Class information for: |
Basic class information |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
| Cluster id | Level | Cluster label | #P |
|---|---|---|---|
| 1 | 4 | PHYSICS, CONDENSED MATTER//PHYSICS, APPLIED//MATERIALS SCIENCE, MULTIDISCIPLINARY | 2188495 |
| 390 | 3 | SENSORS AND ACTUATORS A-PHYSICAL//JOURNAL OF MICROELECTROMECHANICAL SYSTEMS//MEMS | 32897 |
| 3658 | 2 | MICROHOTPLATE//MICROHEATER//THIN FILM THERMOCOUPLES | 1296 |
| 31719 | 1 | PT TI LAYER//PT BOTTOM ELECTRODE//ADHESION LAYER | 162 |
Terms with highest relevance score |
| rank | Category | termType | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|---|
| 1 | PT TI LAYER | authKW | 389098 | 1% | 100% | 2 |
| 2 | PT BOTTOM ELECTRODE | authKW | 259397 | 1% | 67% | 2 |
| 3 | ADHESION LAYER | authKW | 226962 | 4% | 17% | 7 |
| 4 | ADHESIVE BEND TEST | authKW | 194549 | 1% | 100% | 1 |
| 5 | ARGON GAS WORKING PRESSURE | authKW | 194549 | 1% | 100% | 1 |
| 6 | CHEMICAL AND ELECTRICAL CHARACTERIZATION | authKW | 194549 | 1% | 100% | 1 |
| 7 | CHEMISORBED ATOMIC OXYGEN | authKW | 194549 | 1% | 100% | 1 |
| 8 | CNYM | address | 194549 | 1% | 100% | 1 |
| 9 | CU2O CUO THIN FILMS | authKW | 194549 | 1% | 100% | 1 |
| 10 | DUAL ION BEAM SPUTTER DEPOSITION | authKW | 194549 | 1% | 100% | 1 |
Web of Science journal categories |
| chi_square_rank | Category | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | Physics, Applied | 2181 | 73% | 0% | 118 |
| 2 | Materials Science, Coatings & Films | 976 | 18% | 0% | 29 |
| 3 | Instruments & Instrumentation | 649 | 20% | 0% | 33 |
| 4 | Physics, Condensed Matter | 402 | 27% | 0% | 44 |
| 5 | Engineering, Electrical & Electronic | 171 | 21% | 0% | 34 |
| 6 | Materials Science, Multidisciplinary | 163 | 25% | 0% | 40 |
| 7 | Nanoscience & Nanotechnology | 37 | 6% | 0% | 10 |
| 8 | Electrochemistry | 21 | 4% | 0% | 6 |
| 9 | Materials Science, Ceramics | 18 | 2% | 0% | 4 |
| 10 | Mechanics | 9 | 4% | 0% | 6 |
Address terms |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | CNYM | 194549 | 1% | 100% | 1 |
| 2 | FEMTO ST ENERGIE | 194549 | 1% | 100% | 1 |
| 3 | FEMTO ST MICRO NANO SCI SYST | 194549 | 1% | 100% | 1 |
| 4 | HL PI M | 194549 | 1% | 100% | 1 |
| 5 | IIS CNRS | 194549 | 1% | 100% | 1 |
| 6 | LEHRSTUHL LASERTECHN | 194549 | 1% | 100% | 1 |
| 7 | MICROMECH MICROFLUIDICS MICROACTUATORS | 194549 | 1% | 100% | 1 |
| 8 | MP E TF | 194549 | 1% | 100% | 1 |
| 9 | PACKAGE TECHNOL TEAM | 194549 | 1% | 100% | 1 |
| 10 | PL THERMOMETRY WG 7 42 | 194549 | 1% | 100% | 1 |
Journals |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | INTEGRATED FERROELECTRICS | 9572 | 9% | 0% | 14 |
| 2 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 4601 | 1% | 1% | 2 |
| 3 | REVIEW OF SCIENTIFIC INSTRUMENTS | 1411 | 9% | 0% | 15 |
| 4 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1212 | 9% | 0% | 14 |
| 5 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 659 | 4% | 0% | 7 |
| 6 | THIN SOLID FILMS | 629 | 7% | 0% | 11 |
| 7 | JOURNAL OF MICROELECTROMECHANICAL SYSTEMS | 627 | 2% | 0% | 3 |
| 8 | JOURNAL OF MICROMECHANICS AND MICROENGINEERING | 540 | 2% | 0% | 4 |
| 9 | JOURNAL OF APPLIED RESEARCH AND TECHNOLOGY | 505 | 1% | 0% | 1 |
| 10 | APPLIED SURFACE SCIENCE | 330 | 5% | 0% | 8 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Classes with closest relation at Level 1 |