Class information for:
Level 1: SILANE PLASMA//SIH2//HYDROGENATED AMORPHOUS SILICON FILM

Basic class information
Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
1 4 PHYSICS, CONDENSED MATTER//PHYSICS, APPLIED//MATERIALS SCIENCE, MULTIDISCIPLINARY 2188495
13 3       PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON 136516
389 2             MICROCRYSTALLINE SILICON//JOURNAL OF NON-CRYSTALLINE SOLIDS//AMORPHOUS SILICON 17376
16142 1                   SILANE PLASMA//SIH2//HYDROGENATED AMORPHOUS SILICON FILM 697

Terms with highest relevance score


rank Category termType chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 SILANE PLASMA authKW 146490 1% 36% 9
2 SIH2 authKW 123081 1% 39% 7
3 HYDROGENATED AMORPHOUS SILICON FILM authKW 67822 0% 50% 3
4 SIH3 authKW 67822 0% 50% 3
5 RF PLASMA CHEMICAL VAPOR DEPOSITION authKW 60287 0% 67% 2
6 VIRTUAL REACTOR authKW 60287 0% 67% 2
7 HYDROGENATED AMORPHOUS SILICON authKW 54015 3% 6% 19
8 PRIAM address 48225 1% 27% 4
9 A SI H DEPOSITION PARAMETERS authKW 45216 0% 100% 1
10 ABSOLUTE CH RADICAL DENSITY authKW 45216 0% 100% 1

Web of Science journal categories


chi_square_rank Category chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 Physics, Applied 3947 48% 0% 338
2 Materials Science, Ceramics 1799 10% 0% 72
3 Materials Science, Coatings & Films 1340 10% 0% 72
4 Materials Science, Multidisciplinary 536 22% 0% 154
5 Physics, Atomic, Molecular & Chemical 516 12% 0% 82
6 Physics, Condensed Matter 336 13% 0% 93
7 Chemistry, Physical 320 17% 0% 118
8 Physics, Fluids & Plasmas 179 4% 0% 31
9 COMPUTER APPLICATIONS & CYBERNETICS 65 0% 0% 2
10 Physics, Multidisciplinary 23 4% 0% 31

Address terms


chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 PRIAM 48225 1% 27% 4
2 CENT S SORA KU 45216 0% 100% 1
3 COUCHE MINCE INTER ES 45216 0% 100% 1
4 EDIFICI CAMPUS PATERNA 45216 0% 100% 1
5 ENGN ELECT ENGN SUMIYOSHI KU 45216 0% 100% 1
6 ENGN MAT SCI ENGN HIGASHI KU 45216 0% 100% 1
7 ESTIJOINT 45216 0% 100% 1
8 HIGH PERFORMANCE COMPUTAT DATABASES 45216 0% 100% 1
9 OFF MED DEVICES 45216 0% 100% 1
10 SID PHYS 45216 0% 100% 1

Journals


chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 JOURNAL OF NON-CRYSTALLINE SOLIDS 9545 10% 0% 70
2 JOURNAL OF APPLIED PHYSICS 2891 12% 0% 84
3 HIGH TEMPERATURE MATERIAL PROCESSES 2605 1% 1% 6
4 PLASMA CHEMISTRY AND PLASMA PROCESSING 2440 1% 1% 9
5 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 2048 5% 0% 38
6 JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS 1615 3% 0% 21
7 THIN SOLID FILMS 1462 5% 0% 35
8 SEMICONDUCTORS AND SEMIMETALS 1362 1% 1% 4
9 PLASMA SOURCES SCIENCE & TECHNOLOGY 1265 1% 0% 9
10 JAPAN ANNUAL REVIEWS IN ELECTRONICS COMPUTERS & TELECOMMUNICATIONS 1024 0% 1% 2

Author Key Words


chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass LCSH search Wikipedia search
1 SILANE PLASMA 146490 1% 36% 9 Search SILANE+PLASMA Search SILANE+PLASMA
2 SIH2 123081 1% 39% 7 Search SIH2 Search SIH2
3 HYDROGENATED AMORPHOUS SILICON FILM 67822 0% 50% 3 Search HYDROGENATED+AMORPHOUS+SILICON+FILM Search HYDROGENATED+AMORPHOUS+SILICON+FILM
4 SIH3 67822 0% 50% 3 Search SIH3 Search SIH3
5 RF PLASMA CHEMICAL VAPOR DEPOSITION 60287 0% 67% 2 Search RF+PLASMA+CHEMICAL+VAPOR+DEPOSITION Search RF+PLASMA+CHEMICAL+VAPOR+DEPOSITION
6 VIRTUAL REACTOR 60287 0% 67% 2 Search VIRTUAL+REACTOR Search VIRTUAL+REACTOR
7 HYDROGENATED AMORPHOUS SILICON 54015 3% 6% 19 Search HYDROGENATED+AMORPHOUS+SILICON Search HYDROGENATED+AMORPHOUS+SILICON
8 A SI H DEPOSITION PARAMETERS 45216 0% 100% 1 Search A+SI+H+DEPOSITION+PARAMETERS Search A+SI+H+DEPOSITION+PARAMETERS
9 ABSOLUTE CH RADICAL DENSITY 45216 0% 100% 1 Search ABSOLUTE+CH+RADICAL+DENSITY Search ABSOLUTE+CH+RADICAL+DENSITY
10 ADAPTIVE WORKLOAD BALANCING 45216 0% 100% 1 Search ADAPTIVE+WORKLOAD+BALANCING Search ADAPTIVE+WORKLOAD+BALANCING

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.

Classes with closest relation at Level 1


rank cluster_id2 link
1 24787 CASCADED ARC//MAGNUM PSI//LINEAR PLASMA GENERATOR
2 7996 2 CHLOROETHENYLSILANE//DIVALENT STATE STABILIZATION ENERGY//PENTAMETHYLDISILANE
3 12620 DUST PARTICLE GROWTH//DUSTY PLASMA//GREMI
4 341 MICROCRYSTALLINE SILICON//ENERGY UNIT//NANOCRYSTALLINE SILICON
5 16785 INFRARED ELLIPSOMETRY//ROTATING POLARIZER ANALYZER ELLIPSOMETER//BERLIN
6 36059 LADDER SILICONE SPIN ON GLASS LS SOG//POLYSILOXENE BASED FILM//REACTIVE HYDROGEN PLASMA SPUTTERING
7 26088 F 2 LASER//CHEMICAL WET TREATMENT//DIELECTRIC TANGENT
8 26 JOURNAL OF NON-CRYSTALLINE SOLIDS//PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES//STAEBLER WRONSKI EFFECT
9 17530 HOT WIRE CVD//HOT WIRE CHEMICAL VAPOR DEPOSITION//CAT CVD
10 24329 GERMANIUM CARBON//GERMANIUM CARBIDE//DIFLUOROALKYLAMINES

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