Class information for:
Level 1: HFO2//HIGH K DIELECTRICS//HIGH K

Basic class information
Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
1 4 PHYSICS, CONDENSED MATTER//PHYSICS, APPLIED//MATERIALS SCIENCE, MULTIDISCIPLINARY 2188495
13 3       PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON 136516
1628 2             HFO2//HIGH K DIELECTRICS//HIGH K 7266
116 1                   HFO2//HIGH K DIELECTRICS//HIGH K 4377

Terms with highest relevance score


rank Category termType chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 HFO2 authKW 832447 7% 40% 287
2 HIGH K DIELECTRICS authKW 555593 5% 33% 231
3 HIGH K authKW 520062 5% 31% 233
4 HIGH K GATE DIELECTRICS authKW 461074 3% 52% 124
5 METAL GATE authKW 398482 3% 39% 141
6 HAFNIUM OXIDE authKW 304460 3% 36% 116
7 HAFNIUM COMPOUNDS authKW 245974 2% 37% 93
8 HAFNIUM SILICATE authKW 185920 1% 70% 37
9 GATE DIELECTRIC authKW 160666 2% 24% 95
10 HAFNIUM DIOXIDE authKW 157117 1% 53% 41

Web of Science journal categories


chi_square_rank Category chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 Physics, Applied 51082 68% 0% 2979
2 Materials Science, Coatings & Films 20533 16% 0% 694
3 Engineering, Electrical & Electronic 6596 24% 0% 1071
4 Nanoscience & Nanotechnology 6048 14% 0% 593
5 Physics, Condensed Matter 5662 20% 0% 888
6 Materials Science, Multidisciplinary 3445 22% 0% 976
7 Electrochemistry 1216 5% 0% 224
8 Optics 719 7% 0% 296
9 Materials Science, Ceramics 374 2% 0% 96
10 Chemistry, Physical 96 7% 0% 291

Address terms


chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 EXPT PHYS TECHNOL 91404 1% 37% 34
2 SILICON NANO DEVICE 83992 1% 20% 58
3 ANHUI NANOMAT NANOSTRUCT 83701 1% 20% 58
4 RADIAT DETECT MAT DEVICES 81277 1% 47% 24
5 LONDON NANOTECHNOL ELECT ELECT ENGN 64788 0% 100% 9
6 MIRAI ASET 51189 0% 89% 8
7 ADV PROC DEV TEAM 47108 0% 55% 12
8 TEL TECHNOL 45499 0% 45% 14
9 MIRAI 44954 1% 25% 25
10 MDM 38485 1% 12% 45

Journals


chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass
1 MICROELECTRONIC ENGINEERING 50406 6% 3% 270
2 APPLIED PHYSICS LETTERS 35086 17% 1% 742
3 IEEE ELECTRON DEVICE LETTERS 21382 4% 2% 167
4 CHEMICAL VAPOR DEPOSITION 18010 1% 5% 50
5 ELECTROCHEMICAL AND SOLID STATE LETTERS 14741 2% 2% 94
6 JOURNAL OF APPLIED PHYSICS 8768 8% 0% 371
7 THIN SOLID FILMS 7110 4% 1% 194
8 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 7038 3% 1% 130
9 MICROELECTRONICS RELIABILITY 6593 2% 1% 83
10 JOURNAL OF THE ELECTROCHEMICAL SOCIETY 6509 4% 1% 170

Author Key Words


chi_square_rank term chi_square shrOfCwithTerm shrOfTermInClass termInClass LCSH search Wikipedia search
1 HFO2 832447 7% 40% 287 Search HFO2 Search HFO2
2 HIGH K DIELECTRICS 555593 5% 33% 231 Search HIGH+K+DIELECTRICS Search HIGH+K+DIELECTRICS
3 HIGH K 520062 5% 31% 233 Search HIGH+K Search HIGH+K
4 HIGH K GATE DIELECTRICS 461074 3% 52% 124 Search HIGH+K+GATE+DIELECTRICS Search HIGH+K+GATE+DIELECTRICS
5 METAL GATE 398482 3% 39% 141 Search METAL+GATE Search METAL+GATE
6 HAFNIUM OXIDE 304460 3% 36% 116 Search HAFNIUM+OXIDE Search HAFNIUM+OXIDE
7 HAFNIUM COMPOUNDS 245974 2% 37% 93 Search HAFNIUM+COMPOUNDS Search HAFNIUM+COMPOUNDS
8 HAFNIUM SILICATE 185920 1% 70% 37 Search HAFNIUM+SILICATE Search HAFNIUM+SILICATE
9 GATE DIELECTRIC 160666 2% 24% 95 Search GATE+DIELECTRIC Search GATE+DIELECTRIC
10 HAFNIUM DIOXIDE 157117 1% 53% 41 Search HAFNIUM+DIOXIDE Search HAFNIUM+DIOXIDE

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.

Classes with closest relation at Level 1


rank cluster_id2 link
1 15246 PRASEODYMIUM OXIDE//DIELECTRIC PHENOMENA//ELECT MAT DEVICES
2 19118 METAL INSULATOR METAL MIM CAPACITOR//METAL INSULATOR METAL MIM//VOLTAGE COEFFICIENT OF CAPACITANCE VCC
3 12310 DIRECT TUNNELING//QUANTUM MECHANICAL EFFECTS//ULTRATHIN GATE OXIDE
4 8169 GERMANIUM//MBE//GE MOS
5 9993 TANTALUM OXIDE//TA2O5//TANTALUM PENTOXIDE
6 12845 NEGATIVE BIAS TEMPERATURE INSTABILITY NBTI//NEGATIVE BIAS TEMPERATURE INSTABILITY//NBTI
7 26655 NEGATIVE CAPACITANCE//CHAIR NANOELECT MAT//NAM GGMBH
8 2907 ATOMIC LAYER DEPOSITION//ALD//MOLECULAR LAYER DEPOSITION
9 16549 ELECTROCHEMICAL VAPOR DEPOSITION//ZIRCONIA THIN FILMS//ADV COATINGS EXPT
10 21959 SI001 SUBSTRATES//CRYSTALLINE OXIDE//S UNICAT

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