Class information for: |
Basic class information |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
1 | 4 | PHYSICS, CONDENSED MATTER//PHYSICS, APPLIED//MATERIALS SCIENCE, MULTIDISCIPLINARY | 2188495 |
396 | 3 | LEAD FREE SOLDER//SOLDER//ELECTROMIGRATION | 32184 |
1011 | 2 | ATOMIC LAYER DEPOSITION//DIFFUSION BARRIER//CU METALLIZATION | 10645 |
3456 | 1 | DIFFUSION BARRIER//CU METALLIZATION//TANTALUM NITRIDE | 2011 |
Terms with highest relevance score |
rank | Category | termType | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|---|
1 | DIFFUSION BARRIER | authKW | 1342342 | 13% | 32% | 267 |
2 | CU METALLIZATION | authKW | 782083 | 4% | 70% | 71 |
3 | TANTALUM NITRIDE | authKW | 649649 | 4% | 54% | 77 |
4 | TA SI N | authKW | 322356 | 1% | 86% | 24 |
5 | TUNGSTEN NITRIDE | authKW | 279170 | 2% | 42% | 42 |
6 | CU DIFFUSION BARRIER | authKW | 170627 | 1% | 78% | 14 |
7 | COPPER METALLIZATION | authKW | 156456 | 1% | 37% | 27 |
8 | TAN | authKW | 141368 | 2% | 24% | 38 |
9 | ADV PROC C ACITOR | address | 104463 | 0% | 67% | 10 |
10 | COPPER DIFFUSION BARRIER | authKW | 92171 | 0% | 59% | 10 |
Web of Science journal categories |
chi_square_rank | Category | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | Materials Science, Coatings & Films | 38892 | 32% | 0% | 637 |
2 | Physics, Applied | 18783 | 61% | 0% | 1232 |
3 | Materials Science, Multidisciplinary | 4134 | 33% | 0% | 673 |
4 | Physics, Condensed Matter | 3055 | 22% | 0% | 438 |
5 | Nanoscience & Nanotechnology | 2363 | 13% | 0% | 253 |
6 | Electrochemistry | 1879 | 9% | 0% | 177 |
7 | Engineering, Electrical & Electronic | 954 | 15% | 0% | 303 |
8 | Metallurgy & Metallurgical Engineering | 298 | 5% | 0% | 101 |
9 | Optics | 190 | 6% | 0% | 111 |
10 | Chemistry, Physical | 143 | 9% | 0% | 180 |
Address terms |
chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | ADV PROC C ACITOR | 104463 | 0% | 67% | 10 |
2 | NEW YORK STATE ADV THIN FILM TECHNOL | 71629 | 0% | 57% | 8 |
3 | MAT CHEM COATINGS | 50144 | 0% | 80% | 4 |
4 | SEMICOND MICROSYST TECHN IHM | 47011 | 0% | 100% | 3 |
5 | SEMICOND MICROSYST TECHNOL | 44371 | 1% | 17% | 17 |
6 | MET DEPOSIT PROD GRP | 35257 | 0% | 75% | 3 |
7 | FUDAN NOVELLUS INTERCONNECT | 31341 | 0% | 100% | 2 |
8 | NW SERV OFF | 31341 | 0% | 100% | 2 |
9 | MEMORY DEV | 26091 | 1% | 11% | 15 |
10 | BENET S | 23732 | 1% | 13% | 12 |
Journals |
chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | THIN SOLID FILMS | 17979 | 10% | 1% | 206 |
2 | MICROELECTRONIC ENGINEERING | 16879 | 5% | 1% | 106 |
3 | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 13042 | 8% | 1% | 161 |
4 | ELECTROCHEMICAL AND SOLID STATE LETTERS | 7689 | 2% | 1% | 46 |
5 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 7454 | 4% | 1% | 83 |
6 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 6004 | 4% | 0% | 81 |
7 | SURFACE & COATINGS TECHNOLOGY | 4743 | 4% | 0% | 79 |
8 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 3685 | 4% | 0% | 87 |
9 | ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY | 3411 | 1% | 1% | 18 |
10 | CHEMICAL VAPOR DEPOSITION | 3062 | 1% | 1% | 14 |
Author Key Words |
chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass | LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | DIFFUSION BARRIER | 1342342 | 13% | 32% | 267 | Search DIFFUSION+BARRIER | Search DIFFUSION+BARRIER |
2 | CU METALLIZATION | 782083 | 4% | 70% | 71 | Search CU+METALLIZATION | Search CU+METALLIZATION |
3 | TANTALUM NITRIDE | 649649 | 4% | 54% | 77 | Search TANTALUM+NITRIDE | Search TANTALUM+NITRIDE |
4 | TA SI N | 322356 | 1% | 86% | 24 | Search TA+SI+N | Search TA+SI+N |
5 | TUNGSTEN NITRIDE | 279170 | 2% | 42% | 42 | Search TUNGSTEN+NITRIDE | Search TUNGSTEN+NITRIDE |
6 | CU DIFFUSION BARRIER | 170627 | 1% | 78% | 14 | Search CU+DIFFUSION+BARRIER | Search CU+DIFFUSION+BARRIER |
7 | COPPER METALLIZATION | 156456 | 1% | 37% | 27 | Search COPPER+METALLIZATION | Search COPPER+METALLIZATION |
8 | TAN | 141368 | 2% | 24% | 38 | Search TAN | Search TAN |
9 | COPPER DIFFUSION BARRIER | 92171 | 0% | 59% | 10 | Search COPPER+DIFFUSION+BARRIER | Search COPPER+DIFFUSION+BARRIER |
10 | TANTALUM | 81920 | 4% | 6% | 86 | Search TANTALUM | Search TANTALUM |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Classes with closest relation at Level 1 |