Class information for: |
Basic class information |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
8 | 4 | POLYMER SCIENCE//CHEMISTRY, PHYSICAL//MATERIALS SCIENCE, MULTIDISCIPLINARY | 1554940 |
314 | 3 | POLYMER SCIENCE//POLYIMIDE//PLASMA POLYMERIZATION | 39712 |
1393 | 2 | PLASMA POLYMERIZATION//LOW K//PLASMA PROCESSES AND POLYMERS | 8345 |
2222 | 1 | LOW K//LOW K DIELECTRICS//PLASMA PROC TECHNOL | 2353 |
Terms with highest relevance score |
rank | Category | termType | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|---|
1 | LOW K | authKW | 1342791 | 8% | 53% | 190 |
2 | LOW K DIELECTRICS | authKW | 733251 | 4% | 54% | 102 |
3 | PLASMA PROC TECHNOL | address | 524774 | 2% | 85% | 46 |
4 | LOW K MATERIALS | authKW | 517456 | 3% | 60% | 64 |
5 | SIOC H FILMS | authKW | 455345 | 1% | 100% | 34 |
6 | LOG TECHNOL DEV | address | 291085 | 2% | 43% | 50 |
7 | LOW DIELECTRIC CONSTANT | authKW | 279038 | 3% | 32% | 66 |
8 | SIOF | authKW | 279002 | 1% | 83% | 25 |
9 | NANO THIN FILM MAT | address | 258653 | 1% | 74% | 26 |
10 | LOW K DIELECTRIC THIN FILMS | authKW | 232119 | 1% | 67% | 26 |
Web of Science journal categories |
chi_square_rank | Category | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | Physics, Applied | 26086 | 66% | 0% | 1563 |
2 | Materials Science, Coatings & Films | 22974 | 23% | 0% | 533 |
3 | Nanoscience & Nanotechnology | 8420 | 21% | 0% | 497 |
4 | Engineering, Electrical & Electronic | 3620 | 25% | 0% | 581 |
5 | Materials Science, Multidisciplinary | 3089 | 28% | 0% | 649 |
6 | Physics, Condensed Matter | 2331 | 18% | 0% | 425 |
7 | Electrochemistry | 1972 | 8% | 0% | 197 |
8 | Optics | 1173 | 11% | 0% | 249 |
9 | Materials Science, Ceramics | 121 | 2% | 0% | 42 |
10 | Chemistry, Physical | 41 | 6% | 0% | 149 |
Address terms |
chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | PLASMA PROC TECHNOL | 524774 | 2% | 85% | 46 |
2 | LOG TECHNOL DEV | 291085 | 2% | 43% | 50 |
3 | NANO THIN FILM MAT | 258653 | 1% | 74% | 26 |
4 | NANOTHIN FILM MAT | 115745 | 0% | 79% | 11 |
5 | XPEQT | 108478 | 0% | 90% | 9 |
6 | MECH ENERGY PROD ENGN | 84660 | 1% | 45% | 14 |
7 | NANODEVICES SYST | 67465 | 1% | 15% | 33 |
8 | MAT CALCULAT | 47828 | 0% | 71% | 5 |
9 | OCOTILLO MAT | 43825 | 0% | 55% | 6 |
10 | SEMICOND MAT PROC | 41907 | 1% | 26% | 12 |
Journals |
chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | MICROELECTRONIC ENGINEERING | 70712 | 10% | 2% | 234 |
2 | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 15859 | 8% | 1% | 192 |
3 | THIN SOLID FILMS | 15007 | 9% | 1% | 204 |
4 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 12903 | 5% | 1% | 128 |
5 | ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY | 9837 | 1% | 2% | 33 |
6 | SOLID STATE TECHNOLOGY | 8757 | 1% | 2% | 35 |
7 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 7103 | 6% | 0% | 130 |
8 | ELECTROCHEMICAL AND SOLID STATE LETTERS | 6274 | 2% | 1% | 45 |
9 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 5891 | 3% | 1% | 80 |
10 | JAPANESE JOURNAL OF APPLIED PHYSICS | 3876 | 3% | 0% | 70 |
Author Key Words |
chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass | LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | LOW K | 1342791 | 8% | 53% | 190 | Search LOW+K | Search LOW+K |
2 | LOW K DIELECTRICS | 733251 | 4% | 54% | 102 | Search LOW+K+DIELECTRICS | Search LOW+K+DIELECTRICS |
3 | LOW K MATERIALS | 517456 | 3% | 60% | 64 | Search LOW+K+MATERIALS | Search LOW+K+MATERIALS |
4 | SIOC H FILMS | 455345 | 1% | 100% | 34 | Search SIOC+H+FILMS | Search SIOC+H+FILMS |
5 | LOW DIELECTRIC CONSTANT | 279038 | 3% | 32% | 66 | Search LOW+DIELECTRIC+CONSTANT | Search LOW+DIELECTRIC+CONSTANT |
6 | SIOF | 279002 | 1% | 83% | 25 | Search SIOF | Search SIOF |
7 | LOW K DIELECTRIC THIN FILMS | 232119 | 1% | 67% | 26 | Search LOW+K+DIELECTRIC+THIN+FILMS | Search LOW+K+DIELECTRIC+THIN+FILMS |
8 | POROUS LOW K | 223202 | 1% | 83% | 20 | Search POROUS+LOW+K | Search POROUS+LOW+K |
9 | ORGANOSILICATE GLASS | 161665 | 1% | 93% | 13 | Search ORGANOSILICATE+GLASS | Search ORGANOSILICATE+GLASS |
10 | SIOCH | 154958 | 1% | 64% | 18 | Search SIOCH | Search SIOCH |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Classes with closest relation at Level 1 |