Class information for: |
Basic class information |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
| Cluster id | Level | Cluster label | #P |
|---|---|---|---|
| 8 | 4 | POLYMER SCIENCE//CHEMISTRY, PHYSICAL//MATERIALS SCIENCE, MULTIDISCIPLINARY | 1554940 |
| 397 | 3 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//MICROELECTRONIC ENGINEERING//NANOSCIENCE & NANOTECHNOLOGY | 32153 |
| 2484 | 2 | TWO PHOTON POLYMERIZATION//MICROLENS ARRAY//MICROLENS | 4177 |
| 26716 | 1 | SYNCHROTRON RADIATION STIMULATED ETCHING//VACUUM UV PHOTOSCI//SYNCHROTRON RADIATION EXCITED GROWTH | 267 |
Terms with highest relevance score |
| rank | Category | termType | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|---|
| 1 | SYNCHROTRON RADIATION STIMULATED ETCHING | authKW | 354121 | 1% | 100% | 3 |
| 2 | VACUUM UV PHOTOSCI | address | 246239 | 4% | 19% | 11 |
| 3 | SYNCHROTRON RADIATION EXCITED GROWTH | authKW | 236080 | 1% | 100% | 2 |
| 4 | ETCHED PATTERN | authKW | 157386 | 1% | 67% | 2 |
| 5 | SYNCHROTRON RADIATION ETCHING | authKW | 157386 | 1% | 67% | 2 |
| 6 | 50 NM PATTERN ETCHING | authKW | 118040 | 0% | 100% | 1 |
| 7 | BEHLEN PHYS 225 | address | 118040 | 0% | 100% | 1 |
| 8 | BML IRAS | authKW | 118040 | 0% | 100% | 1 |
| 9 | CARBONOUS FILM | authKW | 118040 | 0% | 100% | 1 |
| 10 | CERN EU | authKW | 118040 | 0% | 100% | 1 |
Web of Science journal categories |
| chi_square_rank | Category | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | Physics, Applied | 2411 | 60% | 0% | 161 |
| 2 | Materials Science, Coatings & Films | 1989 | 20% | 0% | 53 |
| 3 | Instruments & Instrumentation | 419 | 13% | 0% | 35 |
| 4 | Physics, Condensed Matter | 315 | 19% | 0% | 52 |
| 5 | Spectroscopy | 234 | 9% | 0% | 23 |
| 6 | Nuclear Science & Technology | 219 | 9% | 0% | 24 |
| 7 | Physics, Nuclear | 201 | 9% | 0% | 23 |
| 8 | Chemistry, Physical | 135 | 18% | 0% | 47 |
| 9 | Physics, Atomic, Molecular & Chemical | 95 | 9% | 0% | 23 |
| 10 | Nanoscience & Nanotechnology | 57 | 6% | 0% | 16 |
Address terms |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | VACUUM UV PHOTOSCI | 246239 | 4% | 19% | 11 |
| 2 | BEHLEN PHYS 225 | 118040 | 0% | 100% | 1 |
| 3 | CHEM KAMITOMIOKA | 118040 | 0% | 100% | 1 |
| 4 | KAZUSA ARC | 118040 | 0% | 100% | 1 |
| 5 | KONINKLIJKE SHELL AMSTERDAM | 118040 | 0% | 100% | 1 |
| 6 | ELECT ENGN ELECT INFORMAT ENGN | 59019 | 0% | 50% | 1 |
| 7 | PL PHYS SUMIYOSHI KU | 52459 | 1% | 22% | 2 |
| 8 | SCI TECH S SETAGAYA KU | 39345 | 0% | 33% | 1 |
| 9 | NEWSUBARU | 29509 | 0% | 25% | 1 |
| 10 | ELECT ELECT ENGN INFORMAT ENGN | 19672 | 0% | 17% | 1 |
Journals |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | OPTOELECTRONICS-DEVICES AND TECHNOLOGIES | 62856 | 3% | 8% | 7 |
| 2 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 3632 | 8% | 0% | 21 |
| 3 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2744 | 10% | 0% | 27 |
| 4 | JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA | 1962 | 4% | 0% | 10 |
| 5 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1563 | 6% | 0% | 15 |
| 6 | APPLIED SURFACE SCIENCE | 1402 | 8% | 0% | 21 |
| 7 | APPLIED PHYSICS LETTERS | 985 | 12% | 0% | 31 |
| 8 | ELECTRONICS AND COMMUNICATIONS IN JAPAN | 646 | 1% | 0% | 2 |
| 9 | SURFACE SCIENCE | 612 | 4% | 0% | 12 |
| 10 | JOURNAL OF SYNCHROTRON RADIATION | 594 | 1% | 0% | 4 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Classes with closest relation at Level 1 |