Class information for: |
Basic class information |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
8 | 4 | POLYMER SCIENCE//CHEMISTRY, PHYSICAL//MATERIALS SCIENCE, MULTIDISCIPLINARY | 1554940 |
397 | 3 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//MICROELECTRONIC ENGINEERING//NANOSCIENCE & NANOTECHNOLOGY | 32153 |
2484 | 2 | TWO PHOTON POLYMERIZATION//MICROLENS ARRAY//MICROLENS | 4177 |
33006 | 1 | ADV SCI TECHNOL IND//HELICAL PATTERN//LASER SCAN LITHOGRAPHY | 144 |
Terms with highest relevance score |
rank | Category | termType | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|---|
1 | ADV SCI TECHNOL IND | address | 1136350 | 31% | 12% | 45 |
2 | HELICAL PATTERN | authKW | 781668 | 3% | 71% | 5 |
3 | LASER SCAN LITHOGRAPHY | authKW | 700376 | 3% | 80% | 4 |
4 | WORM INJECTION MOLDING | authKW | 656604 | 2% | 100% | 3 |
5 | LIGA PROCESS | authKW | 591520 | 7% | 27% | 10 |
6 | FLUID FILTER | authKW | 437736 | 1% | 100% | 2 |
7 | GRAYSCALE MASK | authKW | 437736 | 1% | 100% | 2 |
8 | LASER SCAN EXPOSURE | authKW | 437736 | 1% | 100% | 2 |
9 | MICROFLUID FILTER | authKW | 437736 | 1% | 100% | 2 |
10 | SUBSTRATE TEMPERATURE DEPENDENCE | authKW | 393960 | 2% | 60% | 3 |
Web of Science journal categories |
chi_square_rank | Category | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | Physics, Applied | 1470 | 64% | 0% | 92 |
2 | Nanoscience & Nanotechnology | 1336 | 33% | 0% | 48 |
3 | Engineering, Electrical & Electronic | 607 | 39% | 0% | 56 |
4 | Instruments & Instrumentation | 180 | 12% | 0% | 17 |
5 | Materials Science, Multidisciplinary | 170 | 26% | 0% | 38 |
6 | COMPUTER APPLICATIONS & CYBERNETICS | 82 | 1% | 0% | 1 |
7 | Nuclear Science & Technology | 52 | 6% | 0% | 9 |
8 | Optics | 49 | 9% | 0% | 13 |
9 | Materials Science, Coatings & Films | 38 | 4% | 0% | 6 |
10 | Polymer Science | 26 | 6% | 0% | 9 |
Address terms |
chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | ADV SCI TECHNOL IND | 1136350 | 31% | 12% | 45 |
2 | DOCTORAL PROGRAM MECH ENGN | 218868 | 1% | 100% | 1 |
3 | ENERGY DENS | 218868 | 1% | 100% | 1 |
4 | MACRO BIOELE OMECH AUTONOMOUS NANOSYST BEANS CT | 218868 | 1% | 100% | 1 |
5 | REACT DYNAM UNIT | 218868 | 1% | 100% | 1 |
6 | WASHINGTON WORKS | 218868 | 1% | 100% | 1 |
7 | ADV SCI TECHNOL IND LASTI | 196977 | 2% | 30% | 3 |
8 | QUANTUM EQUIPMENT TECHNOL | 115866 | 2% | 18% | 3 |
9 | LASTI | 103657 | 6% | 5% | 9 |
10 | ADV SCI ENGN IND | 72955 | 1% | 33% | 1 |
Journals |
chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS | 39657 | 18% | 1% | 26 |
2 | JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 5293 | 5% | 0% | 7 |
3 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2807 | 14% | 0% | 20 |
4 | ELECTRICAL ENGINEERING IN JAPAN | 2439 | 3% | 0% | 5 |
5 | ELECTRONICS AND COMMUNICATIONS IN JAPAN | 1202 | 1% | 0% | 2 |
6 | JOURNAL OF ADVANCED MECHANICAL DESIGN SYSTEMS AND MANUFACTURING | 1107 | 1% | 0% | 2 |
7 | JAPANESE JOURNAL OF APPLIED PHYSICS | 1066 | 6% | 0% | 9 |
8 | MICROELECTRONIC ENGINEERING | 1027 | 5% | 0% | 7 |
9 | JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS | 866 | 1% | 0% | 2 |
10 | PROCEEDINGS OF THE SID | 777 | 1% | 0% | 1 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Classes with closest relation at Level 1 |