Class information for: |
Basic class information |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
| Cluster id | Level | Cluster label | #P |
|---|---|---|---|
| 1 | 4 | PHYSICS, CONDENSED MATTER//PHYSICS, APPLIED//MATERIALS SCIENCE, MULTIDISCIPLINARY | 2188495 |
| 13 | 3 | PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON | 136516 |
| 1116 | 2 | SILICON OXYNITRIDE//BORON PENETRATION//SILICON NITRIDE | 10021 |
| 3355 | 1 | SILICON NITRIDE//SILICON OXYNITRIDE//SILICON NITRIDE FILM | 2036 |
Terms with highest relevance score |
| rank | Category | termType | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|---|
| 1 | SILICON NITRIDE | authKW | 300440 | 11% | 9% | 227 |
| 2 | SILICON OXYNITRIDE | authKW | 237899 | 3% | 25% | 61 |
| 3 | SILICON NITRIDE FILM | authKW | 207880 | 1% | 45% | 30 |
| 4 | PECVD | authKW | 69556 | 4% | 6% | 78 |
| 5 | ION ENERGY DIAGNOSTICS | authKW | 61912 | 0% | 100% | 4 |
| 6 | AMORPHOUS SILICON NITRIDE | authKW | 60400 | 1% | 35% | 11 |
| 7 | EFFECTIVE TRAPPED CARRIER DENSITY | authKW | 46434 | 0% | 100% | 3 |
| 8 | ELECTRON CYCLOTRON RESONANCE PLASMA DEPOSITION | authKW | 46434 | 0% | 100% | 3 |
| 9 | SIH4 N 2 | authKW | 46434 | 0% | 100% | 3 |
| 10 | SIH4 NH3 | authKW | 46434 | 0% | 100% | 3 |
Web of Science journal categories |
| chi_square_rank | Category | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | Materials Science, Coatings & Films | 25701 | 26% | 0% | 523 |
| 2 | Physics, Applied | 17022 | 58% | 0% | 1184 |
| 3 | Physics, Condensed Matter | 4265 | 25% | 0% | 512 |
| 4 | Materials Science, Ceramics | 4114 | 9% | 0% | 187 |
| 5 | Materials Science, Multidisciplinary | 4000 | 33% | 0% | 668 |
| 6 | Electrochemistry | 641 | 5% | 0% | 110 |
| 7 | Nanoscience & Nanotechnology | 593 | 7% | 0% | 139 |
| 8 | Engineering, Electrical & Electronic | 588 | 12% | 0% | 253 |
| 9 | Instruments & Instrumentation | 105 | 3% | 0% | 64 |
| 10 | Optics | 77 | 4% | 0% | 83 |
Address terms |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | EPUSP | 41248 | 1% | 17% | 16 |
| 2 | ABT SF 4 | 30956 | 0% | 100% | 2 |
| 3 | DEV MIDORI KU | 30956 | 0% | 100% | 2 |
| 4 | ELECT TECNOL COMPUTADO PROYECTOS | 27858 | 0% | 60% | 3 |
| 5 | FIS LICADA 3 | 21438 | 1% | 6% | 24 |
| 6 | SIMULAC DISPOSIT SEMICOND | 20636 | 0% | 67% | 2 |
| 7 | 2121 HISAKATA | 15478 | 0% | 100% | 1 |
| 8 | ABT SILIZIUM PHOTOVOLTAIK IONENSTRAHL OR | 15478 | 0% | 100% | 1 |
| 9 | ADV TECH CORP | 15478 | 0% | 100% | 1 |
| 10 | AGT 14 | 15478 | 0% | 100% | 1 |
Journals |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | JOURNAL OF NON-CRYSTALLINE SOLIDS | 16577 | 8% | 1% | 158 |
| 2 | THIN SOLID FILMS | 14438 | 9% | 1% | 186 |
| 3 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 13724 | 6% | 1% | 113 |
| 4 | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 5197 | 5% | 0% | 103 |
| 5 | JOURNAL OF APPLIED PHYSICS | 4452 | 9% | 0% | 180 |
| 6 | SOVIET MICROELECTRONICS | 4176 | 0% | 3% | 9 |
| 7 | PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES | 2978 | 1% | 1% | 25 |
| 8 | SOLID STATE TECHNOLOGY | 2662 | 1% | 1% | 18 |
| 9 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2261 | 3% | 0% | 69 |
| 10 | VACUUM | 2232 | 2% | 0% | 38 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Classes with closest relation at Level 1 |