Class information for:
Level 1: HSQ//HYDROGEN SILSESQUIOXANE//HYDROGEN SILSESQUIOXANE HSQ

Basic class information

Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes

The table includes all classes above and classes immediately below the current class.



Cluster id Level Cluster label #P
8 4 POLYMER SCIENCE//CHEMISTRY, PHYSICAL//MATERIALS SCIENCE, MULTIDISCIPLINARY 1554940
397 3       JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//MICROELECTRONIC ENGINEERING//NANOSCIENCE & NANOTECHNOLOGY 32153
806 2             JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//CHEMICALLY AMPLIFIED RESIST//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 12229
28240 1                   HSQ//HYDROGEN SILSESQUIOXANE//HYDROGEN SILSESQUIOXANE HSQ 230

Terms with highest relevance score



rank Category termType chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 HSQ authKW 1020315 10% 34% 22
2 HYDROGEN SILSESQUIOXANE authKW 837667 8% 34% 18
3 HYDROGEN SILSESQUIOXANE HSQ authKW 657728 5% 40% 12
4 HSQ RESIST authKW 570955 2% 83% 5
5 ELECTRON BEAM LITHOGRAPHY authKW 397400 25% 5% 57
6 EVAPORATED RESIST authKW 274059 1% 100% 2
7 MAGNETORESISTIVE THIN FILM HEAD authKW 274059 1% 100% 2
8 SUPERCRITICAL RESIST DRYING authKW 274059 1% 100% 2
9 ELECTRON RESISTS authKW 214472 3% 26% 6
10 10 NM WIDE RESIST LINES authKW 137030 0% 100% 1

Web of Science journal categories



chi_square_rank Category chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 Nanoscience & Nanotechnology 12658 80% 0% 183
2 Physics, Applied 4302 85% 0% 196
3 Engineering, Electrical & Electronic 3342 70% 0% 160
4 Optics 1487 34% 0% 78
5 Materials Science, Multidisciplinary 123 19% 0% 44
6 Physics, Condensed Matter 19 7% 0% 16
7 Materials Science, Coatings & Films 13 2% 0% 5
8 Chemistry, Multidisciplinary 4 6% 0% 14
9 Instruments & Instrumentation 2 2% 0% 4
10 Polymer Science 1 2% 0% 5

Address terms



chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 AETS DEV 1 137030 0% 100% 1
2 AETS DEV 2 137030 0% 100% 1
3 CB390 137030 0% 100% 1
4 HGEBIET FESTKORPERELEKTR 137030 0% 100% 1
5 ISENIEMN 137030 0% 100% 1
6 ISLE KATZ NANOSCALE SCI TECHNOL 137030 0% 100% 1
7 QUATTRONE NANOFABRICAT IL 137030 0% 100% 1
8 SILOXANE POLYMER GRP 137030 0% 100% 1
9 JAMES WATT NANOFABRICAT 137026 1% 33% 3
10 AMICA 104948 3% 13% 6

Journals



chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 MICROELECTRONIC ENGINEERING 70724 32% 1% 73
2 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 52421 35% 0% 80
3 NANOTECHNOLOGY 961 4% 0% 10
4 POLYMER REVIEWS 594 0% 0% 1
5 JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS 541 1% 0% 2
6 KOREA POLYMER JOURNAL 479 0% 0% 1
7 OPTICAL MATERIALS EXPRESS 279 1% 0% 2
8 JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 267 1% 0% 2
9 NANOSCALE RESEARCH LETTERS 254 1% 0% 3
10 MATERIALS TODAY 222 0% 0% 1

Author Key Words



chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass LCSH search Wikipedia search
1 HSQ 1020315 10% 34% 22 Search HSQ Search HSQ
2 HYDROGEN SILSESQUIOXANE 837667 8% 34% 18 Search HYDROGEN+SILSESQUIOXANE Search HYDROGEN+SILSESQUIOXANE
3 HYDROGEN SILSESQUIOXANE HSQ 657728 5% 40% 12 Search HYDROGEN+SILSESQUIOXANE+HSQ Search HYDROGEN+SILSESQUIOXANE+HSQ
4 HSQ RESIST 570955 2% 83% 5 Search HSQ+RESIST Search HSQ+RESIST
5 ELECTRON BEAM LITHOGRAPHY 397400 25% 5% 57 Search ELECTRON+BEAM+LITHOGRAPHY Search ELECTRON+BEAM+LITHOGRAPHY
6 EVAPORATED RESIST 274059 1% 100% 2 Search EVAPORATED+RESIST Search EVAPORATED+RESIST
7 MAGNETORESISTIVE THIN FILM HEAD 274059 1% 100% 2 Search MAGNETORESISTIVE+THIN+FILM+HEAD Search MAGNETORESISTIVE+THIN+FILM+HEAD
8 SUPERCRITICAL RESIST DRYING 274059 1% 100% 2 Search SUPERCRITICAL+RESIST+DRYING Search SUPERCRITICAL+RESIST+DRYING
9 ELECTRON RESISTS 214472 3% 26% 6 Search ELECTRON+RESISTS Search ELECTRON+RESISTS
10 10 NM WIDE RESIST LINES 137030 0% 100% 1 Search 10+NM+WIDE+RESIST+LINES Search 10+NM+WIDE+RESIST+LINES

Core articles

The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.

Classes with closest relation at Level 1



rank cluster_id2 link
1 2517 LINE EDGE ROUGHNESS//CHEMICALLY AMPLIFIED RESIST//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY
2 26014 STENCIL LITHOGRAPHY//STRESS INDUCED DEFORMATION//RESIST SPRAY COATING
3 5372 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//PROXIMITY EFFECT CORRECTION//ELECTRON BEAM LITHOGRAPHY
4 2497 NANOIMPRINT//NANOIMPRINT LITHOGRAPHY//IMPRINT LITHOGRAPHY
5 29894 LEHRSTUHL ADHAS INTERPHASEN POLYMEREN//UNITE MICROELECT OPTOELECT POLYMERE//UNITE MICROELECT OPTOELECT POLYME
6 21211 IMMERSION LITHOGRAPHY//LITHOGRAPHY SIMULATION//DOUBLE PATTERNING
7 18552 PROTON BEAM WRITING//ION BEAM PLICAT//PROBE FORMING SYSTEM
8 27042 INDUCTIVELY COUPLED PLASMA REACTIVE ION ETCHING//TI HARD MASK//MAGNETIC TUNNEL JUNCTION MATERIALS
9 12399 HOLOGRAPHIC LITHOGRAPHY//INTERFERENCE LITHOGRAPHY//LASER INTERFERENCE METALLURGY
10 21319 NANOGAP ELECTRODES//NANOGAP//SURFACE CONDUCTION ELECTRON EMITTER

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