Class information for:
Level 1: STENCIL LITHOGRAPHY//STRESS INDUCED DEFORMATION//RESIST SPRAY COATING

Basic class information

Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes

The table includes all classes above and classes immediately below the current class.



Cluster id Level Cluster label #P
8 4 POLYMER SCIENCE//CHEMISTRY, PHYSICAL//MATERIALS SCIENCE, MULTIDISCIPLINARY 1554940
397 3       JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//MICROELECTRONIC ENGINEERING//NANOSCIENCE & NANOTECHNOLOGY 32153
806 2             JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//CHEMICALLY AMPLIFIED RESIST//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 12229
26014 1                   STENCIL LITHOGRAPHY//STRESS INDUCED DEFORMATION//RESIST SPRAY COATING 287

Terms with highest relevance score



rank Category termType chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 STENCIL LITHOGRAPHY authKW 1872621 6% 95% 18
2 STRESS INDUCED DEFORMATION authKW 457558 2% 83% 5
3 RESIST SPRAY COATING authKW 439257 1% 100% 4
4 SHADOW MASK authKW 414361 7% 19% 20
5 NANOSTENCIL authKW 358719 2% 47% 7
6 THREE DIMENSIONAL PHOTOLITHOGRAPHY authKW 329443 1% 100% 3
7 FEEDTHROUGHS authKW 247081 1% 75% 3
8 AGILE FAB authKW 219629 1% 100% 2
9 ANGLED EXPOSURE authKW 219629 1% 100% 2
10 ELECTRODEPOSITION OF PHOTORESIST authKW 219629 1% 100% 2

Web of Science journal categories



chi_square_rank Category chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 Nanoscience & Nanotechnology 6442 51% 0% 147
2 Physics, Applied 3124 66% 0% 189
3 Engineering, Electrical & Electronic 2251 52% 0% 149
4 Instruments & Instrumentation 1879 26% 0% 74
5 Materials Science, Multidisciplinary 692 36% 0% 103
6 Optics 255 14% 0% 39
7 Mechanics 234 11% 0% 31
8 Engineering, Manufacturing 120 4% 0% 11
9 Physics, Condensed Matter 119 13% 0% 36
10 Chemistry, Multidisciplinary 46 11% 0% 32

Address terms



chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 MICROSYST 1 164718 1% 50% 3
2 11X MFG 109814 0% 100% 1
3 AG MEMS 109814 0% 100% 1
4 AUTOMAT ARCHITECTURE SYST 109814 0% 100% 1
5 CEA GRENOBLE INAC UMR5819 109814 0% 100% 1
6 CEA INAC UMR SPRAM 5819 109814 0% 100% 1
7 DIMESEEMCS 109814 0% 100% 1
8 ELECT RUMENTATET 109814 0% 100% 1
9 EPFL STN 11 109814 0% 100% 1
10 FAB D1C MFG 109814 0% 100% 1

Journals



chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 JOURNAL OF MICROMECHANICS AND MICROENGINEERING 18528 11% 1% 31
2 MICROELECTRONIC ENGINEERING 9532 10% 0% 30
3 SENSORS AND ACTUATORS A-PHYSICAL 4772 7% 0% 21
4 CONNECTOR SPECIFIER 2966 0% 3% 1
5 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 2594 7% 0% 20
6 JOURNAL OF MICROELECTROMECHANICAL SYSTEMS 2525 3% 0% 8
7 RCA REVIEW 2284 1% 1% 2
8 JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS 1739 1% 0% 4
9 IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING 1708 2% 0% 5
10 NANO LETTERS 1020 4% 0% 11

Author Key Words



chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass LCSH search Wikipedia search
1 STENCIL LITHOGRAPHY 1872621 6% 95% 18 Search STENCIL+LITHOGRAPHY Search STENCIL+LITHOGRAPHY
2 STRESS INDUCED DEFORMATION 457558 2% 83% 5 Search STRESS+INDUCED+DEFORMATION Search STRESS+INDUCED+DEFORMATION
3 RESIST SPRAY COATING 439257 1% 100% 4 Search RESIST+SPRAY+COATING Search RESIST+SPRAY+COATING
4 SHADOW MASK 414361 7% 19% 20 Search SHADOW+MASK Search SHADOW+MASK
5 NANOSTENCIL 358719 2% 47% 7 Search NANOSTENCIL Search NANOSTENCIL
6 THREE DIMENSIONAL PHOTOLITHOGRAPHY 329443 1% 100% 3 Search THREE+DIMENSIONAL+PHOTOLITHOGRAPHY Search THREE+DIMENSIONAL+PHOTOLITHOGRAPHY
7 FEEDTHROUGHS 247081 1% 75% 3 Search FEEDTHROUGHS Search FEEDTHROUGHS
8 AGILE FAB 219629 1% 100% 2 Search AGILE+FAB Search AGILE+FAB
9 ANGLED EXPOSURE 219629 1% 100% 2 Search ANGLED+EXPOSURE Search ANGLED+EXPOSURE
10 ELECTRODEPOSITION OF PHOTORESIST 219629 1% 100% 2 Search ELECTRODEPOSITION+OF+PHOTORESIST Search ELECTRODEPOSITION+OF+PHOTORESIST

Core articles

The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.

Classes with closest relation at Level 1



rank cluster_id2 link
1 29393 NANOSYST MFG//ION PROJECTION//NANOELECT PROC IL
2 28240 HSQ//HYDROGEN SILSESQUIOXANE//HYDROGEN SILSESQUIOXANE HSQ
3 27003 NANOCHANNEL MEMBRANES//FLOAT CASTING//MICROCHANNEL SUSPENSION FLOW
4 10740 SU 8//MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS//LIGA
5 29670 LAB ON FIBER//FIBER TOP DEVICES//INTEGRATED MICROCHANNEL
6 29894 LEHRSTUHL ADHAS INTERPHASEN POLYMEREN//UNITE MICROELECT OPTOELECT POLYMERE//UNITE MICROELECT OPTOELECT POLYME
7 7325 MICROCONTACT PRINTING//SOFT LITHOGRAPHY//MICROMOLDING IN CAPILLARIES
8 28194 DYNAMIC CHEMICAL POLISHING//ACOUSTIC DROPLET EJECTOR//AL AL2O3 NANO PARTICLE
9 33006 ADV SCI TECHNOL IND//HELICAL PATTERN//LASER SCAN LITHOGRAPHY
10 12235 ANISOTROPIC ETCHING//MICRONANOSYST ENGN//MEMS MICRO NANO SYST

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