Class information for: |
Basic class information |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
| Cluster id | Level | Cluster label | #P |
|---|---|---|---|
| 1 | 4 | PHYSICS, CONDENSED MATTER//PHYSICS, APPLIED//MATERIALS SCIENCE, MULTIDISCIPLINARY | 2188495 |
| 13 | 3 | PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON | 136516 |
| 1116 | 2 | SILICON OXYNITRIDE//BORON PENETRATION//SILICON NITRIDE | 10021 |
| 20412 | 1 | POLYOXIDE//INTER POLY DIELECTRIC IPD//INTERPOLY DIELECTRIC | 484 |
Terms with highest relevance score |
| rank | Category | termType | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|---|
| 1 | POLYOXIDE | authKW | 479490 | 2% | 82% | 9 |
| 2 | INTER POLY DIELECTRIC IPD | authKW | 148834 | 1% | 57% | 4 |
| 3 | INTERPOLY DIELECTRIC | authKW | 146510 | 1% | 75% | 3 |
| 4 | INTERPOLY OXIDE | authKW | 130233 | 0% | 100% | 2 |
| 5 | LPCVD SI LAYERS | authKW | 130233 | 0% | 100% | 2 |
| 6 | LPCVD TECHNIQUE | authKW | 130233 | 0% | 100% | 2 |
| 7 | NONPLANAR POLYOXIDE | authKW | 130233 | 0% | 100% | 2 |
| 8 | 3D STACKED CAPACITORS | authKW | 65116 | 0% | 100% | 1 |
| 9 | 64MBIT DRAMS | authKW | 65116 | 0% | 100% | 1 |
| 10 | AMORPHOUS SI LAYER | authKW | 65116 | 0% | 100% | 1 |
Web of Science journal categories |
| chi_square_rank | Category | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | Materials Science, Coatings & Films | 4670 | 23% | 0% | 109 |
| 2 | Physics, Applied | 3388 | 54% | 0% | 259 |
| 3 | Engineering, Electrical & Electronic | 1635 | 35% | 0% | 170 |
| 4 | Electrochemistry | 1267 | 14% | 0% | 69 |
| 5 | Physics, Condensed Matter | 437 | 17% | 0% | 84 |
| 6 | Materials Science, Multidisciplinary | 284 | 20% | 0% | 96 |
| 7 | Nanoscience & Nanotechnology | 151 | 7% | 0% | 34 |
| 8 | Physics, Multidisciplinary | 77 | 7% | 0% | 36 |
| 9 | Microscopy | 53 | 1% | 0% | 6 |
| 10 | Instruments & Instrumentation | 24 | 3% | 0% | 15 |
Address terms |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | CHD FAB 2 | 65116 | 0% | 100% | 1 |
| 2 | ELE SAKYO KU | 65116 | 0% | 100% | 1 |
| 3 | ETUDES MODELISAT ELE OTECH LAMEL | 65116 | 0% | 100% | 1 |
| 4 | FEE DSIF | 65116 | 0% | 100% | 1 |
| 5 | FLASH TEAM | 65116 | 0% | 100% | 1 |
| 6 | NVM PROD TECHNOL TEAM | 65116 | 0% | 100% | 1 |
| 7 | PROC ENGN 4 | 65116 | 0% | 100% | 1 |
| 8 | RD NONVOLATILE MEMORY DEVICE GRP | 65116 | 0% | 100% | 1 |
| 9 | ROGER ADAMS 207 | 65116 | 0% | 100% | 1 |
| 10 | SARNOFF CORP | 65116 | 0% | 100% | 1 |
Journals |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
|---|---|---|---|---|---|
| 1 | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 9198 | 14% | 0% | 66 |
| 2 | IEEE TRANSACTIONS ON ELECTRON DEVICES | 5948 | 8% | 0% | 38 |
| 3 | IEEE ELECTRON DEVICE LETTERS | 5864 | 6% | 0% | 29 |
| 4 | SOLID-STATE ELECTRONICS | 1646 | 3% | 0% | 16 |
| 5 | THIN SOLID FILMS | 1457 | 6% | 0% | 29 |
| 6 | RCA REVIEW | 1353 | 0% | 1% | 2 |
| 7 | SOLID STATE TECHNOLOGY | 866 | 1% | 0% | 5 |
| 8 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 849 | 3% | 0% | 15 |
| 9 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 807 | 4% | 0% | 20 |
| 10 | SENSORS AND ACTUATORS A-PHYSICAL | 761 | 2% | 0% | 11 |
Author Key Words |
| chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass | LCSH search | Wikipedia search |
|---|---|---|---|---|---|---|---|
| 1 | POLYOXIDE | 479490 | 2% | 82% | 9 | Search POLYOXIDE | Search POLYOXIDE |
| 2 | INTER POLY DIELECTRIC IPD | 148834 | 1% | 57% | 4 | Search INTER+POLY+DIELECTRIC+IPD | Search INTER+POLY+DIELECTRIC+IPD |
| 3 | INTERPOLY DIELECTRIC | 146510 | 1% | 75% | 3 | Search INTERPOLY+DIELECTRIC | Search INTERPOLY+DIELECTRIC |
| 4 | INTERPOLY OXIDE | 130233 | 0% | 100% | 2 | Search INTERPOLY+OXIDE | Search INTERPOLY+OXIDE |
| 5 | LPCVD SI LAYERS | 130233 | 0% | 100% | 2 | Search LPCVD+SI+LAYERS | Search LPCVD+SI+LAYERS |
| 6 | LPCVD TECHNIQUE | 130233 | 0% | 100% | 2 | Search LPCVD+TECHNIQUE | Search LPCVD+TECHNIQUE |
| 7 | NONPLANAR POLYOXIDE | 130233 | 0% | 100% | 2 | Search NONPLANAR+POLYOXIDE | Search NONPLANAR+POLYOXIDE |
| 8 | 3D STACKED CAPACITORS | 65116 | 0% | 100% | 1 | Search 3D+STACKED+CAPACITORS | Search 3D+STACKED+CAPACITORS |
| 9 | 64MBIT DRAMS | 65116 | 0% | 100% | 1 | Search 64MBIT+DRAMS | Search 64MBIT+DRAMS |
| 10 | AMORPHOUS SI LAYER | 65116 | 0% | 100% | 1 | Search AMORPHOUS+SI+LAYER | Search AMORPHOUS+SI+LAYER |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Classes with closest relation at Level 1 |