Class information for: |
Basic class information |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
| Cluster id | Level | Cluster label | #P |
|---|---|---|---|
| 1 | 4 | PHYSICS, CONDENSED MATTER//PHYSICS, APPLIED//MATERIALS SCIENCE, MULTIDISCIPLINARY | 2188495 |
| 13 | 3 | PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON | 136516 |
| 3314 | 2 | CLEANROOM//PHOTORESIST REMOVAL//MINIENVIRONMENT | 1952 |
| 27147 | 1 | PHOTORESIST REMOVAL//WET OZONE//RESIST REMOVAL | 256 |
Terms with highest relevance score |
| rank | Category | termType | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|---|
| 1 | PHOTORESIST REMOVAL | authKW | 1340551 | 5% | 78% | 14 |
| 2 | WET OZONE | authKW | 861786 | 3% | 100% | 7 |
| 3 | RESIST REMOVAL | authKW | 831004 | 4% | 75% | 9 |
| 4 | RESIST STRIPPING | authKW | 384722 | 2% | 63% | 5 |
| 5 | HOT WIRE CATALYZER | authKW | 369337 | 1% | 100% | 3 |
| 6 | INTEGRATED TECHNOL SYST | address | 320071 | 5% | 20% | 13 |
| 7 | ION IMPLANTED RESIST | authKW | 277001 | 1% | 75% | 3 |
| 8 | REMOVING RESIST | authKW | 246225 | 1% | 100% | 2 |
| 9 | UCT S | address | 246225 | 1% | 100% | 2 |
| 10 | NOVOLAK RESIST | authKW | 221600 | 1% | 60% | 3 |
Web of Science journal categories |
| chi_square_rank | Category | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | Materials Science, Coatings & Films | 1921 | 20% | 0% | 51 |
| 2 | Physics, Applied | 1820 | 54% | 0% | 138 |
| 3 | Physics, Condensed Matter | 864 | 31% | 0% | 80 |
| 4 | Electrochemistry | 508 | 13% | 0% | 32 |
| 5 | Engineering, Electrical & Electronic | 405 | 25% | 0% | 64 |
| 6 | Materials Science, Multidisciplinary | 307 | 27% | 0% | 68 |
| 7 | Nanoscience & Nanotechnology | 277 | 12% | 0% | 31 |
| 8 | Polymer Science | 258 | 13% | 0% | 33 |
| 9 | Engineering, Manufacturing | 111 | 4% | 0% | 10 |
| 10 | Instruments & Instrumentation | 13 | 3% | 0% | 8 |
Address terms |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | INTEGRATED TECHNOL SYST | 320071 | 5% | 20% | 13 |
| 2 | UCT S | 246225 | 1% | 100% | 2 |
| 3 | ADV CLEANING METROL DEFECT GRP | 123112 | 0% | 100% | 1 |
| 4 | C ACT GRP | 123112 | 0% | 100% | 1 |
| 5 | FPS WEA UCP | 123112 | 0% | 100% | 1 |
| 6 | IWATANI RD | 123112 | 0% | 100% | 1 |
| 7 | MOS3 | 123112 | 0% | 100% | 1 |
| 8 | NSF SRC ENGN ENVIRONM BENIGN SEMICOND MFG | 123112 | 0% | 100% | 1 |
| 9 | PLICAT PROC ENGN | 123112 | 0% | 100% | 1 |
| 10 | PLIED CHEM BIOENGN | 123112 | 0% | 100% | 1 |
Journals |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | SOLID STATE PHENOMENA | 60903 | 13% | 2% | 33 |
| 2 | JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 44355 | 11% | 1% | 27 |
| 3 | SOLID STATE TECHNOLOGY | 21421 | 7% | 1% | 18 |
| 4 | MICRO | 17478 | 2% | 3% | 5 |
| 5 | IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING | 6222 | 4% | 1% | 9 |
| 6 | MITSUBISHI ELECTRIC ADVANCE | 4102 | 0% | 3% | 1 |
| 7 | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 4083 | 13% | 0% | 32 |
| 8 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1631 | 6% | 0% | 15 |
| 9 | OZONE-SCIENCE & ENGINEERING | 1377 | 2% | 0% | 4 |
| 10 | JAPANESE JOURNAL OF APPLIED PHYSICS | 733 | 4% | 0% | 10 |
Author Key Words |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass | LCSH search | Wikipedia search |
|---|---|---|---|---|---|---|---|
| 1 | PHOTORESIST REMOVAL | 1340551 | 5% | 78% | 14 | Search PHOTORESIST+REMOVAL | Search PHOTORESIST+REMOVAL |
| 2 | WET OZONE | 861786 | 3% | 100% | 7 | Search WET+OZONE | Search WET+OZONE |
| 3 | RESIST REMOVAL | 831004 | 4% | 75% | 9 | Search RESIST+REMOVAL | Search RESIST+REMOVAL |
| 4 | RESIST STRIPPING | 384722 | 2% | 63% | 5 | Search RESIST+STRIPPING | Search RESIST+STRIPPING |
| 5 | HOT WIRE CATALYZER | 369337 | 1% | 100% | 3 | Search HOT+WIRE+CATALYZER | Search HOT+WIRE+CATALYZER |
| 6 | ION IMPLANTED RESIST | 277001 | 1% | 75% | 3 | Search ION+IMPLANTED+RESIST | Search ION+IMPLANTED+RESIST |
| 7 | REMOVING RESIST | 246225 | 1% | 100% | 2 | Search REMOVING+RESIST | Search REMOVING+RESIST |
| 8 | NOVOLAK RESIST | 221600 | 1% | 60% | 3 | Search NOVOLAK+RESIST | Search NOVOLAK+RESIST |
| 9 | OXIDE LOSS | 164148 | 1% | 67% | 2 | Search OXIDE+LOSS | Search OXIDE+LOSS |
| 10 | SEMICONDUCTOR CLEANING | 164148 | 1% | 67% | 2 | Search SEMICONDUCTOR+CLEANING | Search SEMICONDUCTOR+CLEANING |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Classes with closest relation at Level 1 |