Class information for:
Level 2: CLEANROOM//PHOTORESIST REMOVAL//MINIENVIRONMENT

Basic class information
Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
1 4 PHYSICS, CONDENSED MATTER//PHYSICS, APPLIED//MATERIALS SCIENCE, MULTIDISCIPLINARY 2188495
13 3       PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON 136516
3314 2             CLEANROOM//PHOTORESIST REMOVAL//MINIENVIRONMENT 1952
7741 1                   HYDROGEN TERMINATION//NATIVE OXIDE//SHIZUOKA TORY 1357
24318 1                   CLEANROOM//MINIENVIRONMENT//AIRBORNE MOLECULAR CONTAMINATION 339
27147 1                   PHOTORESIST REMOVAL//WET OZONE//RESIST REMOVAL 256

Terms with highest relevance score


rank Category termType chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 CLEANROOM authKW 324597 3% 37% 54
2 PHOTORESIST REMOVAL authKW 201797 1% 83% 15
3 MINIENVIRONMENT authKW 162785 1% 92% 11
4 ORGANIC CONTAMINATION authKW 123954 1% 32% 24
5 AIRBORNE MOLECULAR CONTAMINATION authKW 118876 0% 82% 9
6 WET OZONE authKW 113009 0% 100% 7
7 HYDROGEN TERMINATION authKW 111967 1% 25% 28
8 RESIST REMOVAL authKW 108968 0% 75% 9
9 NATIVE OXIDE authKW 98890 1% 26% 24
10 SHIZUOKA TORY address 96865 0% 100% 6

Web of Science journal categories


chi_square_rank Category chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 Materials Science, Coatings & Films 20389 23% 0% 457
2 Physics, Applied 11498 49% 0% 964
3 Electrochemistry 5775 15% 0% 295
4 Physics, Condensed Matter 4450 26% 0% 510
5 Engineering, Electrical & Electronic 981 15% 0% 301
6 Materials Science, Multidisciplinary 764 17% 0% 331
7 Nanoscience & Nanotechnology 640 7% 0% 140
8 Chemistry, Physical 573 14% 0% 279
9 Construction & Building Technology 351 3% 0% 50
10 Engineering, Manufacturing 334 3% 0% 50

Address terms


chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 SHIZUOKA TORY 96865 0% 100% 6
2 NINAMI KU 51660 0% 80% 4
3 INTEGRATED TECHNOL SYST 41954 1% 20% 13
4 ABT SILIZIUMPHOTOVOLTAIK 36323 0% 75% 3
5 CONTAMINAT QUAL ENGN MFG TECHNOL 32288 0% 100% 2
6 KDG 32288 0% 100% 2
7 UCT S 32288 0% 100% 2
8 AIR CONDITIONING REFRIGERAT ENGN 31121 0% 21% 9
9 ENERGY REFRIGERATING AIR CONDITIONING ENGN 25691 1% 8% 20
10 ADV MEMORY DEV 25260 0% 26% 6

Journals


chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 SOLID STATE PHENOMENA 73225 5% 5% 100
2 MICRO 48484 1% 13% 23
3 JOURNAL OF THE ELECTROCHEMICAL SOCIETY 35656 13% 1% 261
4 SOLID STATE TECHNOLOGY 31148 3% 3% 60
5 IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING 19473 2% 3% 44
6 JOURNAL OF THE IEST 11523 0% 14% 5
7 MICROCONTAMINATION 10326 0% 16% 4
8 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 10012 7% 0% 140
9 JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 6661 1% 1% 29
10 APPLIED SURFACE SCIENCE 4280 5% 0% 100

Author Key Words


chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass LCSH search Wikipedia search
1 CLEANROOM 324597 3% 37% 54 Search CLEANROOM Search CLEANROOM
2 PHOTORESIST REMOVAL 201797 1% 83% 15 Search PHOTORESIST+REMOVAL Search PHOTORESIST+REMOVAL
3 MINIENVIRONMENT 162785 1% 92% 11 Search MINIENVIRONMENT Search MINIENVIRONMENT
4 ORGANIC CONTAMINATION 123954 1% 32% 24 Search ORGANIC+CONTAMINATION Search ORGANIC+CONTAMINATION
5 AIRBORNE MOLECULAR CONTAMINATION 118876 0% 82% 9 Search AIRBORNE+MOLECULAR+CONTAMINATION Search AIRBORNE+MOLECULAR+CONTAMINATION
6 WET OZONE 113009 0% 100% 7 Search WET+OZONE Search WET+OZONE
7 HYDROGEN TERMINATION 111967 1% 25% 28 Search HYDROGEN+TERMINATION Search HYDROGEN+TERMINATION
8 RESIST REMOVAL 108968 0% 75% 9 Search RESIST+REMOVAL Search RESIST+REMOVAL
9 NATIVE OXIDE 98890 1% 26% 24 Search NATIVE+OXIDE Search NATIVE+OXIDE
10 AIRBORNE MOLECULAR CONTAMINANTS AMCS 80721 0% 100% 5 Search AIRBORNE+MOLECULAR+CONTAMINANTS+AMCS Search AIRBORNE+MOLECULAR+CONTAMINANTS+AMCS

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.

Classes with closest relation at Level 2


rank cluster_id2 link
1 1116 SILICON OXYNITRIDE//BORON PENETRATION//SILICON NITRIDE
2 3171 WAFER BONDING//ANODIC BONDING//DIRECT BONDING
3 893 SIGE//STRAINED SI//GERMANIUM
4 1061 SURFACE SCIENCE//SILICON//SCANNING TUNNELING MICROSCOPY
5 813 POROUS SILICON//SILICON NANOCRYSTALS//SI NANOCRYSTALS
6 1480 PLASMA ETCHING//ELECT DEVICES MAT TECHNOL//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
7 1050 SELF ASSEMBLED MONOLAYER//LANGMUIR//ALKANETHIOL
8 1185 OXYGEN PRECIPITATION//CZOCHRALSKI SILICON//THERMAL DONORS
9 3569 AC SURFACE PHOTOVOLTAGE//ELECTRON WORK FUNCTION//REGIONAL DENSITY FUNCTIONAL THEORY
10 2541 CHEMICAL MECHANICAL POLISHING//CMP//CHEMICAL MECHANICAL POLISHING CMP

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