Class information for:
Level 1: NICKEL SILICIDE//NISI//NI SILICIDE

Basic class information

Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes

The table includes all classes above and classes immediately below the current class.



Cluster id Level Cluster label #P
1 4 PHYSICS, CONDENSED MATTER//PHYSICS, APPLIED//MATERIALS SCIENCE, MULTIDISCIPLINARY 2188495
553 3       BETA FESI2//SILICIDES//ERBIUM 18376
685 2             BETA FESI2//SILICIDES//SERIES RESISTANCE 13508
10645 1                   NICKEL SILICIDE//NISI//NI SILICIDE 1075

Terms with highest relevance score



rank Category termType chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 NICKEL SILICIDE authKW 1263506 9% 46% 94
2 NISI authKW 1006945 6% 53% 65
3 NI SILICIDE authKW 671574 4% 55% 42
4 SILICIDES authKW 212152 9% 7% 98
5 FULL SILICIDATION authKW 205215 1% 100% 7
6 NI GERMANOSILICIDE authKW 175898 1% 100% 6
7 NIPTSI authKW 159608 1% 78% 7
8 NISI2 authKW 136165 1% 39% 12
9 GERMANOSILICIDE authKW 119703 1% 58% 7
10 NI3SI2 authKW 117266 0% 100% 4

Web of Science journal categories



chi_square_rank Category chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 Physics, Applied 11565 65% 0% 704
2 Materials Science, Coatings & Films 5077 16% 0% 171
3 Nanoscience & Nanotechnology 1846 15% 0% 161
4 Engineering, Electrical & Electronic 1719 25% 0% 270
5 Physics, Condensed Matter 1569 21% 0% 230
6 Materials Science, Multidisciplinary 1285 27% 0% 285
7 Optics 443 10% 0% 105
8 Metallurgy & Metallurgical Engineering 243 6% 0% 64
9 Microscopy 112 1% 0% 13
10 Electrochemistry 93 3% 0% 34

Address terms



chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 IM2NP 97165 5% 7% 51
2 VAKGROEP VASTE STOFWETEN PEN 67005 0% 57% 4
3 NAKA TORY 58633 0% 100% 2
4 TEXAS RUMENTS 52344 0% 36% 5
5 TSMC 52114 0% 44% 4
6 CNRS UPR 5001 39087 0% 67% 2
7 ST JEROME CASE 142 39087 0% 67% 2
8 ELECT TECH TECHNOL 32977 0% 38% 3
9 ADV THIN FILM 29316 0% 100% 1
10 AFFILIATE TEXAS RUMENTS INC 29316 0% 100% 1

Journals



chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 MICROELECTRONIC ENGINEERING 29399 9% 1% 102
2 IEEE ELECTRON DEVICE LETTERS 4744 4% 0% 39
3 JOURNAL OF APPLIED PHYSICS 4562 12% 0% 131
4 THIN SOLID FILMS 3614 6% 0% 68
5 ELECTROCHEMICAL AND SOLID STATE LETTERS 3593 2% 1% 23
6 JOURNAL OF THE KOREAN INSTITUTE OF METALS AND MATERIALS 3307 1% 2% 6
7 APPLIED PHYSICS LETTERS 2885 10% 0% 107
8 JAPANESE JOURNAL OF APPLIED PHYSICS 1887 3% 0% 33
9 APPLIED SURFACE SCIENCE 1558 4% 0% 45
10 JOURNAL OF ELECTRONIC MATERIALS 1107 2% 0% 20

Author Key Words



chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass LCSH search Wikipedia search
1 NICKEL SILICIDE 1263506 9% 46% 94 Search NICKEL+SILICIDE Search NICKEL+SILICIDE
2 NISI 1006945 6% 53% 65 Search NISI Search NISI
3 NI SILICIDE 671574 4% 55% 42 Search NI+SILICIDE Search NI+SILICIDE
4 SILICIDES 212152 9% 7% 98 Search SILICIDES Search SILICIDES
5 FULL SILICIDATION 205215 1% 100% 7 Search FULL+SILICIDATION Search FULL+SILICIDATION
6 NI GERMANOSILICIDE 175898 1% 100% 6 Search NI+GERMANOSILICIDE Search NI+GERMANOSILICIDE
7 NIPTSI 159608 1% 78% 7 Search NIPTSI Search NIPTSI
8 NISI2 136165 1% 39% 12 Search NISI2 Search NISI2
9 GERMANOSILICIDE 119703 1% 58% 7 Search GERMANOSILICIDE Search GERMANOSILICIDE
10 NI3SI2 117266 0% 100% 4 Search NI3SI2 Search NI3SI2

Core articles

The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.

Classes with closest relation at Level 1



rank cluster_id2 link
1 20907 SCHOTTKY BARRIER SB//DOPANT SEGREGATION DS//SCHOTTKY BARRIER MOSFET
2 1258 TISI2//COSI2//SALICIDE
3 24418 RFET//RECONFIGURABLE TRANSISTOR//SILICIDE NANOWIRES
4 7260 SURFACE MAGNETO OPTIC KERR EFFECT//VALENCE BAND DENSITY OF STATES//SILICIDES
5 19252 PTSI//LASER MOL BEAM EPITAXY//INTERNAL PHOTOEMISSION EFFECT
6 15224 REACTIVE MULTILAYERS//THERMAL EXPLOSION//SELF PROPAGATING EXOTHERMIC REACTION
7 30846 CROSS KELVIN RESISTOR CKR//CROSS BRIDGE KELVIN RESISTOR CBKR//POLYMETAL GATE
8 8169 GERMANIUM//MBE//GE MOS
9 22953 POLY SIGE//SIGE OXIDE//SILICON THIN FILM SOLAR CELL PROJECT
10 14400 SIGEC//SI1 YCY//SI1 X YGEXCY

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