Class information for: |
Basic class information |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
1 | 4 | PHYSICS, CONDENSED MATTER//PHYSICS, APPLIED//MATERIALS SCIENCE, MULTIDISCIPLINARY | 2188495 |
13 | 3 | PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON | 136516 |
1628 | 2 | HFO2//HIGH K DIELECTRICS//HIGH K | 7266 |
19118 | 1 | METAL INSULATOR METAL MIM CAPACITOR//METAL INSULATOR METAL MIM//VOLTAGE COEFFICIENT OF CAPACITANCE VCC | 543 |
Terms with highest relevance score |
rank | Category | termType | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|---|
1 | METAL INSULATOR METAL MIM CAPACITOR | authKW | 2098781 | 8% | 80% | 45 |
2 | METAL INSULATOR METAL MIM | authKW | 1165545 | 6% | 57% | 35 |
3 | VOLTAGE COEFFICIENT OF CAPACITANCE VCC | authKW | 874025 | 3% | 94% | 16 |
4 | MIM CAPACITOR | authKW | 826703 | 6% | 41% | 35 |
5 | TEMPERATURE COEFFICIENT OF CAPACITANCE TCC | authKW | 557187 | 2% | 80% | 12 |
6 | CAPACITANCE DENSITY | authKW | 464319 | 2% | 67% | 12 |
7 | VOLTAGE COEFFICIENT OF CAPACITANCE | authKW | 348245 | 1% | 100% | 6 |
8 | METAL INSULATOR METAL CAPACITOR | authKW | 326949 | 2% | 43% | 13 |
9 | VOLTAGE LINEARITY | authKW | 315997 | 1% | 78% | 7 |
10 | TILAO | authKW | 185729 | 1% | 80% | 4 |
Web of Science journal categories |
chi_square_rank | Category | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | Engineering, Electrical & Electronic | 4489 | 53% | 0% | 289 |
2 | Physics, Applied | 4070 | 55% | 0% | 300 |
3 | Materials Science, Coatings & Films | 1040 | 10% | 0% | 56 |
4 | Nanoscience & Nanotechnology | 900 | 15% | 0% | 80 |
5 | Physics, Condensed Matter | 276 | 14% | 0% | 74 |
6 | Materials Science, Multidisciplinary | 206 | 17% | 0% | 91 |
7 | Electrochemistry | 166 | 5% | 0% | 29 |
8 | Optics | 79 | 6% | 0% | 35 |
9 | Materials Science, Ceramics | 23 | 2% | 0% | 9 |
10 | Engineering, Manufacturing | 18 | 1% | 0% | 7 |
Address terms |
chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | CHAIR NANOELECT DEVICES | 174123 | 1% | 100% | 3 |
2 | FAB TEAM 3 | 116082 | 0% | 100% | 2 |
3 | NEW MAT EVALUAT | 90800 | 2% | 12% | 13 |
4 | MIXED SIGNAL GRP | 77386 | 0% | 67% | 2 |
5 | SILICON NANO DEVICE | 65262 | 3% | 6% | 18 |
6 | ADV PASS DEVICE DEV TEAM | 58041 | 0% | 100% | 1 |
7 | CEA LETI D2NT | 58041 | 0% | 100% | 1 |
8 | CEA LETIMINATEC | 58041 | 0% | 100% | 1 |
9 | CHARTERED SILICON PARTNERS FAB 6 | 58041 | 0% | 100% | 1 |
10 | DEEP SUBMICRON INTEGRATED CIRCUIT PROC INTEG | 58041 | 0% | 100% | 1 |
Journals |
chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | IEEE ELECTRON DEVICE LETTERS | 41017 | 15% | 1% | 81 |
2 | MICROELECTRONIC ENGINEERING | 6069 | 6% | 0% | 33 |
3 | IEEE TRANSACTIONS ON ELECTRON DEVICES | 5016 | 7% | 0% | 37 |
4 | IEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITY | 1844 | 1% | 1% | 6 |
5 | ECS SOLID STATE LETTERS | 1449 | 1% | 1% | 3 |
6 | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1441 | 5% | 0% | 28 |
7 | IEEE JOURNAL OF SOLID-STATE CIRCUITS | 971 | 2% | 0% | 12 |
8 | JOURNAL OF NANOELECTRONICS AND OPTOELECTRONICS | 887 | 1% | 0% | 4 |
9 | APPLIED PHYSICS LETTERS | 820 | 8% | 0% | 41 |
10 | SOLID-STATE ELECTRONICS | 818 | 2% | 0% | 12 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Classes with closest relation at Level 1 |