Class information for: |
Basic class information |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
8 | 4 | POLYMER SCIENCE//CHEMISTRY, PHYSICAL//MATERIALS SCIENCE, MULTIDISCIPLINARY | 1554940 |
397 | 3 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//MICROELECTRONIC ENGINEERING//NANOSCIENCE & NANOTECHNOLOGY | 32153 |
2516 | 2 | NANOIMPRINT//NANOIMPRINT LITHOGRAPHY//IMPRINT LITHOGRAPHY | 4078 |
2497 | 1 | NANOIMPRINT//NANOIMPRINT LITHOGRAPHY//IMPRINT LITHOGRAPHY | 2257 |
Terms with highest relevance score |
rank | Category | termType | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|---|
1 | NANOIMPRINT | authKW | 1647795 | 11% | 47% | 252 |
2 | NANOIMPRINT LITHOGRAPHY | authKW | 1472567 | 11% | 41% | 258 |
3 | IMPRINT LITHOGRAPHY | authKW | 421674 | 2% | 57% | 53 |
4 | UV NANOIMPRINT | authKW | 397748 | 2% | 81% | 35 |
5 | UV NIL | authKW | 349046 | 1% | 83% | 30 |
6 | MICROELECTRONIC ENGINEERING | journal | 307400 | 21% | 5% | 477 |
7 | ANTISTICKING LAYER | authKW | 279877 | 1% | 95% | 21 |
8 | HOT EMBOSSING | authKW | 232180 | 3% | 23% | 71 |
9 | UV NANOIMPRINT LITHOGRAPHY | authKW | 218141 | 1% | 63% | 25 |
10 | THERMAL NANOIMPRINT | authKW | 180940 | 1% | 72% | 18 |
Web of Science journal categories |
chi_square_rank | Category | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | Nanoscience & Nanotechnology | 63481 | 57% | 0% | 1291 |
2 | Physics, Applied | 29158 | 71% | 0% | 1612 |
3 | Engineering, Electrical & Electronic | 13752 | 46% | 0% | 1041 |
4 | Optics | 7300 | 24% | 0% | 552 |
5 | Materials Science, Multidisciplinary | 3630 | 30% | 0% | 679 |
6 | Polymer Science | 1205 | 10% | 0% | 220 |
7 | Engineering, Manufacturing | 389 | 3% | 0% | 58 |
8 | Physics, Condensed Matter | 387 | 9% | 0% | 202 |
9 | Instruments & Instrumentation | 370 | 5% | 0% | 110 |
10 | Mechanics | 202 | 4% | 0% | 98 |
Address terms |
chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | LASTI | 180298 | 2% | 27% | 47 |
2 | GRACE POLYMER PROC | 107397 | 0% | 77% | 10 |
3 | MICROSTRUCT ENGN | 93075 | 0% | 67% | 10 |
4 | ELECT INFORMAT MEDIA ENGN | 87933 | 1% | 30% | 21 |
5 | NANOMECH SYST | 83417 | 2% | 14% | 42 |
6 | TECHNOL DEV OPERAT | 62827 | 0% | 75% | 6 |
7 | PL ELECT | 57573 | 4% | 5% | 80 |
8 | NANOTECHNOL PLICAT POLYMERS | 55849 | 0% | 100% | 4 |
9 | NANO CONVERGENCE MFG SYST | 46865 | 1% | 22% | 15 |
10 | FLEXIBLE ELECT EQUIPMENT | 44678 | 0% | 80% | 4 |
Journals |
chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | MICROELECTRONIC ENGINEERING | 307400 | 21% | 5% | 477 |
2 | JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 116512 | 6% | 6% | 130 |
3 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 87784 | 14% | 2% | 325 |
4 | JOURNAL OF MICROMECHANICS AND MICROENGINEERING | 15977 | 4% | 1% | 81 |
5 | MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS | 15705 | 3% | 2% | 65 |
6 | JAPANESE JOURNAL OF APPLIED PHYSICS | 11658 | 5% | 1% | 118 |
7 | JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS | 10065 | 1% | 3% | 27 |
8 | NANOTECHNOLOGY | 8834 | 4% | 1% | 95 |
9 | JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS | 4637 | 0% | 4% | 9 |
10 | INTERNATIONAL POLYMER PROCESSING | 2375 | 1% | 1% | 16 |
Author Key Words |
chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass | LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | NANOIMPRINT | 1647795 | 11% | 47% | 252 | Search NANOIMPRINT | Search NANOIMPRINT |
2 | NANOIMPRINT LITHOGRAPHY | 1472567 | 11% | 41% | 258 | Search NANOIMPRINT+LITHOGRAPHY | Search NANOIMPRINT+LITHOGRAPHY |
3 | IMPRINT LITHOGRAPHY | 421674 | 2% | 57% | 53 | Search IMPRINT+LITHOGRAPHY | Search IMPRINT+LITHOGRAPHY |
4 | UV NANOIMPRINT | 397748 | 2% | 81% | 35 | Search UV+NANOIMPRINT | Search UV+NANOIMPRINT |
5 | UV NIL | 349046 | 1% | 83% | 30 | Search UV+NIL | Search UV+NIL |
6 | ANTISTICKING LAYER | 279877 | 1% | 95% | 21 | Search ANTISTICKING+LAYER | Search ANTISTICKING+LAYER |
7 | HOT EMBOSSING | 232180 | 3% | 23% | 71 | Search HOT+EMBOSSING | Search HOT+EMBOSSING |
8 | UV NANOIMPRINT LITHOGRAPHY | 218141 | 1% | 63% | 25 | Search UV+NANOIMPRINT+LITHOGRAPHY | Search UV+NANOIMPRINT+LITHOGRAPHY |
9 | THERMAL NANOIMPRINT | 180940 | 1% | 72% | 18 | Search THERMAL+NANOIMPRINT | Search THERMAL+NANOIMPRINT |
10 | NANOIMPRINT LITHOGRAPHY NIL | 178058 | 1% | 49% | 26 | Search NANOIMPRINT+LITHOGRAPHY+NIL | Search NANOIMPRINT+LITHOGRAPHY+NIL |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Classes with closest relation at Level 1 |