Class information for: |
Basic class information |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
| Cluster id | Level | Cluster label | #P |
|---|---|---|---|
| 8 | 4 | POLYMER SCIENCE//CHEMISTRY, PHYSICAL//MATERIALS SCIENCE, MULTIDISCIPLINARY | 1554940 |
| 314 | 3 | POLYMER SCIENCE//POLYIMIDE//PLASMA POLYMERIZATION | 39712 |
| 1393 | 2 | PLASMA POLYMERIZATION//LOW K//PLASMA PROCESSES AND POLYMERS | 8345 |
| 24520 | 1 | INITIATED CHEMICAL VAPOR DEPOSITION//ICVD//INITIATED CHEMICAL VAPOR DEPOSITION ICVD | 332 |
Terms with highest relevance score |
| rank | Category | termType | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|---|
| 1 | INITIATED CHEMICAL VAPOR DEPOSITION | authKW | 2034188 | 9% | 71% | 30 |
| 2 | ICVD | authKW | 1833483 | 8% | 74% | 26 |
| 3 | INITIATED CHEMICAL VAPOR DEPOSITION ICVD | authKW | 310096 | 2% | 47% | 7 |
| 4 | GAS PHASE ASSISTED SURFACE POLYMERIZATION | authKW | 189859 | 1% | 100% | 2 |
| 5 | PHYSICALLY CONTROLLED POLYMERIZATION | authKW | 189859 | 1% | 100% | 2 |
| 6 | INITIATED CVD | authKW | 142391 | 1% | 50% | 3 |
| 7 | US TECHNOL DEV | address | 142391 | 1% | 50% | 3 |
| 8 | MORK FAMILY CHEM ENGN MAT SCI | address | 131672 | 8% | 5% | 28 |
| 9 | ADSORPTION LIMITED DEPOSITION RATE | authKW | 94930 | 0% | 100% | 1 |
| 10 | ADV REASEARCH PLICAT | address | 94930 | 0% | 100% | 1 |
Web of Science journal categories |
| chi_square_rank | Category | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | Materials Science, Coatings & Films | 3136 | 22% | 0% | 74 |
| 2 | Materials Science, Multidisciplinary | 1605 | 49% | 0% | 163 |
| 3 | Polymer Science | 1296 | 24% | 0% | 80 |
| 4 | Nanoscience & Nanotechnology | 884 | 18% | 0% | 61 |
| 5 | Physics, Applied | 814 | 33% | 0% | 110 |
| 6 | Physics, Condensed Matter | 686 | 25% | 0% | 83 |
| 7 | Chemistry, Physical | 397 | 25% | 0% | 83 |
| 8 | Materials Science, Biomaterials | 249 | 5% | 0% | 16 |
| 9 | Chemistry, Multidisciplinary | 248 | 20% | 0% | 66 |
| 10 | Electrochemistry | 166 | 7% | 0% | 22 |
Address terms |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | US TECHNOL DEV | 142391 | 1% | 50% | 3 |
| 2 | MORK FAMILY CHEM ENGN MAT SCI | 131672 | 8% | 5% | 28 |
| 3 | ADV REASEARCH PLICAT | 94930 | 0% | 100% | 1 |
| 4 | BARCELLONA BIOENGN | 94930 | 0% | 100% | 1 |
| 5 | MAT MANU T DIRECTORATE | 94930 | 0% | 100% | 1 |
| 6 | SIDPHYS DEVICES | 94930 | 0% | 100% | 1 |
| 7 | THERMOPHYS SIBERIAN BRANCH | 94930 | 0% | 100% | 1 |
| 8 | HENKEL ADV TECHNOL | 74155 | 2% | 16% | 5 |
| 9 | SOLDIER NANOTECHNOL | 67475 | 5% | 4% | 16 |
| 10 | GRP ENGN MAT | 50252 | 1% | 18% | 3 |
Journals |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | CHEMICAL VAPOR DEPOSITION | 24417 | 5% | 2% | 16 |
| 2 | THIN SOLID FILMS | 3330 | 11% | 0% | 36 |
| 3 | MACROMOLECULAR RAPID COMMUNICATIONS | 2620 | 4% | 0% | 12 |
| 4 | BEILSTEIN JOURNAL OF NANOTECHNOLOGY | 2005 | 2% | 0% | 5 |
| 5 | LANGMUIR | 1813 | 8% | 0% | 28 |
| 6 | NANOSCIENCE AND NANOTECHNOLOGY LETTERS | 1744 | 2% | 0% | 5 |
| 7 | MATERIALS HORIZONS | 1333 | 1% | 1% | 2 |
| 8 | MACROMOLECULES | 1154 | 7% | 0% | 22 |
| 9 | MACROMOLECULAR MATERIALS AND ENGINEERING | 1134 | 2% | 0% | 5 |
| 10 | ACS APPLIED MATERIALS & INTERFACES | 1039 | 4% | 0% | 14 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Classes with closest relation at Level 1 |