Class information for: |
Basic class information |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
1 | 4 | PHYSICS, CONDENSED MATTER//PHYSICS, APPLIED//MATERIALS SCIENCE, MULTIDISCIPLINARY | 2188495 |
13 | 3 | PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON | 136516 |
1116 | 2 | SILICON OXYNITRIDE//BORON PENETRATION//SILICON NITRIDE | 10021 |
4355 | 1 | SI OXIDATION//SIO2 SI INTERFACE//SILICON OXIDATION | 1832 |
Terms with highest relevance score |
rank | Category | termType | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|---|
1 | SI OXIDATION | authKW | 173449 | 1% | 92% | 11 |
2 | SIO2 SI INTERFACE | authKW | 137901 | 1% | 38% | 21 |
3 | SILICON OXIDATION | authKW | 135916 | 1% | 44% | 18 |
4 | LAYER BY LAYER OXIDATION | authKW | 107175 | 0% | 69% | 9 |
5 | INTERFACIAL SILICON EMISSION | authKW | 103211 | 0% | 100% | 6 |
6 | SILICON OXIDE | authKW | 84779 | 4% | 6% | 76 |
7 | TRANSLATIONAL KINETIC ENERGY | authKW | 55044 | 0% | 80% | 4 |
8 | OXYGEN MOLECULAR BEAM | authKW | 51605 | 0% | 100% | 3 |
9 | SI THERMAL OXIDATION | authKW | 51605 | 0% | 100% | 3 |
10 | POINT DEFECT GENERATION | authKW | 38702 | 0% | 75% | 3 |
Web of Science journal categories |
chi_square_rank | Category | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | Materials Science, Coatings & Films | 12691 | 19% | 0% | 351 |
2 | Physics, Applied | 12507 | 53% | 0% | 969 |
3 | Physics, Condensed Matter | 6380 | 32% | 0% | 581 |
4 | Electrochemistry | 1085 | 7% | 0% | 131 |
5 | Chemistry, Physical | 933 | 18% | 0% | 323 |
6 | Materials Science, Multidisciplinary | 526 | 15% | 0% | 277 |
7 | Nanoscience & Nanotechnology | 278 | 5% | 0% | 96 |
8 | Engineering, Electrical & Electronic | 234 | 9% | 0% | 170 |
9 | Physics, Multidisciplinary | 182 | 6% | 0% | 115 |
10 | Microscopy | 47 | 1% | 0% | 12 |
Address terms |
chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | THEORIE PHENOMENES PHYS ITP | 22934 | 0% | 67% | 2 |
2 | PPH ECUBLENS | 21344 | 0% | 21% | 6 |
3 | SHIGA TECHNOL | 19653 | 0% | 29% | 4 |
4 | PLASMANT GRP | 18967 | 0% | 14% | 8 |
5 | AD T NANOSTRUCT NANODEVICES CRAN | 17202 | 0% | 100% | 1 |
6 | ADV ISI TECHNOL | 17202 | 0% | 100% | 1 |
7 | ADV SIMULAT THEORET NEUROSCI | 17202 | 0% | 100% | 1 |
8 | ANALYT COMPUTAT SCI S | 17202 | 0% | 100% | 1 |
9 | ATPJOINT ATOM TECHNOLNAIR | 17202 | 0% | 100% | 1 |
10 | CENTRUY COE 21 | 17202 | 0% | 100% | 1 |
Journals |
chi_square_rank | term | chi_square | shrOfCwithTerm | shrOfTermInClass | termInClass |
---|---|---|---|---|---|
1 | SURFACE SCIENCE | 9801 | 7% | 0% | 125 |
2 | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 8454 | 7% | 0% | 124 |
3 | APPLIED SURFACE SCIENCE | 5453 | 6% | 0% | 109 |
4 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 4846 | 3% | 0% | 64 |
5 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 4158 | 5% | 0% | 88 |
6 | JOURNAL OF APPLIED PHYSICS | 3367 | 8% | 0% | 149 |
7 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 3334 | 3% | 0% | 49 |
8 | APPLIED PHYSICS LETTERS | 3008 | 8% | 0% | 144 |
9 | PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES | 2803 | 1% | 1% | 23 |
10 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2582 | 3% | 0% | 51 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Classes with closest relation at Level 1 |