Class information for: |
Basic class information |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
1 | 4 | PHYSICS, CONDENSED MATTER//PHYSICS, APPLIED//MATERIALS SCIENCE, MULTIDISCIPLINARY | 2188495 |
13 | 3 | PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON | 136516 |
893 | 2 | SIGE//STRAINED SI//GERMANIUM | 11547 |
9401 | 1 | SELECTIVE EPITAXIAL GROWTH//ELEVATED SOURCE DRAIN//GERMANIUM SILICON COMPOUNDS | 1191 |
Terms with highest relevance score |
rank | Category | termType | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|---|
1 | SELECTIVE EPITAXIAL GROWTH | authKW | 268078 | 2% | 35% | 29 |
2 | ELEVATED SOURCE DRAIN | authKW | 190509 | 1% | 60% | 12 |
3 | GERMANIUM SILICON COMPOUNDS | authKW | 136083 | 1% | 86% | 6 |
4 | RPCVD | authKW | 132294 | 1% | 50% | 10 |
5 | REDUCED PRESSURE CHEMICAL VAPOUR | authKW | 105843 | 0% | 100% | 4 |
6 | PATTERN DEPENDENCY | authKW | 84673 | 0% | 80% | 4 |
7 | SIGE HYDRIDES VAPOR PHASE EPITAXY | authKW | 79383 | 0% | 100% | 3 |
8 | SIGE SELECTIVE EPITAXY | authKW | 79383 | 0% | 100% | 3 |
9 | SELECTIVE EPITAXY | authKW | 63197 | 2% | 9% | 27 |
10 | UHV CVD | authKW | 60463 | 1% | 19% | 12 |
Web of Science journal categories |
chi_square_rank | Category | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | Materials Science, Coatings & Films | 13479 | 24% | 0% | 290 |
2 | Physics, Applied | 11960 | 63% | 0% | 755 |
3 | Electrochemistry | 2643 | 13% | 0% | 157 |
4 | Engineering, Electrical & Electronic | 1917 | 25% | 0% | 300 |
5 | Crystallography | 1890 | 11% | 0% | 133 |
6 | Physics, Condensed Matter | 1590 | 21% | 0% | 245 |
7 | Materials Science, Multidisciplinary | 1342 | 26% | 0% | 308 |
8 | Nanoscience & Nanotechnology | 314 | 7% | 0% | 78 |
9 | COMPUTER APPLICATIONS & CYBERNETICS | 8 | 0% | 0% | 1 |
10 | Physics, Multidisciplinary | 7 | 3% | 0% | 35 |
Address terms |
chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | MUSASHINO OFF | 56027 | 1% | 35% | 6 |
2 | INTEGRATED DEVICES CIRCUITS | 28754 | 0% | 22% | 5 |
3 | ADV ENGN STUDY | 26461 | 0% | 100% | 1 |
4 | ADV PROC TEAM 3 | 26461 | 0% | 100% | 1 |
5 | ASM BELGIUM | 26461 | 0% | 100% | 1 |
6 | CVD DIFFUS 850 | 26461 | 0% | 100% | 1 |
7 | D2NT DPTSGRE | 26461 | 0% | 100% | 1 |
8 | D2NTDPTSGRE | 26461 | 0% | 100% | 1 |
9 | DELFT MICROSYST SUBMICROTECHNOL DIMES | 26461 | 0% | 100% | 1 |
10 | DEP ELE ENG | 26461 | 0% | 100% | 1 |
Journals |
chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 20871 | 13% | 1% | 156 |
2 | JOURNAL OF CRYSTAL GROWTH | 6861 | 8% | 0% | 91 |
3 | SOLID STATE TECHNOLOGY | 6236 | 2% | 1% | 21 |
4 | CRYSTAL RESEARCH AND TECHNOLOGY | 4603 | 3% | 1% | 34 |
5 | THIN SOLID FILMS | 3967 | 6% | 0% | 75 |
6 | APPLIED PHYSICS LETTERS | 3567 | 10% | 0% | 125 |
7 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 3411 | 4% | 0% | 47 |
8 | IEEE ELECTRON DEVICE LETTERS | 2866 | 3% | 0% | 32 |
9 | IEEE TRANSACTIONS ON ELECTRON DEVICES | 2768 | 3% | 0% | 41 |
10 | JOURNAL OF ELECTRONIC MATERIALS | 2586 | 3% | 0% | 32 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Classes with closest relation at Level 1 |