Class information for: |
Basic class information |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
1 | 4 | PHYSICS, CONDENSED MATTER//PHYSICS, APPLIED//MATERIALS SCIENCE, MULTIDISCIPLINARY | 2188495 |
13 | 3 | PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON | 136516 |
1116 | 2 | SILICON OXYNITRIDE//BORON PENETRATION//SILICON NITRIDE | 10021 |
5396 | 1 | BORON PENETRATION//NITRIDED OXIDE//SI OXYNITRIDE | 1660 |
Terms with highest relevance score |
rank | Category | termType | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|---|
1 | BORON PENETRATION | authKW | 482404 | 2% | 71% | 36 |
2 | NITRIDED OXIDE | authKW | 128321 | 1% | 52% | 13 |
3 | SI OXYNITRIDE | authKW | 85426 | 0% | 75% | 6 |
4 | OXYNITRIDE | authKW | 81022 | 3% | 9% | 45 |
5 | OXYNITRIDATION | authKW | 80992 | 0% | 53% | 8 |
6 | SILICON OXYNITRIDE | authKW | 70550 | 2% | 12% | 30 |
7 | HOT ELECTRON HARDNESS | authKW | 56953 | 0% | 100% | 3 |
8 | REOXIDIZED NITRIDED OXIDE | authKW | 56953 | 0% | 100% | 3 |
9 | STORAGE DIELECTRIC | authKW | 56953 | 0% | 100% | 3 |
10 | TRENCH DRAM | authKW | 56953 | 0% | 100% | 3 |
Web of Science journal categories |
chi_square_rank | Category | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | Physics, Applied | 16559 | 63% | 0% | 1049 |
2 | Materials Science, Coatings & Films | 10128 | 18% | 0% | 299 |
3 | Engineering, Electrical & Electronic | 5713 | 35% | 0% | 588 |
4 | Physics, Condensed Matter | 1426 | 17% | 0% | 282 |
5 | Electrochemistry | 1222 | 8% | 0% | 131 |
6 | Nanoscience & Nanotechnology | 730 | 8% | 0% | 135 |
7 | Materials Science, Multidisciplinary | 235 | 12% | 0% | 197 |
8 | Materials Science, Ceramics | 120 | 2% | 0% | 34 |
9 | Nuclear Science & Technology | 64 | 3% | 0% | 43 |
10 | Chemistry, Physical | 22 | 6% | 0% | 100 |
Address terms |
chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | SOFTWARE ADV MAT PROC | 37969 | 0% | 100% | 2 |
2 | DIFFUS | 36502 | 0% | 38% | 5 |
3 | NON VOLATILE MEMORY PROC DEV | 25311 | 0% | 67% | 2 |
4 | LEMEAMED | 24405 | 0% | 43% | 3 |
5 | PHYS CHEM SUR E INTER E | 24405 | 0% | 43% | 3 |
6 | ADV ULSI PROC ENGN 4 | 18984 | 0% | 100% | 1 |
7 | AKIRUNI TECHNOL | 18984 | 0% | 100% | 1 |
8 | AUSTIN LOG TECHNOL DEV | 18984 | 0% | 100% | 1 |
9 | CNRS LP 7251 | 18984 | 0% | 100% | 1 |
10 | DFAE LCMM | 18984 | 0% | 100% | 1 |
Journals |
chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | IEEE ELECTRON DEVICE LETTERS | 47754 | 9% | 2% | 153 |
2 | IEEE TRANSACTIONS ON ELECTRON DEVICES | 16416 | 7% | 1% | 117 |
3 | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 10135 | 8% | 0% | 129 |
4 | SOLID-STATE ELECTRONICS | 7224 | 4% | 1% | 62 |
5 | APPLIED PHYSICS LETTERS | 5946 | 11% | 0% | 190 |
6 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 5043 | 6% | 0% | 92 |
7 | JOURNAL OF APPLIED PHYSICS | 3958 | 9% | 0% | 153 |
8 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 3092 | 3% | 0% | 53 |
9 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2867 | 3% | 0% | 47 |
10 | MICROELECTRONICS RELIABILITY | 2751 | 2% | 0% | 33 |
Author Key Words |
chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass | LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | BORON PENETRATION | 482404 | 2% | 71% | 36 | Search BORON+PENETRATION | Search BORON+PENETRATION |
2 | NITRIDED OXIDE | 128321 | 1% | 52% | 13 | Search NITRIDED+OXIDE | Search NITRIDED+OXIDE |
3 | SI OXYNITRIDE | 85426 | 0% | 75% | 6 | Search SI+OXYNITRIDE | Search SI+OXYNITRIDE |
4 | OXYNITRIDE | 81022 | 3% | 9% | 45 | Search OXYNITRIDE | Search OXYNITRIDE |
5 | OXYNITRIDATION | 80992 | 0% | 53% | 8 | Search OXYNITRIDATION | Search OXYNITRIDATION |
6 | SILICON OXYNITRIDE | 70550 | 2% | 12% | 30 | Search SILICON+OXYNITRIDE | Search SILICON+OXYNITRIDE |
7 | HOT ELECTRON HARDNESS | 56953 | 0% | 100% | 3 | Search HOT+ELECTRON+HARDNESS | Search HOT+ELECTRON+HARDNESS |
8 | REOXIDIZED NITRIDED OXIDE | 56953 | 0% | 100% | 3 | Search REOXIDIZED+NITRIDED+OXIDE | Search REOXIDIZED+NITRIDED+OXIDE |
9 | STORAGE DIELECTRIC | 56953 | 0% | 100% | 3 | Search STORAGE+DIELECTRIC | Search STORAGE+DIELECTRIC |
10 | TRENCH DRAM | 56953 | 0% | 100% | 3 | Search TRENCH+DRAM | Search TRENCH+DRAM |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Classes with closest relation at Level 1 |