERIALS 3135 3% 0% 65
10 SOLID STATE TECHNOLOGY 2679 1% 1% 19

Author Key Words


chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass LCSH search Wikipedia search
1 LINE EDGE ROUGHNESS 1035845 5% 63% 118 Search LINE+EDGE+ROUGHNESS Search LINE+EDGE+ROUGHNESS
2 CHEMICALLY AMPLIFIED RESIST 1028916 6% 59% 124 Search CHEMICALLY+AMPLIFIED+RESIST Search CHEMICALLY+AMPLIFIED+RESIST
3 EUV LITHOGRAPHY 459894 3% 42% 78 Search EUV+LITHOGRAPHY Search EUV+LITHOGRAPHY
4 MOLECULAR RESIST 449135 2% 94% 34 Search MOLECULAR+RESIST Search MOLECULAR+RESIST
5 PHOTORESIST 444609 7% 20% 157 Search PHOTORESIST Search PHOTORESIST
6 RESIST 413194 5% 28% 104 Search RESIST Search RESIST
7 LINE WIDTH ROUGHNESS 390762 2% 76% 37 Search LINE+WIDTH+ROUGHNESS Search LINE+WIDTH+ROUGHNESS
8 EUV RESIST 259877 1% 77% 24 Search EUV+RESIST Search EUV+RESIST
9 CHEMICAL AMPLIFICATION 243207 2% 43% 40 Search CHEMICAL+AMPLIFICATION Search CHEMICAL+AMPLIFICATION
10 EUV 229187 3% 27% 61 Search EUV Search EUV

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.

Classes with closest relation at Level 1


rank cluster_id2 link
1 28240 HSQ//HYDROGEN SILSESQUIOXANE//HYDROGEN SILSESQUIOXANE HSQ
2 19595 PHOTOBASE GENERATOR//BASE AMPLIFIER//BASE PROLIFERATION REACTION
3 21211 IMMERSION LITHOGRAPHY//LITHOGRAPHY SIMULATION//DOUBLE PATTERNING
4 7011 SOLID STATE TECHNOLOGY//DRY DEVELOPMENT//PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
5 5372 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//PROXIMITY EFFECT CORRECTION//ELECTRON BEAM LITHOGRAPHY
6 23561 PHOTOSENSITIVE POLYIMIDE//REACTION DEVELOPMENT PATTERNING RDP//POLYISOIMIDE
7 8822 OPTICAL LITHOGRAPHY//OPTICAL PROXIMITY CORRECTION//PHASE SHIFTING MASK
8 29393 NANOSYST MFG//ION PROJECTION//NANOELECT PROC IL
9 29894 LEHRSTUHL ADHAS INTERPHASEN POLYMEREN//UNITE MICROELECT OPTOELECT POLYMERE//UNITE MICROELECT OPTOELECT POLYME
10 10655 X RAY MASK//X RAY LITHOGRAPHY//SR LITHOGRAPHY

Go to start page