Class information for: |
Basic class information |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
1 | 4 | PHYSICS, CONDENSED MATTER//PHYSICS, APPLIED//MATERIALS SCIENCE, MULTIDISCIPLINARY | 2188495 |
13 | 3 | PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON | 136516 |
1628 | 2 | HFO2//HIGH K DIELECTRICS//HIGH K | 7266 |
116 | 1 | HFO2//HIGH K DIELECTRICS//HIGH K | 4377 |
9993 | 1 | TANTALUM OXIDE//TA2O5//TANTALUM PENTOXIDE | 1133 |
15246 | 1 | PRASEODYMIUM OXIDE//DIELECTRIC PHENOMENA//ELECT MAT DEVICES | 749 |
19118 | 1 | METAL INSULATOR METAL MIM CAPACITOR//METAL INSULATOR METAL MIM//VOLTAGE COEFFICIENT OF CAPACITANCE VCC | 543 |
24564 | 1 | GADOLINIA FILMS//GE TFTS//POTASSIUM YTTRIUM FLUORIDE | 331 |
33806 | 1 | HIGHER RARE EARTH OXIDES//FLUORITE RELATED OXIDES//OXYGEN CENTRED TETRAHEDRA | 133 |
Terms with highest relevance score |
rank | Category | termType | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|---|
1 | HFO2 | authKW | 555028 | 4% | 42% | 302 |
2 | HIGH K DIELECTRICS | authKW | 505737 | 4% | 41% | 284 |
3 | HIGH K | authKW | 502051 | 4% | 39% | 295 |
4 | HIGH K GATE DIELECTRICS | authKW | 314649 | 2% | 55% | 132 |
5 | METAL GATE | authKW | 260798 | 2% | 41% | 147 |
6 | HAFNIUM OXIDE | authKW | 199467 | 2% | 38% | 121 |
7 | METAL INSULATOR METAL MIM CAPACITOR | authKW | 163809 | 1% | 82% | 46 |
8 | HAFNIUM COMPOUNDS | authKW | 154542 | 1% | 38% | 95 |
9 | HIGH KAPPA | authKW | 127359 | 1% | 35% | 84 |
10 | GATE DIELECTRIC | authKW | 122711 | 1% | 26% | 107 |
Web of Science journal categories |
chi_square_rank | Category | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | Physics, Applied | 67692 | 61% | 0% | 4446 |
2 | Materials Science, Coatings & Films | 34326 | 16% | 1% | 1156 |
3 | Physics, Condensed Matter | 10655 | 21% | 0% | 1558 |
4 | Engineering, Electrical & Electronic | 9681 | 23% | 0% | 1685 |
5 | Materials Science, Multidisciplinary | 7991 | 26% | 0% | 1860 |
6 | Nanoscience & Nanotechnology | 7236 | 12% | 0% | 848 |
7 | Electrochemistry | 1970 | 5% | 0% | 368 |
8 | Optics | 894 | 6% | 0% | 441 |
9 | Materials Science, Ceramics | 777 | 2% | 0% | 175 |
10 | Chemistry, Physical | 429 | 8% | 0% | 617 |
Address terms |
chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | SILICON NANO DEVICE | 86842 | 1% | 26% | 76 |
2 | EXPT PHYS TECHNOL | 80045 | 1% | 45% | 41 |
3 | ANHUI NANOMAT NANOSTRUCT | 52129 | 1% | 20% | 59 |
4 | RADIAT DETECT MAT DEVICES | 48942 | 0% | 47% | 24 |
5 | LONDON NANOTECHNOL ELECT ELECT ENGN | 39021 | 0% | 100% | 9 |
6 | MIRAI ASET | 30829 | 0% | 89% | 8 |
7 | ENERGY EFFICIENT SUSTAINABLE SEMICOND GRP | 30541 | 0% | 41% | 17 |
8 | MDM | 28588 | 1% | 13% | 50 |
9 | ADV PROC DEV TEAM | 28368 | 0% | 55% | 12 |
10 | TEL TECHNOL | 27397 | 0% | 45% | 14 |
Journals |
chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | MICROELECTRONIC ENGINEERING | 49130 | 5% | 3% | 344 |
2 | IEEE ELECTRON DEVICE LETTERS | 31919 | 4% | 3% | 263 |
3 | APPLIED PHYSICS LETTERS | 31824 | 13% | 1% | 917 |
4 | CHEMICAL VAPOR DEPOSITION | 18307 | 1% | 7% | 65 |
5 | THIN SOLID FILMS | 16746 | 5% | 1% | 382 |
6 | ELECTROCHEMICAL AND SOLID STATE LETTERS | 12771 | 2% | 3% | 113 |
7 | JOURNAL OF APPLIED PHYSICS | 11235 | 7% | 1% | 544 |
8 | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 10170 | 4% | 1% | 274 |
9 | MICROELECTRONICS RELIABILITY | 9578 | 2% | 2% | 129 |
10 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 8535 | 3% | 1% | 185 |
Author Key Words |
chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass | LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | HFO2 | 555028 | 4% | 42% | 302 | Search HFO2 | Search HFO2 |
2 | HIGH K DIELECTRICS | 505737 | 4% | 41% | 284 | Search HIGH+K+DIELECTRICS | Search HIGH+K+DIELECTRICS |
3 | HIGH K | 502051 | 4% | 39% | 295 | Search HIGH+K | Search HIGH+K |
4 | HIGH K GATE DIELECTRICS | 314649 | 2% | 55% | 132 | Search HIGH+K+GATE+DIELECTRICS | Search HIGH+K+GATE+DIELECTRICS |
5 | METAL GATE | 260798 | 2% | 41% | 147 | Search METAL+GATE | Search METAL+GATE |
6 | HAFNIUM OXIDE | 199467 | 2% | 38% | 121 | Search HAFNIUM+OXIDE | Search HAFNIUM+OXIDE |
7 | METAL INSULATOR METAL MIM CAPACITOR | 163809 | 1% | 82% | 46 | Search METAL+INSULATOR+METAL+MIM+CAPACITOR | Search METAL+INSULATOR+METAL+MIM+CAPACITOR |
8 | HAFNIUM COMPOUNDS | 154542 | 1% | 38% | 95 | Search HAFNIUM+COMPOUNDS | Search HAFNIUM+COMPOUNDS |
9 | HIGH KAPPA | 127359 | 1% | 35% | 84 | Search HIGH+KAPPA | Search HIGH+KAPPA |
10 | GATE DIELECTRIC | 122711 | 1% | 26% | 107 | Search GATE+DIELECTRIC | Search GATE+DIELECTRIC |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Classes with closest relation at Level 2 |